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He hardness of Ti600 alloy increases with increasing of hydrogen, and it is considered that hydride, silicide and lattice defects are the major factors.

i600合金的硬度随着氢含量的提高而提高,其主要原因是氢化物、硅化物粒子以及晶格缺陷的存在。

We have a production line of organic chloride, silicide, nitride compounds and etc.

目前产品以有机卤化物、有机硅化物、氮化物系列产品为主。

Oxidation-resistant silicide coatings on an Nb-based alloy were prepared by pack cementation technique. The holding temperatures were 1 050, 1 150 and 1 250 ℃ and the holding time were 2, 5, 10, 15 and 20 h, respectively.

摘 要:利用包埋渗法在铌基合金上制备抗氧化硅化物涂层,渗硅温度分别为1 050、1 150和1 250 ℃,渗硅时间分别为2、5、10、15和20 h。

Advanced silicide process will be discussed too.

接着是金属以及金属硅化物的学习,包括金属的淀积方法和比较先进的金属硅化物技术。

The results show that the silicide coating is formed by reactive diffusion and the silicification process obeys parabolic relation. The coating is composed of composite structures including MoSi2 outer layer, two-phase transient zone with major NbSi2 and minor Nb5Si3, and Nb5Si3 diffusion inner layer. The coating possesses good high-temperature oxidation resistance and spalling resistance.

研究结果表明:包渗法制备硅化物涂层是通过反应扩散形成的,硅化过程服从抛物线规律;该涂层为复合结构:MoSi2相为主体层;以NbSi2相为主、并含少量Nb5Si3相的两相为过渡区;Nb5Si3相为扩散层。

The result demonstrates that only a few phosphides contribute to spontaneous crumbing of the RE silicide alloy by reacting with water and forming oxide or phosphorus oxide. The phosphorus content is not the crucial factor of disintegration of the alloy studied.

结果表明:含磷稀土硅化物合金中只有少部分磷化物能够水化,生成氧化物或含磷氧化物,从而对合金粉化起作用;在本实验研究范围内,磷含量不是稀土硅化物合金粉化的决定因素。

The results indicate that the main separating phases include borides, carbides and silicides, of which the borides and carbides are dispersion strengthening phases while the silicides mainly improve technological properties of the vacuum melting process.

结果表明,镍基合金涂层中的析出相主要有硼化物、化物和硅化物,其中硼化物、化物起强化作用,硅化物改善涂层熔结过程中的工艺性能。

Mo silicides with good properties were synthesized by using metal Mo ion implantati on with large ion flux.

用大束流密度的钼金属离子注入硅,能够直接合成性能良好的薄层硅化物

It is evident that electrical properties of the Y silicides can be improved by RTA. The formation of the silicides with YSi and YSi2 are confirmed by X-ray diffraction analysis.

这说明快速退火可以改善硅化钇的电特性。X射线衍射分析表明YSi和YSi2硅化物已经形成。

Zr can partially replace Ti in the silicides because the free energy of formation of Zr-Si bonds is greater than that of Ti-Si bonds and both Zr and Ti elements are in group Ⅳa of periodic table.

由于Zr-Si粘合体的自由能大于Ti-Si粘合体的,Zr原子更多地溶于硅化物中,替代Ti原子形成新的硅化物〓。

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