蚀刻

In the first part of processing equipment, will see the need for coverage in regional operations after autoradiography revealed, without coverage in the region through metal etching zone will be in addition to corrosion.

因此在处理设备的前段，会看到需要覆盖的区域在显影作业后呈现出来，而未覆盖的区域在经过蚀刻区后金属会被蚀除。

The method includes the following steps: a semiconductor basal body is provided and the insulating layer of the semiconductor basal body is plated with light-sensitive lacquer and then is exposed in light and at last is developed; etching process is carried out to make a through hole on the insulating layer; cineration process is done, the remanent light-sensitive lacquer is removed and the temperature for the cineration process is 20-50 DEG C; wet cleaning process is carried out.

该制造方法包括如下步骤：提供半导体基体，对半导体基体的绝缘层进行镀光刻胶步骤、曝光步骤、显影步骤；进行蚀刻步骤，在绝缘层上形成通孔；进行灰化步骤，将剩余的光刻胶移除，且灰化步骤的温度条件范围是20-50摄氏度；进行湿法清洗步骤。

A steel doctor blade pushes against the engraved cylinder, forcing ink into the etched detail.

阿钢刮刀刻推缸反对，强行进入详细蚀刻油墨。

Erosibility and prbroin to reveal some of the glass, that is, you need to etch pattern.

抗蚀膜上露出玻璃的部分，即是需要蚀刻的图案。

Dichromate colloid solutions employed in photoengraving provide acid resists through the action of light on the sensitized surface.

重铬酸盐胶液是照相蚀刻版所用的感光液及抗蚀膜。光线的照射引起它的抗蚀作用。

Etching:(1)In photoengraving,the eating away of the non-printing areas of the printing plate by acid to produce a relief printing surface,or in gravure,the eating away of the image into the copper printing plate by acid.

1腐蚀，(2)版面腐蚀，(3)蚀刻版画：(1)在照相雕版方面，用酸把非印纹部份蚀去，造成凸版。在版方面，则用酸把铜片上的印纹蚀去。

Thermoplastic etching is 7building, paraffine, bitumen, stearic acid, and prepared by adding a small amount of ofmaize-erosibility-erosibility powder create ink, print by thermal print, press the design pattern, squeegee the ink to the glass surface, forming a anti-erodibility film.

热塑性蚀刻丝印，是将石蜡、沥青、硬脂酸等所配制的粘合剂，加入少量的抗蚀粉调制成抗蚀印料，通过热印丝网版，按设计图样，把印料刮印至玻璃表面，形成抗蚀膜的。

As the feature size decreases below the wavelength of the illumination system, the diffraction and other effects arising from resist developing and etching causes more and more distortion in the pattern transfer process. Today, new chips with very small feature size can not be manufactured without the support of RETs, OPC is one of the most important technologies in such RETs.

随着集成电路的特征尺寸逐渐下降到光刻所用的光源波长之下，由于光的衍射和光刻胶显影蚀刻等因素带来的不可避免的影响，硅片上实际印制出来的图形与设计图形不再一致，这使得如今的制造工艺已经离不开RET技术的支持，而OPC则是RET技术中的一项重要内容。

Because of diffraction and other physical phenomena during mask making, optical lithography and etching under Sub-Wavelength Lithography, the mask patterns are not the same as printed shapes on silicon wafer.

在亚波长光刻下，由于掩模制造、光刻和蚀刻过程中光的衍射及其它物理现象，导致掩模图形和硅片表面实际印刷图形之间不再一致。

The exposed areas of metal or alloy which are not protected by the polymerised etch-resist layer are then selectively removed by chemical etching from those areas protected by the etch-resist layer.

暴露的金属或合金的地区不属于蚀刻的聚合性保护抵制层，然后有选择地去除蚀刻由保护层这些地区的抵抗化学腐蚀。

According to the clear water experiment, aeration performance of the new equipment is good with high total oxygen transfer coefficient and oxygen utilization ratio.

曝气设备的动力效率在叶轮转速为120rpm～150rpm时取得最大值，此时氧利用率和充氧能力也具有较高值。

The environmental stability of that world - including its crushing pressures and icy darkness - means that some of its most famous inhabitants have survived for eons as evolutionary throwbacks, their bodies undergoing little change.

稳定的海底环境─包括能把人压扁的压力和冰冷的黑暗─意谓海底某些最知名的栖居生物已以演化返祖的样态活了万世，形体几无变化。