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NH4OH and triethanolamine. The reaction mechanism of chemical deposition was studied, and the optimum reaction condition was obtained.

在不同条件下制备样品,初步得到了制备SnS薄膜的优化条件,并研究了超声辅助手段对薄膜品质的影响。

The effect of electrolyte additive of vinylene carbonate on the SEI layer properties was investigated in details.

VC添加剂大大提高了硅薄膜的循环性能,硅薄膜的200次循环容量保持率在常规电解液中为25.6%,在功能电解液中提高到78.5%。

To improve the properties of FeS2 thin films, the influence of sulfurizing pressure on the microstructure and optical absorption characteristics of the FeS2 films was investigated.

为了提高FeS2薄膜的性能,研究了硫化压力对FeS2薄膜组织结构和光吸收性能的影响规律。

The surface topographies of silver oxide thin films prepared at different oxygen flow ratios have been studied by the atomic force morphology.

制备了不同氧分压比的AgOx薄膜,对其进行了原子力形貌观察,发现分压比0.4时,薄膜的粗糙度最小,均匀性也最好。

The surface topographies of silver oxide thin films prepared at different oxygen flow ratios have been studied by the atomic force morphology.

资料简介:制备了不同氧分压比的AgOx薄膜,对其进行了原子力形貌观察,发现分压比0.4时,薄膜的粗糙度最小,均匀性也最好。

The aim of this research work is to deposit diamond or diamond-like carbon films by electrodeposition technology. It is the first time to report that DLC films can be obtaind in liquid phase by this method. We have also studied its correlation problem.

本文主要采用电化学淀积法进行合成金刚石薄膜的尝试,首次报道了采用这种方法可以在液相中获得类金刚石薄膜,并对与其相关的一些问题进行了研究。

Columnar structure, which is observed in the films deposited by conventional magnetron sputtering, disappears in the film synthesized at ICP power of 200 W and substrate temperature of 300℃.

利用感应耦合等离子体增强射频磁控溅射技术在Si(111)片和M2钢表面制备了ZrN薄膜,研究了基片的温度和ICP功率对ZrN薄膜的结构以及性能影响。

The surface of each variety of the cathodes is checked with scanning electron microscope before and after activation.

从分析覆膜钡钨阴极薄膜的机械性能——附着力和内应力入手,分析了薄膜产生开裂的原因。

The influences of deposition time on the covercivity and saturation magnetization of electroless CoWP thin films were studied, and the surface topography, elemental composition, micro-structure and magnetic properties of CoWP thin films were tested respectively by FSEM , XRD and VSM.

研究了施镀时间对化学镀CoWP薄膜矫顽力和饱和磁化强度的影响,并利用场发射扫描电子显微镜、X射线衍射和振动样品磁强计研究了CoWP磁性薄膜的表面形貌、成分、微结构及磁学性能。

The dopants Sb and In influenced the gas-sensitivity of the film by changing the electronic structure of the film, i.

掺杂剂Sb和In是通过改变薄膜的电子结构而影响薄膜的气敏特性。

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