被蚀刻的

In the first part of processing equipment, will see the need for coverage in regional operations after autoradiography revealed, without coverage in the region through metal etching zone will be in addition to corrosion.

因此在处理设备的前段，会看到需要覆盖的区域在显影作业后呈现出来，而未覆盖的区域在经过蚀刻区后金属会被蚀除。

The torch is of a curved surface form, with etching and anodizing being used during its production.

火炬传递是一个曲面的形式，与蚀刻和阳极氧化被用来在其生产的。

Various methods are then used to etch the base material along the pattern created by the light.

各种不同的方法然后用来沿着被光产生的式样蚀刻恶劣的材料。

The fabrication of SiNW was used by "electroless etching" which was when (100) c-Si was immersed in the solution containing silver nitrate and hydrofluoric acid. Si was etched by fluoric ion and released electrons to combine with silver ion to form Ag particles.

制作矽奈米线阵列的方式为无电镀蚀刻法，系将一p-type(100)之矽基板置入氢氟酸与销酸银的混合蚀刻液中，当溶液中之氟离子与矽基板接触后，矽即被解离成矽离子并放出一颗电子。

Contains the first five of Lindsay's etchings to be used as book illustrations.

包含的第一个五年的琳赛的蚀刻被用来作为本书插图。

Owing to the geometrical symmetry of microdisk cavities, they support whispering gallery modes in which light circulates around the periphery of the structure and is confined by total internal reflections at both the sidewall and the top and bottom surfaces of the MD.

在微碟共振腔圆柱对称的结构中，电磁场藉由在碟缘墙面上全反射环绕而形成共振，产生所谓的WGM模态，透过湿式蚀刻，让微碟上下表面暴露於空气中，使相对折射率差异大，因而场型更能够对称地被局限在微碟共振腔内。

Such alloys are best solvent degreased and given a light etch in Deoxidiser 7/17 before the Alocrom treatment.

在ALOCROM 处理前，这些合金在脱氧剂Deoxidiser 7/17中最好的被溶剂脱脂并造成轻度蚀刻。

While the Chinese are sometimes represented in romantic ways, particularly in paintings or etchings, they are also at times represented as an amorphous threatening horde.

尤其是在绘画或蚀刻版画，华人有时代表罗曼蒂克的方式，但他们常常被认为是一伙具有威胁性的种群。

We are left with an odd and possibly fictional story: what we see, after all, is a plain old fruit pit.

哎糟糕！文字解释说这些蚀刻的细节多多少少已被时间磨损，只留给我们怪异似小说情节的故事：毕竟我们看到的，只是一个普通的旧果核。

A process for making an electronic device which comprises applying a nonaqueous plate-resistant ink by ink jet printing to selected areas of a dielectric substrate, optionally laminated with an electrically conductive metal, exposing the plate resistant ink to actinic and/or particle beam radiation to effect polymerisation, adding one or more metal layers by electrolytic or electroless deposition, the upper layer of which is an etchresistant metal, removing the polymerised plate-resistant ink with alkali and finally removing the electrically conductive metal which are optionally directly laminated to the dielectric substrate and not protected by an upper layer of etch-resistant metal by chemical etching wherein the plate-resistant ink is substantially solvent-free and comprises: A 30 to 90 parts acrylate functional monomers free from acid groups comprising mono- or higher functionality wherein 5 to 95% by weight are mono-functional monomers; B 1 to 30 parts acrylate functional monomer containing one or more acid groups; C 0 to 20 parts polymer or prepolymer; D 0 to 20 parts radical initiator; E 0 to 5 parts colorant; F 0 to 5 parts surfactant; and where the ink has a viscosity of not greater than 30 cPs at 40 DEG C and all parts are by weight.

一种制备电子装置的方法，所述方法包括以下步骤：通过喷墨印刷在任选层压了一种或多种导电金属的介电底材的选定区域涂覆非水的阻沉积油墨，将所述阻沉积油墨暴露在光化辐射和/或微粒束辐射中以完成聚合，通过电解沉积或无电沉积增加一层或多层金属层，其中最上层的金属层为一种或多种阻蚀刻金属，用碱除去聚合的阻沉积油墨，最后通过化学蚀刻将任选直接层压在所述介电底材上并且不被一种或多种阻蚀刻金属的上层保护的导电金属除去，其中所述阻沉积油墨基本不含溶剂，并且包含以下组分：A30-90份不含酸基团的丙烯酸酯功能性单体，所述单体包括单官能或多官能单体，其中5-95％重量为单官能单体；B1-30份包含一个或多个酸基团的丙烯酸酯功能性单体；C0-20份聚合物或预聚物；D0-20份自由基引发剂；E0-5份着色剂；和F0-5份表面活性剂；其中所述油墨的粘度在40℃下不高于30cPs，并且所有的份数以重量计。

The split between the two groups can hardly be papered over.

这两个团体间的分歧难以掩饰。

This approach not only encourages a greater number of responses, but minimizes the likelihood of stale groupthink.

这种做法不仅鼓励了更多的反应，而且减少跟风的可能性。