薄膜

Because of these advantages of the lead oxide, the lead oxide thin films are widely used in the transparent conductive oxide thin films, camera tube, photoconductive detector, electrode materials, gas sensor and many other fields.

本文综合论述了金属氧化物薄膜的一些主要的制备方法，氧化铅的基本性质以及在现代技术中的一些应用和最新的进展，首次采用直流反应磁控溅射方法制备了氧化铅薄膜，并研究了工艺参数对氧化铅薄膜的晶体结构，光学性质的影响。

To improve the accuracy, as to the hardware, the quality of composite polymer films and adjustment of light path were controlled strictly, including cleanout of base, synthesis of solvent, filtering of solvent, preparation of the films and control of picturing. As to the process of picturing, adding gauge, foreground and background, many exposals in same angle were used, and the area of the films to measure was also chosen. As to software, picture analysis was mainly used to improve accuracy.

为了提高测量精度，在硬件方面严格控制复合聚合物薄膜的质量和光路的调整，包括：基片的清洗、溶液的配制、溶液的过滤、薄膜的制备、和摄像的控制等等，在采集图像的过程中，通过加标尺、测量前景和背景、同一角度下的多次曝光、薄膜测量区域的选择等等措施来消除误差；在软件方面提高测量精度方法主要采用图像处理的方法，并用自编的软件处理数据。

A model of cascade and overlay was established to explain the coacervation of the colloidal granules.

并对不同掺F量的多孔氧化硅薄膜的Ⅰ-Ⅴ特性和隙态密度进行了分析，发现少量HF的加入会优化薄膜的性质，而多余HF的加入会使得薄膜性质变差。

The micro movement of deposited cluster and the microstructure evolution of thin film have been studied in dimension of atom-cluster in this paper. There are some important applications to do deeply research on the migration, coacervation and nucleation of atom cluster, to optimize the deposition process, to enhance the characteristics of thin film.

在原子尺度上揭示膜层形成初期粒子的微观变化过程及膜层微观结构的演化规律，对深入了解表面粒子的迁移、吸附和成核，对改进和优化薄膜生长工艺、提高薄膜质量、改善薄膜性质具有重要意义。

Electrochemical characteristic of ITO/TiO2 electrode under UV irradiation was investigated using the method of cyclic voltammetry.

采用射频磁控溅射技术制备纳米TiO_2薄膜、SiO_2-TiO_2复合薄膜以及金属掺杂的M-TiO_2薄膜，并研究其光催化性和光致亲水性。

The method introduced recently by Li Guohong was used to produce AlCuCo decagonal quasicrystalline films, with different thickness. All the films have the same orientation that the ten-fold axis is perpendicular to the films.

我们采用新近报导的D相薄膜生长方法，制备了完全取向的D相AlCuCo薄膜，并利用薄膜样品的优势，对D相准晶的特性进行了光学和电学方面的研究。

A fitting curve between the decay time constant and the film thickness of YBCO was obtained, and the film thickness can be obtained from the fitting.

另外还作出了YBCO薄膜的薄膜厚度与衰减时间常量之间的关系曲线，提出了测量YBCO薄膜厚度的一种新方法。

Crystalline β-BBO thin films were successfully prepared on (001)-oriented Sr 2+-doped α-BBO substrates by using liquid phase epitaxy, pulsed laser deposition and vapor transport equilibration techniques. The films were characterized by X-ray diffraction and X-ray rocking curve. The present results manifest that the β-BBO thin films grown on Sr 2+-doped α-BBO substrates have larger degree of orientation f value and smaller X-ray rocking curve FWHM than the ones grown on other reported substrates.

采用液相外延法、脉冲激光沉积法以及气相传输平衡法在Sr 2+：α-BBO(001)衬底上生长了质量优异的β-BBO 薄膜，对薄膜进行了X射线衍射测试以及双晶摇摆曲线分析，结果表明，采用Sr 2+：α-BBO单晶作为衬底制备的β-BBO薄膜具有高的择优取向度和低的半峰宽值。

Based on these, the method for analysing the thermal-mechanical problems during the film depositon is proposed, and some mechanical problems are studied which include the asympototic analysis of the stress and deformation in a nonhomogeneous material layer on a substrate and the weight function method for interface crack problems as well as the mechanics of an interface toughening induced by the dilatant transformation.

本文对这些方面的研究及其成果进行了较全面的评述，并在考察了一个薄膜-基底系统（等离子喷涂ZrO〓陶瓷涂层的工艺研究）的生产研究的全过程的基础上，对薄膜沉积过程中的热-力学分析方法和包括表面异质层中应力变形的渐近分析方法、界面裂纹问题中的权函数方法、相变引起的界面增韧的力学分析方法等在内的一些薄膜-界面-基底系统的力学问题进行了研究。

In the end, we sum up the current research in the manganite thin films (such as the influence of oxygen stoichiometry, lattice-misfit strain and angle distortion induced strain on the thickness effects) and some existent issues.

最后讨论了锰氧化物外延薄膜的制备方法，及影响锰氧化物薄膜结构和电磁性质的相关因素(如氧含量，晶格失配应变，薄膜厚度，角度畸变及热膨胀系数等)以及期待解决的问题。

This one mode pays close attention to network credence foundation of the businessman very much.

这一模式非常关注商人的网络信用基础。

Cell morphology of bacterial ghost of Pasteurella multocida was observed by scanning electron microscopy and inactivation ratio was estimated by CFU analysi.

扫描电镜观察多杀性巴氏杆菌细菌幽灵和菌落形成单位评价遗传灭活率。