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It is found that the energy distributing model using Knoop indenter can effectively separate the intrinsic hardness of the thin film from the measured composite hardness.

认为采用努氏压头的能量分配模型可以有效地将薄膜硬度从膜基复合硬度中分离,从而得到薄膜的本征硬度。

When reflectivity of thin film surface is bigger, it is inexactness that interference between double light beam is only taken into account, the interference between multiple light beam must be taken into account.

薄膜表面的反射率较大时,只考虑薄膜产生双光束干涉是不严格的,必须考虑多光束干涉。

A new method of inscribing diffraction gratings by using a focused near-IR 800 nm femtosecond laser ablating gold film on glass substrate was reported.

提出了一种新的制备光栅的方法,利用800 nm的飞秒激光扫描蒸镀在石英玻璃衬底表面的金薄膜,通过烧蚀金薄膜在衬底表面形成衍射光栅。

It is shown that this kind of film a-CdSe has an excellent photoelectric characteristics of instaneous response to picosecond laser pulse by testing the responsive time of those detectors using ultrashort light train pulses emitting from a colliding pulse mode -locking Nd:YAG laser.

用对撞脉冲锁模Nd:YAG激光器产生的超短光脉冲序列对探测器的响应时间进行检测,结果表明a-CdSe薄膜对皮秒10~(-12秒级的超短光脉冲作用具有良好的瞬态响应光电特性,探讨a-CdSe薄膜快速弛豫过程的内在机理。

Nevertheless, the problem that the interdiffusion between ferroelectric thin films and substrate, as well as the ill-crystalization of interface, which results in the decreasing of the ferroelectric properties, remain to be solved.

对于薄膜,在较低的温度甚至室温下就可能发生显著的反应或互扩散。然而,在铁电薄膜/衬底间的互扩散和界面的结晶膜不好导致铁电体性能下降的问题一直未能得到很好的解决。

In the example, in the upper side layer of the pixel electrode 7a, an interelectrode insulating film 8, a common electrode 9a in which slit-like openings 9b are formed, and an alignment layer 16 are sequentially formed.

地,覆盖作为像素开关元件的薄膜晶体管30地形成层间绝缘膜6,并通过该层间绝缘膜6的接触孔6a及漏电极5b,使像素电极7a电连接于薄膜晶体管30的漏区域1d。

The films were prepared by interelectrode capacitively coupled type apparatus and on conditions with carrier gas Ar2, O2, N2, and monomer Tetramethyldisiloxane or Hexamethyldisiloxane, discharge frequency of 13.56MHz.

薄膜的制备工艺研究中,通过改变放电工作压强、放电功率、沉积时间和氧气、氮气、氩气和单体的比例等,研究所制备硅氧氮薄膜的性能。

Ion beam enhanced deposition has become an established technique for the preparation of thin films to effectively...

离子束增强沉积作为一种独特的薄膜沉积技术由于能有效地控制和改善薄膜的微结构、成分、硬度等等正日益引起人们的兴趣。

The results showed that both annealing after the deposition and ion bombardment before the deposition can increase the microhardness.

由于在膜层很薄时,薄膜显微硬度的测量会受到基体材料硬度的影响,所以测量结果不能反映薄膜的本征硬度。

Ion beam enhanced deposition has become an established technique for the preparation of thin films to effectively control their microstructure, composition and hardness.

离子束增强沉积作为一种独特的薄膜沉积技术由于能有效地控制和改善薄膜的微结构、成分、硬度等等正日益引起人们的兴趣。

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