蚀刻剂

Usage: It can be utilized for industrial hydro processing liquid, printing board acid, circuit board acid, oxidant and mordant for the dying industry, catalyst for the orgainc indusry, as well as the material to build chalybeate and colorant.

iexcl；用途：用作工业水处理剂、净水剂、印刷制版腐蚀剂、电子行业蚀刻液、染料工业的氧化剂和媒染剂、有机合成工业的催化剂和制造其它铁盐、颜料的原料。

The fourth part of this work was to enhance the RIE resistance of the photoresist by substituting the cycloolefin structure for the acrylate structure.

第四部份延伸第三部份之脱水交联反应机制於环烯类负型树脂，并验证环烯类光阻剂具有较压克力光阻剂更优秀的抗蚀刻能力。

Operates concurrently product: Glues net glue, Envelop side glue, All sorts of a wind of printing printing ink; Glass printing ink; Liquid state sensitization resists etch printing ink; PVC printing ink wait for series product, Imports homemade net yarn, Imports glue scrape, Homemade glue scrape; Water property fiscal stamp slurry, Increase thick dosage, Additive agent, Sends dunk slurry, Washes board water, Washes net water, Activator waits for fiscal stamp material, Water paint, A wind of printing machine, Equipment and equipment, Is consumer customization different duotone.

兼营产品：粘网胶、封边胶、各类丝印油墨；玻璃油墨；液态感光抗蚀刻油墨；PVC油墨等系列产品、进口国产网纱、进口胶刮、国产胶刮；水性印花浆、增稠剂、添加剂、发泡浆、洗板水、洗网水、显影液等印花材料、水性涂料、丝印机械、器材及设备，为客户定制不同网版等。我公司的宗旨是"诚信求发展、守诺求生存"我们会真诚与印刷界的朋友合作，并努力帮助解决产品的技术问题和售后服务，让我们在合作当中开拓进取、共求发展，在此我公司全体员工恭祝：网印界的朋友们事业腾飞、工作顺利！

The BARC layer is etched with a significant negative etch bias to reduce the critical dimension of the opening in the multi-layer mask below the lithographically define dimension in the photoresist.

使用有效的负性蚀刻偏置蚀刻该BARC层以减小在该多层掩模中的开口的特征尺寸至在该光致抗蚀剂中的平版印刷所确定的尺寸之下。

Spraying is preferred, especially where the metal or alloy is in the vertical position since this allows for quicker removal of the chemical etchant containing removed metal and/or alloy.

喷涂是首选，尤其是在金属或合金的，因为这更快含有的化学去除金属蚀刻剂和/或合金的撤消，允许垂直位置。

In the textile s industry for delinting of cotton seeds and the reclamation of wool, gasoline refining, the manufacture of organic and inorganic chlorinated compounds, and in the manufacture of semiconductors as an etchant.

纺织工业中用于除棉籽和毛线的回收、汽油精制、有机和无机氯化合物的生产、半导体生产中作为蚀刻剂。

Thorough cleansing of joints and surfaces to remove electrolytic residue, including PC etchants, body salts, and processing chemicals, will minimize the effect of these parasitic batteries.

彻底清洁接点和表面可以清除电解残余物，包括印制电路蚀刻剂、人体盐和化学处理药品，会将这些寄生电池的影响降至最低。

With the dose of 7.04 mC/cm2, ODT/Au will become a more strengthened structure and then form a negative resist in the correlation with cross-linking from alkyl matrix, partial breakdown of S-Au bonding and surface adsorption by air-borne species. Thus, it can obtain a gold pattern via gold-etching process. Besides, as a result of massive breakdown of alkyl matrix and S-Au bonding from ODT/Au under irradiation with doses of 64.06 and 128.13 mC/cm2, ODT SAMs would form a loose-packed structure on the gold substrate. The ODT/Au becomes less resistive for gold-etching and a positive gold pattern would form after gold-etching.

