电子束
- 与 电子束 相关的网络例句 [注:此内容来源于网络,仅供参考]
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When the beam current is 7A, voltage is 90kV, the velocity ratio is 1.0 and the axial velocity spread is 2%, numerical results show a constant bandwidth of 20%with an efficiency 42%, the peak power and gain are, respectively, 260kW and 47dB.
当电子束的电流为7 A,电压为90 kV,速率比为1.0,纵向动量散度为2%时,计算得到了20%的常数驱动带宽和42%的效率,输出的峰值功率和增益分别为260 kW和47 dB。
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Resistance pure water system, 3-waste treatment system, and shock-proof working-table, and about 80 sets of micro-electrical-mechanical technical equipment are installed, including AMS200 ICP plasma etching system, ICP-2B etching machine, AWB04 bonding machine, MA6/BA6 Karlsus double-face photolithography machine/bonding machine, POLI-400 chemical-mechanical-polishing tool, WL2040 aluminum-wire press welder, OPTI CAOT 22i decktop precision spin coasting system, ZSH406 automatic dicing saw system, DQ-500 plasma photoresist-removing machine, HXS150S automatic centrifugal spinner, AXTRON MOCVD metal organic chemical vapor deposit system, 4470 micro-control 4-tube diffusing furnace, type 4371 LPCVD low pressure chemical vapor deposit system, OMICRON MBE molecular beam epitaxy system, JS-3X100B magnet-control spattering equipment, PECVD-2E plasma deposit apparatus, ZZSX500C electron-beam vapor equipment, JC500-3/D magnet-control spattering-coating machine, H63-14/ZM quartz-tube cleaning machine. Measurement instruments include OLS1100 Confocal Laser Scanning Microscope, DEKTAKIII Surface Profiler, D41-11A/ZN 4-probe resistance test instrument, Nikon L150 metallurgical microscope, and so on.
中心现有80多台各种微机电工艺设备,如AMS 200深硅等离子体刻蚀系统、ICP-2B刻蚀机、AWB04键合机、MA6/BA6 Karlsuss双面光刻机和键合机、POLI-400化学机械抛光机、WL2040铝丝压焊机、OPTI CAOT 22i喷涂胶机系统、ZSH406全自动划片机、DQ-500等离子去胶机、全自动清洗甩干机、AXTRON MOCVD金属有机物化学气相沉积系统、4470微控四管扩散炉、4371LPCVD低压化学沉积系统、OMICRON分子束外延系统、JS-3X100B磁控溅射台、PECVD-2E等离子淀积台、ZZSX500C电子束蒸发台、JC500-3/D磁控溅射镀膜机、石英管清洗机,以及多种常用测试仪器,如OLS1100激光共聚焦显微镜、DEKTAK-III台阶测量仪、D41-11A/ZN四探针电阻测试仪、Nikon L150金相显微镜等。
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A new method of high aspect ratio and resolution zoneplate fabrication using both electron beam lithography and X ray lithography technology is described The zoneplate, composed of 10μm thick Au with 30 zones and outest zone width of 0 5μm, can be used as a focusing and chromatic dispersion device for 0 1~1nm harder X rays Results show that the zoneplate has contrast of 10 and above, resolution of 0 55μm, and focus length of 21 3cm for 8keV X ray
介绍了利用电子束和 X射线束双曝光技术制作大高宽比高分辨率的 X射线聚焦或色散元件的新方法(波长范围为 1~ 5 nm )。所制做的厚度为 10μm的 Au波带片具有 30个波带,最外环的宽度为 0 。5μm。实验表明:对 8ke V的 X射线来说,波带片的衬度大于 10 ,分辨率为 0 。5 5μm,焦距为 2 1.3cm。
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Furthermore, we believe that the general rules for understanding the superstructures formed within boundary areas are correlated directly with different overlapping or connecting operation with respect to building units of flattened hexagons and P-B polygons. These rules are as following:I The adjoined domains at least have their basic structural units a side-shared (that is, sharing two column clustersП) The basic structural units in both domains have overlapping area as large as possible.3 For theξ-Al-Ni-Rh phase formed in the as-cast Al75Ni15Rh10 alloy, phase transition processes induced by electron beam irradiation with different amount of dose were studied by in-situ observations in an electron microscope.
本论文提出了畴界的通用模型:各种畴界及其畴界处超结构都可以用一个通用的叠加覆盖模型去表示,覆盖的基本单元为扁六边形或P-B多边形,连接与覆盖规则如下:I相邻畴中的基本单元至少有一个共用边相邻畴中的基本单元重叠时沿b方向有最大重叠面积。3研究了Al75Ni15Rh10合金中ξ-Al-Ni-Rh相在透射电镜电镜中经不同剂量电子束辐照后引起的辐照损伤和相变过程。
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An approximate solution of the paraxial ray equation for cylindrical dense electron beams was obtained by means of the Taylor expansion.
本文提出圆柱形强流电子束的傍轴轨迹方程,可以用台劳展开求出它的近似解。
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The experimental results indicate a luminescence enhancement effect of hydrogen by passivating certain defects in GaN. However, such effect must be realized by overcoming high migration barrier in GaN. In the experiments, low energy electron beam supports enough energy to hydrogen to diffuse and passivate defects in GaN.
研究表明氢原子在GaN中可以钝化缺陷来增强发光,但这种钝化缺陷的作用必须通过克服高的扩散势垒来实现,而低能电子束可以提供足够的能量使得氢原子克服扩散势垒来实现钝化作用。
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It was found that the Schorl or dravite in schorl-dravite group that is produced from pegmatite and has good crystal degree had a strong intensity of spontaneous polarity by electron-beam bombardment and X-ray diffraction of varying the temperature.
利用电子束轰击结合变温XRD分析发现在Schorl-dravite系列电气石中,产于伟晶岩的,结晶度比较高的Mg电气石或Fe电气石具有较高的自发极化强度。
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The surface morphology and composition of the films were characterized by scanning electron microscope and X-ray photoelectron spectrometer.
用电子束蒸发的方法在Ta衬底上制备了LaB6薄膜,用电子显微镜、X射线光电子能谱仪对样品的表面状况、化学组分进行了分析。
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This work reports some further improvements on the photoelectron gun developed in this group.
本论文工作是在本研究小组以前工作的基础上,对光电子枪做了进一步的改进,又做了三种不同形式的电子枪并对电子枪中电子束的性能进行了直接测试,获得了较为翔实的实验数据。
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As he plowed his fields he concieved of drawing a picture with an electron beam just like he was plowing the field, one line at a time, from top to botton and side to side.
正如他自己领域的袭击,他concieved绘制的图片与电子束就像他是春耕外地,一次一行,从顶部向底部和侧面向一边。
- 推荐网络例句
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It has been put forward that there exists single Ball point and double Ball points on the symmetrical connecting-rod curves of equilateral mechanisms.
从鲍尔点的形成原理出发,分析对称连杆曲线上鲍尔点的产生条件,提出等边机构的对称连杆曲线上有单鲍尔点和双鲍尔点。
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The factory affiliated to the Group primarily manufactures multiple-purpose pincers, baking kits, knives, scissors, kitchenware, gardening tools and beauty care kits as well as other hardware tools, the annual production value of which reaches US$ 30 million dollars.
集团所属工厂主要生产多用钳、烤具、刀具、剪刀、厨具、花园工具、美容套等五金产品,年生产总值3000万美元,产品价廉物美、选料上乘、质量保证,深受国内外客户的青睐
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The eˉtiology of hemospermia is complicate,but almost of hemospermia are benign.
血精的原因很,以良性病变为主。