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It is found that the energy distributing model using Knoop indenter can effectively separate the intrinsic hardness of the thin film from the measured composite hardness.

认为采用努氏压头的能量分配模型可以有效地将薄膜硬度从膜基复合硬度中分离,从而得到薄膜的本征硬度。

Magnetic hysteresis loops were measured by an alternative gradient magnetometer,and the loops showed strong geometrical anisotropy.

用可变梯度磁力计测量了薄膜的磁滞回线,结果显示薄膜有很强的几何各向异性

In addition to the cyclic voltammetry, an electrochemical quartz crystal microbalance was used to study the growth mechanism and the properties of the films.

使用电化学石英晶体微天平配合循环伏安法以研究薄膜的成长机制及薄膜本身的特性。

The electrochemical quartz crystal microbalance and cyclic voltammetry were used to study the in situ growth of the hybrid poly/FAD and poly films.

使用电化学石英晶体微天平配合循环伏安法,以研究聚合发光胺/FAD混合薄膜的成长机制及薄膜本身的特性。

The structural modulability and chemical stability of hydrogenated amorphous Silicon Carbide a-Si_xC_(1-x:H films makes it suitable as a barrier layer for low K porous dielectric films.

非晶碳化硅薄膜的结构可调制性及化学稳定性使其成为Cu/超低k多孔介电薄膜结构的扩散阻挡层优异候选材料。

The electric and semiconductor properties were studied by four-probe method, and the results show that the Cu3N thin films are n-type semiconductor.

运用四探针法测量了薄膜的电学和半导体特性,证明了实验制备得到的Cu3N薄膜是一种n型半导体,禁带宽度约为1。

It is found that the growth mechanism of the iron films is similar to that of nonmagnetic films on liquid substrates,in accordance with a two-stage growth model.

实验发现铁薄膜的生长过程与液相基底表面非磁性金属薄膜的情况类似,基本服从二阶段生长模型。

The influence of sputtering pressure on structure character,morphology,overpotential,resistivity and growth rate was studied.

采用对靶直流磁控溅射设备制备镍铁氧化物催化薄膜,研究了溅射气压与催化薄膜的结构、表面形貌、过电位、电阻率及生长速率之间的关系。

The nitrogen content in terms of atomic percentage under different conditions was identified by X-ray photoelectron spectra.

同时用X射线光电子能谱确定了不同条件下薄膜中N原子的百分比,用原子力显微镜对薄膜的表面粗糙度及表面形貌进行了测量和表征。

By the measurement and analysis with the aid of X-Ray diffraction and spectral photometer the structure and optic-characteristics of the films,and the effects of different technological conditions,are studied respectively before and after heat treatment.

通过X射线衍射仪、分光光度计等测试分析,研究了不同工艺条件对上述薄膜性能的影响以及热处理前后薄膜的结构、光学特性。

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