结果发现：以50 eV 低能量电子在照射剂量7.04 mC/cm2微影并曝露於大气后，受到来自於ODT/Au碳链间的交联、部分的S-Au键结破坏以及照射后立即曝露大气所吸附於表面的碳氧化物种的共同影响下，ODT SAMa於Au膜基材上将形成更紧密复杂的结构而作为负型阻剂，经后续湿式蚀刻15分钟后将显影出来Au的负型图案；当提升照射剂量至64.06及128.13 mC/cm2后，由於ODT/Au上碳链及S-Au键结的大量破坏，将使ODT/Au结构不能稳固且紧密地排列於Au膜基材上，显影时Au蚀刻液将容易穿过ODT SAMs抵达S/Au界面而移除Au，而形成正型图案。

In this study, alkanethiolate molecules with -CH3 terminated tail group chemically adsorb upon Au substrate and form Au-S bonds, which potentially act as ultra-thin resist films with excellent uniformity in molecular order and high resistivity to chemicals.

且因CH3 官能基表面具化学惰性，针对特定化学蚀刻液拥有抵抗化学腐蚀之能力，以此特性将可应用於制作微奈米等级图案的超薄蚀刻阻剂。

A process for making an electronic device which comprises applying a nonaqueous plate-resistant ink by ink jet printing to selected areas of a dielectric substrate, optionally laminated with an electrically conductive metal, exposing the plate resistant ink to actinic and/or particle beam radiation to effect polymerisation, adding one or more metal layers by electrolytic or electroless deposition, the upper layer of which is an etchresistant metal, removing the polymerised plate-resistant ink with alkali and finally removing the electrically conductive metal which are optionally directly laminated to the dielectric substrate and not protected by an upper layer of etch-resistant metal by chemical etching wherein the plate-resistant ink is substantially solvent-free and comprises: A 30 to 90 parts acrylate functional monomers free from acid groups comprising mono- or higher functionality wherein 5 to 95% by weight are mono-functional monomers; B 1 to 30 parts acrylate functional monomer containing one or more acid groups; C 0 to 20 parts polymer or prepolymer; D 0 to 20 parts radical initiator; E 0 to 5 parts colorant; F 0 to 5 parts surfactant; and where the ink has a viscosity of not greater than 30 cPs at 40 DEG C and all parts are by weight.

一种制备电子装置的方法，所述方法包括以下步骤：通过喷墨印刷在任选层压了一种或多种导电金属的介电底材的选定区域涂覆非水的阻沉积油墨，将所述阻沉积油墨暴露在光化辐射和/或微粒束辐射中以完成聚合，通过电解沉积或无电沉积增加一层或多层金属层，其中最上层的金属层为一种或多种阻蚀刻金属，用碱除去聚合的阻沉积油墨，最后通过化学蚀刻将任选直接层压在所述介电底材上并且不被一种或多种阻蚀刻金属的上层保护的导电金属除去，其中所述阻沉积油墨基本不含溶剂，并且包含以下组分：A30-90份不含酸基团的丙烯酸酯功能性单体，所述单体包括单官能或多官能单体，其中5-95％重量为单官能单体；B1-30份包含一个或多个酸基团的丙烯酸酯功能性单体；C0-20份聚合物或预聚物；D0-20份自由基引发剂；E0-5份着色剂；和F0-5份表面活性剂；其中所述油墨的粘度在40℃下不高于30cPs，并且所有的份数以重量计。

According to the clear water experiment, aeration performance of the new equipment is good with high total oxygen transfer coefficient and oxygen utilization ratio.

曝气设备的动力效率在叶轮转速为120rpm～150rpm时取得最大值，此时氧利用率和充氧能力也具有较高值。

The environmental stability of that world - including its crushing pressures and icy darkness - means that some of its most famous inhabitants have survived for eons as evolutionary throwbacks, their bodies undergoing little change.

稳定的海底环境─包括能把人压扁的压力和冰冷的黑暗─意谓海底某些最知名的栖居生物已以演化返祖的样态活了万世，形体几无变化。