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The article first theoretically analyzes the principle that microcavity reduces threshold 、changes resonant modes of output light and enhances unidirection of the random laser.Then study the structure parameters of different microcavity by transfer matrix.Based on the theory of Maxwell equations and the rate equations, analyze the principle that microcavity reduces the threshold by FDTD method: Changing the confined position,reducing relaxation time and increasing reversing particles, also simultaneously study the influences of the threshold and output light modes by different microcavities and random intensity of random medium.

首先从理论上分析了利用微腔降低随机激光器阈值、改变出射光振荡模式、提高出射光准直性的原理,然后利用传输矩阵法模拟研究了不同的微腔应具有的结构参数,最后以麦克斯韦方程和速率方程理论为基础,利用时域有限差分法分析了利用微腔降低阈值的原理:改变局域化位置、缩短弛豫时间及增大粒子数反转,同时也模拟研究了微腔、随机介质的随机强度对阈值及出射光波模式的影响。

A model ejector with variable geometrical throat was designed, then, the processes of start and unstart were investigated, and a criterion was proposed for the condition that second throat is too small to start.

设计了几何结构可调的模型引射器,研究了引射器的启动和不启动过程,提出了判断第二喉道面积过小导致引射器无法启动的判据。

The cohesive and adhesive strengths of plasma-sprayed hydroxyapatite coatings were strengthened by respectively, adding ZrO2 particles as a reinforcing second phase (HA+ZrO2 composite coating), and using an intermediate ZrO2 layer between the HA coating and the Ti alloy substrate as a bond coat (two-layer HA/ZrO2 coating).

中文摘要本计画之目的在探讨电浆熔射HA 涂层的主要结构弱点,除了电浆熔射HA+ZrO2复合涂层系统以外,另外在HA 与钛合金基材间引入ZrO2涂层当作介层,形成电浆熔射HA/ZrO2双层涂层系统。

The cohesive and adhesive strengths of plasma-sprayed hydroxyapatite coatings were strengthened by respectively, adding ZrO2 particles as a reinforcing second phase (HA+ZrO2 composite coating), and using an intermediate ZrO2 layer between the HA coating and the Ti alloy substrate as a bond coat (two-layer HA/ZrO2 coating).

本计画之目的在探讨电浆熔射HA 涂层的主要结构弱点,除了电浆熔射HA+ZrO2复合涂层系统以外,另外在HA 与钛合金基材间引入ZrO2涂层当作介层,形成电浆熔射HA/ZrO2双层涂层系统。

To avoid the deformation of traditional sliding rods type, we developed sliding plate of carriage with front pulling cylinder, ensuring the parallel between injection carriage and barrel.

CNT系列为了改良传统滑轴式变型之缺点,在射台滑座上一律采用永不变形之滑板式结构,并配合前拉式射台油缸,确保射台座之平行度,料管永不偏斜。

In2O3 thin films were prepared on glass substrates by radio frequency magnetron sputtering. The structural, electrical and optical characteristics of In2O3 films were investigated by atomic force microscope, X-ray diffraction, X-ray photoelectron spectroscope, UV-Visible spectrophotometer and Hall effect measurements.

采用射频磁控溅射法在玻璃衬底上制备氧化铟薄膜,通过测试原子力显微镜、X射线衍射、X射线光电子谱、紫外可见分光光度计以及霍尔效应,研究了氧化铟薄膜的结构和光、电特性。

The product was characterized by Fourier transform infrared spectroscopy, X-ray diffraction, and transmission electron microscopy. Silver crystals were monocrystalline with face-centered cubic structures, which was confirmed by electron diffraction and XRD.

利用透射电子显微镜、X射线衍射和傅里叶变换红外光谱对复合纳米微粒的形貌及其成分进行了表征。X射线衍射和电子衍射证明银纳米微粒具有良好的面心立方体单晶结构。

At first, CoCr、FeNi and Ti layers are deposited with the SPF-312 Sputtering System made by ANELVA and then dependence of microstructure and the magnetic properties on the Ar pressure、power、substrate temperature、bias voltage、film thickness and the distance between the target and substrate are studied systematically.

首先用日本ANELVA生产的SPF—312型磁控溅射装置对CoCr、FeNi、Ti等薄膜的制备工艺进行了探讨,系统地研究了溅射气压、溅射功率、基板温度、基板偏压、膜厚、靶间距等参数对薄膜结构和磁性的影响。

Our investigation has shown that:ⅰ there was an interference effect between the incident and reflected matter waves as all the atoms in BECs were coherent;ⅱ considering the rotation of a vortex, the nonuniform velocity distribution along the surface would play an important role in the quantum reflection process. For example, they would change the characteristics of the interference fringes between the incident and reflected matter waves;ⅲ the reflected vortex became unstable for sufficiently low incident velocity or strong interaction. This sort of instability physically originated from dynamics excitations induced by the atomic interaction in the quantum reflection process.

我们的研究表明:ⅰ由于相干性质的存在,在涡旋与固体表面相互作用的过程中,被固体表面反射回去的部分与正在入射的部分在空间叠加后一定会产生清晰的干涉条纹;ⅱ由于各向异性的速度分布,涡旋的反射率也呈各向异性,因此反射回来的部分与入射部分形成的干涉条纹宽度以及疏密程度与入射速度以及速度各向异性的程度有关;ⅲ由于玻色凝聚体中原子间相互作用的存在,反射过程中凝聚体会产生激发,破坏涡旋的结构,使得反射后的涡旋不再是中心对称。

The influence of sputtering power upon the crystal structure,surface morphology and electrochemical properties of tin oxide films were then investigated.

应用射频磁控溅射技术在硅基底上制备氧化锡薄膜,着重研究溅射功率对薄膜结构和电化学性能的影响。

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