硅化的

Ions' bombardment and molecular' mean free path will have a strong effect on film' growth, thus, they will have an obvious effect on the characteristics of SiN film, such as deposition rate, stress and thickness uniformity, etc.

离子轰击效应和分子平均自由程对氮化硅薄膜的生长过程产生影响，从而影响沉积速率、应力以及厚度均匀性等基本性质。

In particular, the experiments show that the quality of NiSi film is very sensitive to the process conditions of the first RTA.

研究结果表明一硅化镍薄膜的特性对第一次低温退火条件特别敏感。

Different silicidation processes are employed to form NiSi, and the NiSi/Si interface corresponding to each process is studied by cross-section transmission electron microscopy.

采用不同硅化工艺制备了NiSi薄膜并用剖面透射电镜对样品的NiSi/Si界面进行了研究。

In this deposit, ore bodies exist in the stratoid form and are c ontrolled by thrust faults. The host rocks are limestone in Bolila Formation of Late Triassic Jiezha Group and in Gadikao Formation of Early-Middle Permian Kaix i nling Group, with strong dolomitization and weak silicification. Minerals are ra ther simple and consist of sphalerite, galena, pyrite, calcite, dolomite and barite. The important ore textures are colloforms such as framboid and crust and xenom orphic grains, and the ore structures are in disseminated, brecciated, veinlike and lumpy forms.

东莫扎抓铅锌矿床矿体呈似层状展布，产状严格受到矿区逆冲断层的控制，赋矿围岩为上三叠统结扎群波里拉组灰岩和下-中二叠统开心岭群尕迪考组灰岩，发育强白云石化和弱硅化，矿物组合简单，主要为闪锌矿+方铅矿+黄铁矿+白云石+方解石+重晶石，矿石结构以皮壳状、草莓状等胶状结构和他形粒状结构为主，矿石构造为浸染状、角砾状、团块状和脉状。

Two components of the resistivity of molybdenum silicide does not change with use, that is, not aging, it can be a mix of old and new components.

2， 二硅化钼元件的电阻不随使用而改变，也就是不老化，因此新旧元件可以混合使用。

The thickness of the silicide layer is about 60-80nm.

硅化钇层的厚度大约为60-80nm。

A MoSi2 coating on C-103 niobium alloy was prepared by packing cementation, and the microstructures of the oxidized and unoxidized coatings were analyzed by XRD, SEM and EDS techniques. The formation mechanism of the silicide coating was investigated. The results show that the silicide coating is formed by reactive diffusion and the silicification process obeys parabolic relation.

采用包渗法在C-103铌合金基体上制备MoSi2涂层，通过X射线衍射、扫描电镜和能谱分析等手段研究涂层表面、截面形貌以及氧化后涂层结构变化，并分析硅化过程中涂层的形成机理。

Dongan gold deposit is a epithermal gold deposit occurring in the strong silicification zone of Late Indosinian alkali feldspar granite and Late Yanshanian fine-grained alkali feldspar granite in the intermediate-acidic volcanic-intrusive rock.

东安金矿床是浅成低温热液型金矿床，赋存于中酸性火山-侵入岩、印支晚期碱长花岗岩和燕山晚期细粒碱长花岗岩脉强硅化蚀变带中，受库尔滨断裂的次级断裂控制。

The hydrothermal gold mineralization occurred in early Yanshanian Period, although the Shuiquangou syenite complex emplaced in Hercynian Period.

矿体具有明显的分层性，自上而下矿石类型由石英脉型向钾、硅化蚀变岩型过渡。

Along the northerly trending eruption vents are tabular bodies of andesitic breccia protruding at the Eastern crater rims which are intensely silicified and pyritic.

沿着北风火山喷口趋势是安山角砾岩突出表格机构在东口轮辋是强烈的硅化和黄铁矿。

The split between the two groups can hardly be papered over.

这两个团体间的分歧难以掩饰。

This approach not only encourages a greater number of responses, but minimizes the likelihood of stale groupthink.

这种做法不仅鼓励了更多的反应，而且减少跟风的可能性。