蚀刻

Some new processes and technologies for electronics finishing were introduced, such as wafer plating, electrochemical mechanical polishing, microelectro-mechanical system plating, copper plating using insoluble anode, platinized niobium electrode, lead and cadmium free eleclroless nickel, recycling of alkaline etching solution and reclaiming system of copper.

介绍了电子电镀中的若干新工艺新技术，如芯片电镀、电化学机械研磨、微机电系统电镀、不溶性阳极电镀铜、镀铂铌电极以及无铅无镉中磷光亮化学镀镍、碱性蚀刻液再生和铜回收系统等。

Some new processes and technologies in electronics finishing such as wafer plating, eCMP,MEMS plating, lead and cadmium free electroless nickel,copper plating using insoluble anode and recycling of etching solution for PCB industry and platinized niobiumelectrode are briefly introduced.

文对电子电镀中若干新工艺新技术如芯片电镀、化学机械抛光、MEMS 电镀、PCB 工业中采用不溶性阳极电镀铜工艺以及铜蚀刻液回收再生、无铅无镉化学镀镍、镀铂铌电极等进行了简要介绍。

Some new processes and technologies in electronics finishing such as wafer plating, e CMP ,MEMS plating,lead and cadmium free electroless nickel,copper plating using insoluble anode and recycling of etching solution for PCB industry and platinized niobiumelectrode are briefly introduced.

文对电子电镀中若干新工艺新技术如芯片电镀、化学机械抛光、 MEMS 电镀、PCB 工业中采用不溶性阳极电镀铜工艺以及铜蚀刻液回收再生、无铅无镉化学镀镍、镀铂铌电极等进行了简要介绍。

More recently, IMF has broadened its interests to cover all aspects of materials surface engineering including plating, PVD coating, chemical etching, paint and powder coating, pre-treatment and post treatment processes.

近年来，金属精饰研究所主要发展表面工程材料，如：电镀、真空涂层、化学蚀刻、油漆及粉末涂料、预处理和后处理工艺。

Things such as wtc cradles, metal etching, small detail parts like cleats and the periscopes are a work in progress to ensure fit and scale.

的东西，如世台会的摇篮，金属蚀刻，小细节的部分一样， cleats和潜望镜是一项进展中的工作，以确保适当的规模。

The purpose of this thesis is to design an inkjet system for microelectronic fabrication process using a commercial inkjet printer. The inkjet system is expected to be applied in microelectronic fabrication to achieve cost down, fast prototyping and less environmental pollution.

中文摘要本文重点在设计制作一套可喷印绘制电路图形的喷墨系统及其制程研究，期望能以喷墨技术制作印刷电路板及电子元件，提供有别於现有制造印刷电路板、电子元件中微影、蚀刻制程的制作方式，来达到降低成本、减少开发时程及环境污染，以符合未来趋势的需求。

As above mentioned, it could be improved the optics characterization of films efficiently by textured aluminium doped zinc oxide films by wet etching. Using solar cells as transparent electrode enables the light passed through solar cells and reduceds reflectance to permeate into absorb layer of solar cells and improve conversion efficiencies of solar cells.

由上述的光学性质变化中可得知，经由湿式蚀刻过程后的氧化锌掺铝薄膜确实能有效改善薄膜的光学特性，对於应用於太阳电池中当透明电极使用时，能使更多入射光通过元件表面而进入吸收层内，帮助提升太阳电池的转换效率。

The results showed that stripping rates were strongly dependent on the concentration of H2O2 in alkaline solution and also affected by the crystal structure of TiN film. The aim of this study was to provide a formula solution for removing TiN film without damaging the substrate surface.

实验结果显示，碱性过氧化氢水溶液为蚀刻主要因子，并由此研究提供最佳之溶液组成配方，以达到去除氮化钛薄膜之应用，且在不损伤基材表面下完成。

Also, if you on the same Panel on a narrow lead site and interval width wire parts of State-wide wire distribution interval, etching is excessive.

同样如果在同不活背上的隔断广的导线部位和隔断阔的导线部位状况下，隔断阔的导线漫衍的部位，蚀刻不离会功度。

Etching method applied to large-quantity, variety, large flat thin metal material processing and metal product surface decoration process (semi-corrosion), but also applies to single-piece and small-batch sampling.

蚀刻法适用于批量大、品种多、大平面的薄型金属材料加工和金属制品表面工艺装饰，同时也适用于单件小批打样。

The split between the two groups can hardly be papered over.

这两个团体间的分歧难以掩饰。

This approach not only encourages a greater number of responses, but minimizes the likelihood of stale groupthink.

这种做法不仅鼓励了更多的反应，而且减少跟风的可能性。