蚀刻

There are unsolved problems, such as laser-induced damage and long processing time, but this technology has provided an efficient way to improve performance of multicrystalline solar cell.

但是激光刻蚀对硅片性能仍有一定损伤，有待改进。

Etched-Diffraction-Grating is a kind of MUX/DEMUX with compact structure, good performance, and high reliability.

刻蚀光栅式分波合波器具有结构紧凑、可靠性高、成本低等优点。

Today, there are nonconventional established surface patterning techniques such as nanoimprint lithography and FIB which are commercially available. However, these processes are normally highly costly and also not well established for large area processing in particular for flexible substrate.

尽管非传统微纳表面构型技术已经开发成型并商业化，如纳米压印平面印刷(nano-imprinting lithography)和聚焦离子束刻蚀技术，但这些工艺技术通常费用昂贵，而且在用于大面积工艺制造上，尤其是在处理柔软基板材料时遇到困难。

For thermally curable etch-resist inks comprising an activated olefinic group the activated olefinic monomer preferably contains a metal chelating group.

对于热固化刻蚀抵制油墨组成一组激活烯烯单体的活性最好包含一个金属螯合组。

The SiO_2 microdisk resonators with vertical sidewall have been achieved with RIBE in the world. 4 Research of the silicon etching.

在国际上首次通过RIBE得到具有垂直侧壁的SiO_2微谐振腔。4对采用适宜的Si刻蚀方法得到SiO_2微盘谐振腔支撑进行实验研究。

The RIE and RIBE methods were presented to transform supermicro pattern. Through studying the influence of etching parameters on surface profile, we gained perfect grating structure on silica substrate.

提出并研究了用RIE和RIBE方法实现微结构面形传递，详细研究了各种刻蚀参数对最终面形的影响，实现了在石英基底上的理想传递。

With this method,controllable,clean,tensionless nano-contacts for spin polarization probing can be obtained.

该方法采用聚焦粒子束刻蚀和磁控溅射，可以获得可控的、干净的、无应力的纳米接触用于自旋极化探测。

The images of atomic force microscopy show that the roughness of etched surface gets rugged in comparison with the unetched surface.

原子力显微镜分析表明，刻蚀后的薄膜表面粗糙度变大。

Nanocrystalline Cu films were prepared on an unetched glass substrate by an electroless plating technique with using Sodium Dodecyl Benzene Sulfonate as an additive in the bath.

利用化学镀铜工艺，以十二烷基苯磺酸钠作为镀液添加剂，在未经刻蚀的玻璃表面制备了纳米铜膜。

The author have done numerous processing to work out new processing such as polymer coating and cure and triple - layer - metal film vaporing .

作者经过反复的工艺实验，确定了聚合物波导涂膜和固化、三层金属电极蒸发和腐蚀等新工艺的参数，并得到了聚合物紫外固化、等离子体刻蚀等新工艺的初步数据。

The split between the two groups can hardly be papered over.

这两个团体间的分歧难以掩饰。

This approach not only encourages a greater number of responses, but minimizes the likelihood of stale groupthink.

这种做法不仅鼓励了更多的反应，而且减少跟风的可能性。