硅化的

It is seen from Fig.2 that the H concentration in the SiNx:H decreases upon annealing, however H may also effuse out towards the atmosphere.

经查验后的h分布在结构退火温度高达550 ℃，这是可见的H渗透在Si衬底上是增加相比，以作为沉积样本，因此，这是表示， H是发表对衬底上，无论是直接从A - Si ： H薄膜或从覆氮化硅：每小时它是从图2表示的H浓度在氮化硅： H的跌幅后，退火，但h也可能涌出了对大气中。

The experiments results show that, for Al-20%Si alloy with working temperature about 820癈, the coarse primary silicon turns to be obtuse, and that the average diameter of the primary silicon decreased from 150 m to 40 m, resulting in ideal primary silicon.

研究结果表明：P在820℃左右对含硅量为20％的铝硅合金进行变质处理，粗大的初晶硅棱角钝化，平均直径从150μm下降到40μm左右，获得理想的初晶硅组织。

The result shows that modification can make the β-Si phase thin when the joining amount is 0.3wt%, making the best modification result. Alloying elements Mn and Ni are always used to neutralize iron"s harm in aluminum alloys. They can form many kinds of complicated metallically compounds with Fe and Al, and eliminate needle-like iron-rich phases to reduce iron"s harm in Al-Fe alloy. Copper makes the alloy microstructure thick and electromagnetic stirring obviously makes the alloy microstructure thin, round the second phase, when the stirring voltage is 200V, making the best result; Reheat makes liquid phases emerge in the alloy, when the warming temperature is 650?

研究结果表明：红磷可以明显细化合金中的初晶硅，当加入量为0.3wt%时，取得最佳变质效果；锰、镍合金中加入后，通过形成多种复杂金属间化合物，细化针片状富铁相，减小铁对铝硅合金性能的危害；铜使合金微观组织发生粗化；电磁搅拌明显细化合金组织，使第二相圆整化，搅拌电压为200V时，取得最佳细化效果；二次加热使合金组织中产生部分液相，在650？

Under the experimental conditions in this study, when the silicon powder with a particle size of 2.7 μm is used as raw materials, with a nitridation temperature of 1380℃ and nitridation time of 54.5 s, the conversion rate of silicon is 22.5%.

在本文条件下，当以平均粒径2.7μm的硅粉为原料、氮化温度为1380℃、氮化时间为54.5 s时，硅的转化率为22.5%。

At even higher temperature anneals, breakage of Si-H bonds and out-effusion of H through the SiNx:H layer may cause a collapse in the surface passivation at temperatures around 600°C, as seen from the apparently complete lack of H below the SiNx:H layer in the NRA measurements of these samples.

在更高的温度anneals ，破损泗H键及外积液的H透过氮化硅： H的层都可能引起崩溃，在表面钝化，在温度约为600 ° C时，从表面上完全缺乏的H低于氮化硅： H的层在NRA的测量这些样品。

Effect of annealing at high temperatures on compound films structures is great. For three hours in pure nitrogen(99.999 9%) ambients at 900℃ are annealed. The structural feature changes of iron-passived porous silicon are studied after being annealed by SEM and XRD.

退火处理对复合薄膜的形貌和结构都将产生较大的影响，对由水热腐蚀技术制得的铁钝化多孔硅进行高纯氮气(99.999 9%)下900℃退火3h，利用扫描电镜、XRD等分析手段对比研究了铁钝化多孔硅在退火前与退火后的结构变化特点。

In cast iron adding a certain amount of ferrosilicon can used to prevent the formation of iron carbide and promote the precipitation of graphite. Therefore the production of ductile iron, ferrosilicon is an important Inoculant (to help precipitation of graphite) and Nodulizer.

在铸铁中加入一定量的硅铁能阻止铁中形成碳化物、促进石墨的析出和球化，因而在球墨铸铁生产中，硅铁是一种重要的孕育剂和球化剂。

Silicon oxide/Fluorinated amorphous carbon/Silicon oxide multiple-layered films and one-layered Fluorinated amorphous carbon films were prepared using Microwave electron cyclotron chemical vapor deposition reactor with SiH4, O2, CHF3 and CH4 as source gas and were annealed in nitrogen ambience in order to investigate their thermal stability.

食用80％Ar稀释的SiH4，O2，CHF3和CH4作为前驱气体，利用微波电子回旋共振等离子体化学气相沉积方法制备了氧化硅／氟化非晶碳膜／氧化硅(SiO_x／a-C：F／SiO_x)多层膜与单层的氟化非晶碳膜，并在N_2氛围退火处理中考察其热稳定性。

The surfaces of the silicon spiral are coated with highly conformal copper by electroless plating to reduce the resistive loss in the conductor,with thin nickel film plated on the surface of the copper layer for final surface passivation.

采用一种硅玻璃键合-深刻蚀成型释放工艺并结合无电镀技术制作该电感，形成厚约40μm的硅螺线，在硅螺线表面镀有高保形厚铜镀层，在铜镀层表面镀有起钝化保护作用的薄镍镀层。

When combined by heavy chromate-sodium hydrogen sulfite and by silane couplant, rapidly quenched NdFeB permanent magnetic particles, can form passive pycho-film (containing Cr〓O〓) and silane composite coating, which can improve greatly its oxidation resistance of NdFeB particles and increase the magnetic properties of bonded NdFeB Permanent Magnetic Composite .

采用重铬酸盐钝化-亚硫酸氢钠还原与硅烷偶联剂处理相结合来包覆处理快淬NdFeB永磁粉，能在快淬NdFeB表面形成致密的含Cr〓O〓钝化膜/硅烷复合涂层，它们显著地改善了快淬NdFeB的抗氧化性并提高了粘结NdFeB永磁复合材料的磁性能，并与其它的NdFeB包覆处理工艺所获得的涂层进行了比较。

The split between the two groups can hardly be papered over.

这两个团体间的分歧难以掩饰。

This approach not only encourages a greater number of responses, but minimizes the likelihood of stale groupthink.

这种做法不仅鼓励了更多的反应，而且减少跟风的可能性。