薄膜

We then systematically studied the adsorption of O2 molecules on Pb films withthickness ranging from 3 to 11 monolayers.

其次，本文系统研究了氧分子在Pb(111)薄膜上的吸附情况，以及吸附能被薄膜的量子尺寸效应调制的现象。

Aring; of nanometre LaOx particle . On the basis of the results of the previous chapters , a new thermionic emission mechanism was put forward.

薄膜&发射新观点，解释金属薄膜型阴极的热电子发射机理，更深入地揭示热电子发射的内在规律。&

In the reaction system of using non-ionic membrane, its mass-transfer resistance is greater than without the use of a membrane, so induction period is longer.

在使用非离子性薄膜的反应系统中，其所造成之质传阻力比在无薄膜反应系统大，故反应之诱导期较长。

In this paper, we deposited Cr films on Zircaloy substrate by D.C magnetron sputtering, and made a preliminary study on the microstructure of these films and the properties of microhardness and adhesion.

本文采用直流磁控溅射技术在锆合金基体上沉积制备了Cr膜，对不同处理条件下薄膜的微观形貌、结构以及薄膜的显微硬度和附着性进行了研究探讨。

The composition of the Cr film was identified by X-ray diffraction, the interface of Chromium/Zircaloy was studied with scanning electron microscopy, the morphology of Cr film was observed with atomic force microscopy.

使用X-射线衍射仪对沉积薄膜进行了物相分析，采用扫描电子显微镜和原子力显微镜对薄膜的表面形貌及膜／基界面做了观察分析。

The Zircaloy substrates were prepared with different pretreatment, then Cr films with the thickness of 0.5μm l.0μm 2.0μm 3.1 μrn and Cr/Nb Nb/Cr binary films were deposited with the same deposition parameters.

锆合金板基体经过不同的预处理后，采用直流磁控溅射方法，在相同的沉积参数下在其表面沉积了0.5μm、1.0μm、2.0μm、3.1μm厚度不等的纯cr薄膜以及Cr和铌的复合薄膜。

Polyimide ; film ; orientation structure ; film property ; X-Ray diffraction ; pin hole photograph ; determination of structure

聚酰亚胺；薄膜；取向结构；薄膜性能； x 射线衍射；针孔照相；结构测定

In the process of silicon nitride thin film prepared by PECVD, deposition parameters strongly influence the properties of silicon nitride thin film.

在PECVD 氮化硅薄膜的实验中，沉积参数在很大程度上影响乃至决定着氮化硅薄膜的性能。

A process for preparing superthin SiN film used as the protecting or dielectric layer of microelectronic or photoelectric material by electronic cyclone, resonance and microwave plasma technique is disclosed.

用电子回旋共振微波等离子体技术，适合于单晶Si衬底片，在一定微波功率条件下，通过调整(N2)/气体流速比，气压和生长时间控制薄膜厚度，在低温下生长超薄SiN薄膜。

Its basic principle, classification, applications, and new developments are introduced and described in detail. 2 A new optimum method named simulated annealing algorithm is introduced and applied in the analysis of the ellipsometric spectra. 3 Some new ferroelectric materials have been studied by the method mentioned above, and some new results achieved as follows. First, Ca-modified lead titanate ferroelectric thin films have been prepared by solgel processing. The optical constants spectra of the 〓(x=0.0-0.4, 0.24) films have been obtained, the structure properties of the thin films have been studied by XRD and AFM.

回顾了椭偏光谱近一个世纪的产生发展的历程，系统介绍了椭偏光谱的基本原理、物理模型，以及广泛应用与发展状况。2）介绍模拟退火算法这一新型的优化方法，并将其结合Forouhi-Bloomer模型和Sellmeier模型应用到椭偏光谱分析中。3）用上述方法分析几种新型铁电材料的光学性质，并获得以下结果：首先，第一次获得钛酸铅钙系列、钙原子含量分别为0％、10％、20％、24％、30％、40％的铁电薄膜的光学常数谱，并结合XRD和SEM分析其结构，发现随钙含量的增加，薄膜晶相发生变化。

For a big chunk of credit-card losses; the number of filings (and thus charge-off rates) would be rising again, whether

年美国个人破产法的一个改动使得破产登记急速下降，而后引起了信用卡大规模的亏损。

Eph. 4:23 And that you be renewed in the spirit of your mind

弗四23 而在你们心思的灵里得以更新