硅

A thin heteroepitaxial β SiC layer was deposited on Si(001) substrate by negative bias treatment and chemical vapor deposition growth using nontoxic,nonflammable hexamethyl disilazane organic compound as the carbon source.

采用无毒、不易燃的六甲基二硅胺烷和氢气在硅(001)单晶上用施加负偏压处理和化学汽相沉积方法预沉积定向的βSiC。

Melting point 3410 ℃, boiling point 560 ℃, relative density of 1935, F the external electronic structure of 5d46s2, in the chemical reaction time is very easy to lose 1-6 electronic, but also can get 1-2 electronic, so oxidation number of 0,± 1,± 2, 3, 4 , 5 and 6, with 6 price of the most stable compounds, such as WO3 does not dissolve in water, the air will form in the tungsten trioxide thin protective layer of tungsten, tungsten with fluorine at room temperature, chemical combination, red hot when there is no moisture and Bromine iodide together, red hot when you can and water reaction WO3, at room temperature reaction of tungsten with aqua regia, but the hot concentrated hydrochloric acid and sulfuric acid can only be played with its weak response, but molten nitrate, nitrite, too Hydrogen peroxide, sulfur steam, steam and other phosphorus can play intense reaction, high temperature can not be carbon, boron and silicon reaction of binary compounds, widely used in industrial tungsten steel and tungsten carbide, pure tungsten filament is used to the system, and X-ray tube Tube heating components, semiconductor components can be prepared tungsten silicide, tungsten industrial production is white or black tungsten ore tungsten ore refining.

熔点3410℃，沸点560℃，相对密度1935，F外围电子结构为5d46s2，在化学反应时很容易丢掉1—6个电子，也能得到1—2个电子，所以氧化数为0、±1、±2、＋3、＋4、＋5和＋6，以＋6价化合物最稳定，如WO3不溶于水，空气中的钨会形成薄层三氧化钨保护层，钨能与氟在室温下化合，红热并无潮气时能与溴、碘化合，红热时还能和水反应生成WO3，室温下钨可与王水反应，但热的浓盐酸和硫酸只能与其起微弱反应，但对熔融的硝酸盐、亚硝酸盐、过氧化氢、硫蒸汽、磷蒸汽等能起激烈反应，高温下不能与碳、硼和硅反应生成二元化合物，工业上广泛使用钨钢和碳化钨，纯钨用来制灯丝、电子管和X射线管的发热元件，硅化钨可制半导体元件，钨工业生产是将白钨矿石或黑钨矿石精炼。

Tin dioxide (SnO2) nano-particles were prepared on high silica TON, MFI and FAU type zeolites by impregnation of SnCl2 solution and subsequent calcination at 873 K.

将高硅TON， MFI和FAU沸石分别浸渍于SnCl2溶液，再于873 K温度下焙烧，在高硅TON，MFI和FAU沸石外表面制备出二氧化锡纳米粒子。

The results show that the white thick-bedded siliceous rocks have high contents of SiO2 and Al2O3 and high ratios of Al/ and Al2O3/(Al2O3+ Fe2O3). The ∑REE are low, and the North American shale-normalized REE patterns are characterized by enrichment of LREE and absence of Eu and Ce anomalies, which suggest that the white thick-bedded siliceous rocks might have been formed in the continental margin environment and affected significantly by terrigenous constituents. The anatase-rich siliceous rocks have high contents of TiO2, Fe2O3, Cu and V but low Al/(Al + Fe+ Mn) and Al2O3/(Al2O3 + Fe2O3) ratios. The ΣREE are high, the North American shale-normalized REE patterns are obviously characterized by left-oblique to flat styles of curves and slight negative Ce anomalies, implying that they might have been formed in an oceanic ridge environment.

研究结果表明，呈厚层状产出的无矿白色硅质岩具较高的SiO2、Al2O3含量及Al/、Al2O3/(Al2O3+Fe2O3)比值，稀土元素总量很低，其北美页岩标准化配分模式为向右倾的曲线，无明显铈异常和铕异常，表明其形成于受陆源影响的大陆边缘构造环境；赋矿岩系中薄层状富钛硅质岩的TiO2、Fe2O3、Cu、V含量较高，但Al/、Al2O3/(Al2O3+Fe2O3)比值较低，稀土元素总量较高，北美页岩标准化曲线为明显左倾型－平坦型，具弱的负铈异常，表明其形成于洋脊及附近环境。

A study was made of the alkali recovery from sodium hydrate alumino silicate by wet treatment .

对钠硅渣湿法处理工艺的脱碱过程进行了研究，分别考察了脱碱温度、时间、液固比和石灰添加量等因素对钠硅渣脱碱效果的影响，提出了适宜的脱碱工艺条件。

The consumption of caustic soda is mainly caused by formation of sodium hydrate alumino-silicate and it can be calculated from the ratio of N/S of red mud.

拜耳法生产氧化铝过程中的碱耗在生产成本中占很大比例，引起碱耗的主要因素是大部分含硅矿物在溶出过程中生成钠硅渣。

Three methods were analyzed to reduce the silicon content of hot metal in theory: controlling silicon resource, decreasing the drip zone's altitude, and increasing the oxidation of slag in hearth.

从理论上分析了降低铁水中硅含量的三个途径：控制硅源；降低滴落带的高度；增加炉缸渣中的氧化性。

This paper introduced using K2SiF6 Volumetric Method to analyze the content of silicon in silicon tetrachloride recycled from sponge titanium production technology.

摘 要：利用改进的氟硅酸钾容量法测定海绵钛生产工艺中回收四氯化硅中硅含量。

The manufacturing method was a batch reaction of Trichlorosilane or Silicon Tetrachloride in a molten Lithium Aluminum Hydride salt bath

当时的制造方法批次法，是将三氯硅烷或四氯化硅放在熔化的氢化铝锂盐浴中进行反应。

By using the seal syringe to get the sample and overcoming the silicon tetrachloride hydrolisis,the determination scope was 5%～85%.

本文用改进的氟硅酸钾容量法对海绵钛生产工艺中回收四氯化硅中硅含量进行测定，测定范围为5%～85%。

The split between the two groups can hardly be papered over.

这两个团体间的分歧难以掩饰。

This approach not only encourages a greater number of responses, but minimizes the likelihood of stale groupthink.

这种做法不仅鼓励了更多的反应，而且减少跟风的可能性。