薄膜层

The structural modulability and chemical stability of hydrogenated amorphous Silicon Carbide a-Si_xC_(1-x:H films makes it suitable as a barrier layer for low K porous dielectric films.

非晶碳化硅薄膜的结构可调制性及化学稳定性使其成为Cu/超低k多孔介电薄膜结构的扩散阻挡层优异候选材料。

In order to prepare the purified poly silicon thin film, we deposited a bed of nickel on the samples face by Magnetron Sputtering method, then put the samples into anneal for some time and cleaned them with diluted muriatic acid.

为了能制备出纯度高的多晶硅薄膜，我们采用磁控溅射法在薄膜上面沉积一层金属镍膜，然后进行退火处理并用稀盐酸清洗。

Using the vacuum system with the ion-beam assistance, the c-axis oriented and in a-b plane textured YSZ films based on the NiCr alloy and stainless steel substrates have been prepared with the Ar〓、O〓 ion-beam assistance by laser ablation at room temperature.

应用自研制的离子源辅助装置及其配套的激光沉积薄膜真空系统，在Ar〓、O〓离子源辅助激光沉积条件下，制备出了NiCr合金基片和不锈钢基片上c-轴取向和a-b平面内织构的YSZ过度层薄膜。

Xinle HuaBao Plastic Film Co.,Ltd.imports internationaladvanced production lines,by virtue of new technology and super technique of production ,deals with the exploitation,research and production of various plastic film.S o our company is a professional factory that produces high grade PEBA ventilating film and tri-layer co-extruded PE punching base material film at domestic.

新乐华宝塑料薄膜有限公司，引进具有国际先进水平的生产线，凭借新工艺和高超的生产技术从事塑料薄膜的开发、研制、生产，是当今国内生产高档PEBA透气膜、三层共挤PE打孔基材膜的专业厂家。

The invention relates to perforated films comprising at least one layer, and to packages prepared from the same.

本发明涉及包括至少一层的穿孔薄膜，以及由该薄膜制得的包装。

The anisotropic magnetoresistance and saturation magnetic field of the Permalloy thin films (Ni0.81Fe0.19) sputtered on a nonmagnetic (Ni0.81Fe0.19)0.66Cr0.34 buffer layer were measured. The AMR variations of the films after annealing and the size effect of the AMR stripes after etching were emphatically studied, and a qualitative analysis was proposed through a statistic model. The simulation results agree with the experiments.

研究了以非磁性（Ni0.81Fe0.19）0.66CR0.34薄膜作为过诞层的坡莫合金Ni0.81Fe0.19薄膜的磁电阻效应和饱和磁场，分析退火处理对样品饱和磁场的影响和经刻蚀后的磁电阻效应膜线的尺寸效应，并建立一个统计模型定性分析了其性能变化的机理，计算结果符合实验。

The influence of different assembled condition such as assembly method, concentration of zirconium source and pH value on the effectiveness of assembly were evaluated via DSC-TG, FT-IR, Uv-vis and SAXRD et al. It showed that the assembly effectivness of uncalcined 3 Si/Zr_10# sample was best.c The optical characteristic, which including light-conduction in infrared band and polarity in visible band, of dip-coating film and membrane assembled zirconia after processing parameters of assembly optimized were observed via FT-IR and Uv-vis. The polarity was characterized by polarizing angle through calculation from light-transmittance, light-reflectance and fresnel coefficient. qualitative analysis showed that the polarity of Si/Zr_10 # dip-coating film assembled was best.d Adopting zirconium oxychloride as zirconium source, CTAB as template, employing different CTAB adding sequence, two mesoporous zirconia samples were prepared. The template effect of two samples was discussed. It showed that the effect of the sample which CTAB adding sequence was same as mesoporous silica film was better. The light-conduction in infrared band of these samples was also studied, which offered comparison to the polarity of zirconium dioxide assembled within mesopore.

结果显示：组装条件优化后的uncalcined 3 Si/Zr_10#厚膜样组装效果最好，其组装液对应的pH值最利于该锆源离子模板交换组装； c选用FT-IR、Uv-vis对组装条件优化后纳米氧化锆/介孔氧化硅厚膜、纳米氧化锆/介孔氧化硅薄膜包括红外导光性、可见光区内的偏光性在内的光学特性进行了分析，其中偏光性以膜层透光性、反光性及菲涅耳系数计算出的偏振角即布儒斯特角表征，定性分析显示，Si/Zr_10#ZrO_2/介孔氧化硅厚膜偏光性最好； d以氧氯化锆ZrOCl_2·8H_2O为锆源，CTAB为模板剂，采用不同的模板剂加入顺序，探索性地制备两介孔氧化锆样，分析了两介孔氧化锆样的模板效果，得出模板剂加入顺序同介孔氧化硅薄膜时介孔氧化锆样的模板效果较好，并分析了所得样品的导光性，为锆氧粒子引起的附加光学特性分析提供了参考和对比。

The CN1 is abio-medium layer, the thin film that made from the vacuum evaporation deposit sulfur prussic acid kalium film reacting with the partly electrode with silver bottom.

其中的CN1为无机介质层，由真空热蒸发沉积的硫氰酸钾薄膜与部分银底电极反应获得的薄膜。

Experimental study of high temperature phase transformation for pyrophyllite

利用场发射扫描电镜表征了Zr-Co粉体的形貌特征和烧结后的陶瓷薄膜结构，热重分析了Zr-Co粉体烧结过程的失重和相转变吸放热过程，X射线衍射分析跟踪了不同温度段烧结体系的组成变化趋势，在此基础上对粉体烧结后陶瓷薄膜的防氧化效果进行了分析，结果表明：温度对粉体的颗粒形貌和晶相结构有较大的影响，高温烧结的粉体性质稳定，经过1200℃烧结后的陶瓷膜层具有很好的致密性，具有很好的防氧化效果。

In the present study,we stress the distinction between the process of deposition dynamicsand the process growth kinetics for the understanding of the atomistic mechanisms inenergetic depositions.

局域范围内的&瞬时&沉积模拟结果显示：随着沉积原子初始能量的增加，载能原子可以改变薄膜生长的局域表面形貌，促进薄膜的层状生长。

The split between the two groups can hardly be papered over.

这两个团体间的分歧难以掩饰。

This approach not only encourages a greater number of responses, but minimizes the likelihood of stale groupthink.

这种做法不仅鼓励了更多的反应，而且减少跟风的可能性。