蚀刻

By adjusting the etch time and the concentration of acid in the process, different shapes of the tunnels can be obtained.

在栅极制作过程中通过改变酸液刻蚀的时间和浓度，可以腐蚀出不同形状的小孔。

The transition pressure calculated by the model is much closer than that calculated by the existing model. A modified model of squeeze film air damping is developed for the design of high-aspect-ratio damping holes formed by deep RIE process.

本文还提出了开有高深宽比的阻尼孔的多孔板的压膜阻尼的修正模型，为采用深反应离子刻蚀技术制作的阻尼孔的设计提供了手段。

Feeding can, output can and etching gas transmission system are connected on the reaction chamber, plate type positive and negative electrodes installed in parallel in the reaction chamber, with the negative pole connected with the water cooling device that connected with seal wave tube and the bottom of the reaction chamber actively, bottom of the water cooling device connecting with the vibrating source through vibrating shift lever, with the seal wave tube, vibrating shift lever and vibrating source on the bottom bracket that fastened to the bottom and installed on the oblique angle adjusting bracket.

本发明反应室上连接投料罐、出料罐和刻蚀气体输送系统，反应室内平行装有板式阳极和阴极，阴极与水冷装置连接，水冷装置通过密封波纹管与反应室底部活动连接，水冷装置底端通过振动转换杆连接振动源；密封波纹管、振动转换杆和振动源位于底架上，底架与反应室底部固定连接并安装于倾角调整支架上。

The influence of excessive etching on the performance of the beam splitter/combiner during fabrication is analyzed deeply.

深入分析了制作中的过刻蚀对性能产生的影响。

Luminescence properties of basal plane dislocations in 4H-SiC are studied by means of cathodoluminescence and defect selective etching.

本文利用阴极荧光和选择性刻蚀的方法对4H-SiC同质外延材料中基面位错的发光特性进行了研究。

The most significant advance of the work described in this thesis is as follow.1 The silica microdisk optical resonator which exhibit whispering-gallery-type modes with quality factors 1×10~5 have been fabricated firstly with standard photolithographic techniques and dry etching in China.

论文主要工作和创新之处包括：1在国内首先通过光刻方法以及干法刻蚀方法得到高Q值微盘谐振腔，微盘腔的Q值达到约1×10~5。

The above results show that ths possible to solve the difficuit problem of laser electrochemical etching include traverse and rate by modulation of polar distance.

研究结果说明，通过电极距离调节这一简单方式，有可能解决激光电化学刻蚀速度慢、横向钻蚀严重等难题。

A multi-layered mask includes a lithographically patterned photoresist and an un-patterned organic antireflective coating formed over a substrate layer to be etched.

多层掩模包括形成在待刻蚀的衬底层上平版印刷图形化的光致抗蚀剂和未图形化的有机抗反射涂层。

The main contents are: Status and prospects of micro/nano fabrication technology, semiconductor substrates, vacuum science and plasmas. Several unit processes of microfabrication like diffusion, thermal oxidation, ion implantation, optical and nonoptical lithography, etching, physical deposition, chemical vapor deposition and epitaxial growth. Process integration of these unit processes for example CMOS technique and silicon bipolar technique, microelectro mechanical systems and some nano fabrication technologies will be introduced.

主要内容有：微米/纳米制造技术的现状和展望、半导体衬底、真空科学和等离子体，各种单项微电子加工工艺，如扩散、热氧化、离子注入、光学和非光学光刻、刻蚀、物理淀积、化学气相淀积、外延生长等，以及各种单项工艺的集成技术，如CMOS技术和硅双极型工艺技术，并初步介绍微电子机械系统和纳米加工技术。

Remove excess water with an air-blower.if the etched enamel doesn't have chalk-white/matt external appearance,repeat this etching process.

用空气吹管吹净剩余水。如果刻蚀后珐琅质外观不是石灰白色/暗淡，重复此刻蚀过程。

The split between the two groups can hardly be papered over.

这两个团体间的分歧难以掩饰。

This approach not only encourages a greater number of responses, but minimizes the likelihood of stale groupthink.

这种做法不仅鼓励了更多的反应，而且减少跟风的可能性。