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The invention discloses a method to integrate single CMOS with bulk silicon microelectromechanical system, its technical project: 1 forming isolating groove: adopting deep-groove etching, and SiO2 and polycrystal silicon filling to realize the insulation of MEMS structure and CMOS circuit; 2 making standard CMOS circuit; 3 using SiO2 and Si3N4 as mask, etching silicon on the back until exposing SiO2 at the bottom of the isolating groove, to complete the thickness control for MEMS silicon structure layer; 4 completing metalizing the CMOS circuit and masking the MEMS structure: MEMS structure region uses Al as mask and CMOS circuit region uses thick photoetching glue as mask, using DRIE to release silicon structure.

本发明公开了一种将单片CMOS与体硅微机械系统集成的方法,其技术方案为:1形成隔离槽:采用深槽刻蚀,SiO 2 和多晶硅填充,实现MEMS结构和CMOS电路的绝缘;2完成隔离槽后进行标准CMOS电路的加工;3用SiO 2 和Si 3 N 4 作掩膜,从背面腐蚀硅,直至暴露出隔离槽底部的SiO 2 ,完成MEMS硅结构层的厚度控制;4完成CMOS电路金属化和MEMS结构掩膜:MEMS结构区用铝作掩膜,CMOS电路区用厚光刻胶作掩膜,用DRIE释放硅结构。用本发明方法不仅获得了较大的质量块,而且用本发明较高的深宽比制作出的结构电容,同时实现了体硅微机械与CMOS电路的集成,显著提高MEMS传感器的精度和稳定性,具有前沿性和重要实用价值。

The preparation process of self-holing polyimide with organosilicon block includes the following steps: 1 the first reaction of polyacid anhydride in functionality not lower than 2, silicon oil with 2 or more amino or imino groups and polyamine with 2 or more amino groups, and the second reaction with one or several kinds of added isocyanate with 2 or more isocyanate radicals to produce sol of polyamido acid containing organosilicon block; 2 solidifying the sol to obtain solid polyamido acid containing organosilicon block; and 3 imidonating the solid to obtain self-holing polyimide with organosilicon block.

本发明公开了一种有机硅嵌段自发孔聚酰亚胺的制备方法,该方法包括以下步骤:(1)有机溶剂中具有大于或者等于2的酸酐官能团度的多酸酐与具有大于或者等于2的胺基或亚胺基的硅油以及具有大于或者等于2的胺基的多胺反应,随后添加一种或多种具有含有等于或者大于2个异氰酸酯基的异氰酸酯反应,生成含有机硅嵌段聚酰胺酸的溶胶。(2)溶胶固化制成有机硅嵌段聚酰胺酸固体。(3)固体亚胺化,即得有机硅嵌段自发孔聚酰亚胺。

The 2/SegPhos/I2 system can be applied in asymmetric hydrosilylation of quinoline and quinoxaline derivatives successfully, and up to 93% ee was obtained.

芳香杂环化合物喹啉衍生物的不对称硅氢化反应一直是不对称氢化领域的一个难点,我们利用2/-SegPhos/I2催化体系首次实现了杂芳香化合物:喹啉和喹喔啉的不对称硅氢化反应,最高获得了93%的ee值。

Polyether modified polysiloxane was synthesized by the hydrosilation reaction of hydrogen containing silicone fluidand allyl polyether, using chloroplatinic acid as the catalyst.

以氯铂酸为催化剂,利用含氢硅油与烯丙基聚醚的硅氢加成反应,合成出聚醚改性硅油;然后用乙醇胺进行胺化反应,制成纸张用氨基改性聚醚硅油柔软剂。

It is convenient for sinter to be leached, and the secondary reaction appears little. The slurry after sinter leaching is transferred into autoclave for desilicification at about 170℃, and the siliceous modulus of solution reaches more than 200. Then some lime is added for deep-desilication at normal pressure, the siliceous modulus of solution increases more than 600 even if the Al2O3 content is more than 200g/L.The SiO2 coefficient in hydrate garnet from deep-desilication is more than 0.28. Under conditions of the addition of seed and application of novel technology of carbonization, the contents of Na2O and SiO2 in product are less than 0.37% and 0.025%, respectively.

