蚀刻

An array of permalloy core solenoids is micromachined as microactuators on (100) silicon wafer. Then anisotropic etching of silicon in KOH solution forms the U-grooves beside the microactuators. The micromachining difficulties from the coexistence of 3-D MEMS devices and deep grooves on chip are overcome successfully. Then two fibers and permalloy piece are assembled onto the wafer together with the microstructures finishing the prototype of the new type MEMS VOA. Third, the inductance, resistance and Q value of the microfabricated solenoids are measured in the frequency range of 1-40 MHz.

第二，新开发了使用SU-85的正胶、负胶复合微加工工艺，在（100）硅片上加工了新型可变光衰减器的铁芯MEMS螺线管型电磁微执行器阵列；用KOH水溶液对（100）硅片进行湿法刻蚀，在电磁微执行器旁边微加工了V形槽结构组合，开发了单片集成三维MEMS器件和深槽的微加工关键技术；然后经过微装配制作出了电磁驱动的光纤偏移型MEMS可变光衰减器的样机。

An exceptionally clear adhesive can be made from fish and was the first adhesive used for photographic emulsions for photo film and photo resist coatings for photoengraving processes.

从鱼身上可以提取制成极其透明的粘胶，在胶片的感光乳胶和光刻蚀工艺的光阻涂层中首先被用作粘合剂。

On the basic of theory, experimental studies on laser cutting and polishing diamond film were carried out.

并且在实验研究的基础上，分析了激光刻蚀金刚石材料的基本规律。

In order to achieve a high inductance value and Q-factor,UV-LIGA,dry etching technique,fine polishing and electroplating technique are adopted.

为了获得高电感量和Q值，采用UV-LIGA、干法刻蚀、抛光和电镀技术，研制的电感大小为1500μm×900μm×70μm，线圈匝数为41匝，宽度为20μm，线圈之间的间隙为20μm，高深宽比为3.5∶1。

Ion beam etching of quartz and BK7 Glass.

石英和BK7 玻璃的离子束刻蚀特性研究。

This dissertation mainly focused on the growth and characterization of GaN based materials grown by radio frequency plasma assisted molecular beam epitaxy.

本文研究了GaN和AlGaN/GaN材料的射频等离子体分子束外延生长及其特性，并对相关器件工艺中的若干重要问题如刻蚀、欧姆接触等，进行了初步探索。在前人工作的基础上，进一步优化了GaN材料的生长工艺，并深入研究了材料生长过程中的一些重要问题。

This dissertation mainly focused on the growth and characterization of GaN based materials grown by radio frequency plasma assisted molecular beam epitaxy. Some of the devices related technics, such as etching and ohmic contact, were also discussed.

本文研究了GaN和AlGaN/GaN材料的射频等离子体分子束外延生长及其特性，并对相关器件工艺中的若干重要问题如刻蚀、欧姆接触等，进行了初步探索。

A new method named Film Heating-Forming Photoresist Method is proposed to fabricate MLA with long focal length and expand the range of relative aperture of MLA.

提出一种制作凹透镜阵列的新的方法—曲率倒易刻蚀法，在Si、SiO〓等衬底上成功地制作出凹透镜阵列器件，为国内首创。

The tip 's radius of curvature and the relative position to the surface of the sample that influenced the distribution of the surface electric field,thus affected the structure of the oxide.

利用原子力显微镜AFM进行阳极氧化纳米刻蚀加工的实质是电场作用下发生下的电化学反应，探针是影响氧化加工重要的因素。

Computer optical element based on light-wave diffraction theory is through that etches on film base to produce relievo structure with two or multiple sidestep depths , and form pure phase and coaxial recurrence , so it has higher diffraction efficiency .

计算机光学元件基于光波衍射理论，通过在片基上刻蚀产生两个或多个台阶深度的浮雕结构，形成纯相位并同轴再现，使其具有极高的衍射效率。

Neither the killing of Mr Zarqawi nor any breakthrough on the political front will stop the insurgency and the fratricidal murders in their tracks.

在对危险的南部地区访问时，他斥责什叶派民兵领导人对中央集权的挑衅行为。

In fact,I've got him on the satellite mobile right now.

实际上 我们已接通卫星可视电话了