硅化的

The effect of holding time on intergranular phase and mechanical property of GPS silicon nitride ceramics was studied.

研究了保温时间对气压烧结氮化硅陶瓷晶界相及力学性能的影响。

Other method, such as contact angle has been used for studying the wettability of this monolayer.

结果表明，自组装膜的最佳制备条件为选择甲苯作溶剂，控制在110℃加热，硅烷化24h。

As a kind of mufti- functional materials, silicon nitride thin film is widely used in many fields.

氮化硅薄膜是一种多功能材料，在许多领域有着广泛的应用。

In this paper, the influence of sintering technology on the microstructure and mechanical properties of the silicon nitride ceramic were studied.

研究了烧结技术对氮化硅陶瓷显微结构和力学性能的影响。

Furthermore, the microstructure, mechanical properties and wear resistance of silicon nitride ceramics were investigated.

同时， 还对氮化硅陶瓷烧结体的显微结构、力学性能和耐磨性能进行了研究。

The deposition rate and photosensitivity increases while the Xc decreases with the increase of silane concentration.

随着硅烷浓度的增加，沉积速率和光敏性增加而晶化率下降。

In this paper,amorphous,micro crystalline and polymorphous silicon films were prepared by plasma enhanced chemical deposition.

根据拉曼光谱得到了微晶硅的晶化率，并在椭偏仪中用BEMA模型验证了其准确性。

Electroless Ni-P plating on pyrex glass was studied for subsequent metallization on the surface.

为实现对玻璃表面的金属化改性，试验研究了高硼硅玻璃表面化学镀镍工艺。

Large single crystals were also obtained by using pyrocatechol as additive. It was shown by 〓Si-NMR and IR that Sipyrocatechol complex was formed in the reaction system.

在F〓体系中，F〓对铝源和硅源起络合和矿化作用，形成可溶性氟硅酸盐AlF〓〓、SiF〓〓络合物，然后缓慢水解成含氧氟硅酸盐络合物，它们再发生定向缩聚，提供了分子筛晶体生长所需的可溶性结构单元。

Spectroscopic ellipsometry and spectroscopic reflectometry are important methods to research the physical and optical properties of silicon nitride thin film.

椭偏仪和折射仪是研究氮化硅薄膜物理和光电性能的重要分析方法。

The split between the two groups can hardly be papered over.

这两个团体间的分歧难以掩饰。

This approach not only encourages a greater number of responses, but minimizes the likelihood of stale groupthink.

这种做法不仅鼓励了更多的反应，而且减少跟风的可能性。