实验结果显示:烧成的熟料溶出条件宽松,二次反应程度弱;溶出浆液在170℃左右直接进行加压脱硅,脱硅后溶液的硅量指数大于200,再加入适量的石灰进行深度脱硅,即使溶液中氧化铝浓度超过200g/L时,精液的硅量指数也大于600,且得到的水化石榴石中二氧化硅饱和系数大于0.28;通过加入晶种和采用新的碳酸化分解工艺制度,产品中的SiO2 含量降至0.025%, Na2O含量小于0.37%;加入表面活性剂,不仅能将碳分母液蒸发至Na2OT浓度大于300g/L,而且还可有效减缓表面上结疤的形成速度。

The minera lization_alteration in Shuangfengshan appears in downward succession of silica b reccia zone, low grade gold_bearing silica rock zone, quartz stockwork zone, pyrite montmorillonite zone and propylitic alteration zone.

这两个成矿阶段同源同位的蚀变矿物晕叠套,造成双峰山矿床蚀变分带从上至下为隐爆硅质角砾岩化带、低金品位硅质岩带、石英网脉带、黄铁矿蒙脱石化带和青磐岩化带。

The results show that the SAPO–5 has a pillar-like morphology with the size of about 20 μm×5 μm×5 μm.The ratio of P:Al:Si is 1:1.19:0.67 in its crystal structure, the content of Si is high. The total acidimety fo the SAPO–5 is 578.0 μmol/g , hihger than that of prepared by one step crystalline hydrothermal method.And its initial catalysis character performance on normal butane isomerization reaction reach 24.8 %, higher than that of prepared by one step crystalline hydrothermal method.

实验结果表明:产物为柱状的磷酸硅铝分子筛,其晶粒尺寸大约为20 μm×5 μm×5 μm,其晶体结构中P:Al:Si=1:1.19:0.67,硅含量较高;采用分段晶化方式制备的SAPO-5分子筛的总酸量为578.0 μmol/g高于一段晶化方式制备的SAPO-5分子筛的总酸量;采用分段晶化生成的SAPO-5分子筛的催化正丁烷异构化反应初始活性可达到24.8 %,远高于一段晶化制备的SAPO-5分子筛的初始活性14.1 %。

Firstly, the specific surface area of nano-coated particle is much larger than that of ordinary wollastonite, and the edges formed in comminuting is passivated, which made the slippy crystal surface coarsened. At the same time, the color of nano-coated particle became whiter, which fit for light ware. Secondly, if the coated wollastonite hasn't been modified by coupling agent, the toughness of PP/ wollastonite composite couldn't be improved.

在硅灰石表面包覆上纳米级SiO2小颗粒对硅灰石的应用特性有重要影响:①纳米包覆粒子填料的比表面积比普通硅灰石大,纳米级SiO2小颗粒钝化了由于机械力粉碎造成的硅灰石的棱角,使其平滑的晶体解理面变得粗糙,同时硅灰石粉体白度增大,可应用于浅色制品。

Research results indicate that X FLOUR has notable effects of fluidizing and water reducing.

研究结果表明:X粉具有显著的流化与减水效应,其流化与减水效果与目前市售掺合料的最高水平相当,明显好于硅灰。X粉与硅灰复合后,仍具有流化效应。X粉产生流化效应的机理,一是增加水泥浆悬浮体系的分散性;二是通过填充效应减少填隙水,增加了用于混凝土流动性的水量;三是增加混凝土混合料的浆体体积。X粉流化与减水效应的发挥,以与高效减水剂双掺为前提。

The azotized silicon factory possesses the domestic advanced azotized silicon sintering equipments.

氮化硅厂拥有国内先进的氮化硅烧结设备。

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