溅射

Its principle and some other related aspects are briefly described,including the magnetron sputter coater and the osmium plasma coater .

本文将主要叙述等离子溅射镀膜的原理与方法，并且简单介绍磁控管溅射仪和锇等离子镀膜仪等。

The influence of sputtering pressure on structure character,morphology,overpotential,resistivity and growth rate was studied.

采用对靶直流磁控溅射设备制备镍铁氧化物催化薄膜，研究了溅射气压与催化薄膜的结构、表面形貌、过电位、电阻率及生长速率之间的关系。

And the effects of oxygen partial pressure, sputtering power, sputtering total pressure and temperature on the structure and composition of the thin film were studied.

研究了氧分压、溅射功率、溅射总压及温度等参数对薄膜结构和组成的影响。

The effects of structural parameters of target cathode on magnetic field distribution during magnetron sputtering were simulated and analyzed to design a new-type rectangularly plane cathode,then the magnetic field of the designed cathode was simulated and analysed.

文章模拟分析了结构参数对磁控溅射阴极磁场分布的影响，设计了一种新型的矩形平面磁控溅射阴极，并对设计的阴极磁场进行模拟分析，结果表明有效提高了靶材表面磁场分布的均匀性。

The simulation studies on the magnetron sputter could help to optimize the real technology of magnetron sputtering.

磁控溅射的计算模拟工作可以优化现实的磁控溅射成膜技术的系列参数。

Vanadium oxide thin films deposited on slide glass substrates are prepared by facing-target magnetron sputtering.The effect of sputtering conditions on temperature coefficient of resistance is analyzed by orthogonal experiment,and the optimum process recipes are achieved,including Ar∶O2=48∶0.4,gas pressure is 2 Pa,substrate temperature is 27 ℃,sputtering power is 180 W.

利用对靶磁控溅射法在玻璃基片上制备VOx薄膜，采用正交实验方法研究了镀膜条件对VOx薄膜电阻温度系数的影响，得到优化的镀膜工艺参数，主要包括Ar∶O2为48∶0.4、工作压力恒定为2 Pa、基底的温度为室温27℃、溅射功率保持在180W，在此基础上，进行不同温度条件的真空退火，得到薄膜TCR在-2.5%~-4.5%范围。

Firstly,nanostructure ZnO materials were controllably deposited by radio frequency magnetron sputtering method,with optimized Ar/O_2 ratio and sputtering power,choosing suitable buffer layers.

利用磁控溅射方法，通过优化制备过程中的氩氧比和溅射功率等工艺条件，选择合适的缓冲层材料，在硅衬底制备出了结构和尺度可控的ZnO纳米结构材料。

With this EBT model, we successfully predicts how to optimize post annealing conditions and get the giant magnetooptic Ce-substituted YIG thin films for waveguide applications.

对Ce1YIG薄膜的溅射工艺及后续的晶化处理工艺进行了研究，得到了如下主要结论：成功地在非晶态的二氧化硅基片上用溅射法制备了非晶的Ce1YIG薄膜，并进行了后续晶化处理，得到了晶化的Ce1YIG薄膜。

It is the only splash in the game that has the potential to do more damage than the epicenter, as successive Irradiates will not do more damage, but the splash will stack.

这是在这个游戏种唯一有可以产生比中心更多伤害的潜力的溅射。连续的核辐射将不会产生更多的伤害，但是溅射将会累加。

A cerium dioxide target was used for sputtering and films were deposited at various substrate temperature under different sputtering power.

溅射过程中，首先制备纯二氧化铈靶材，然后在不同的功率上调节不同的基片温度进行溅射。

Finally, according to market conditions and market products this article paper analyzes the trends in the development of camera technology, and designs a color night vision camera.

最后根据市场情况和市面上产品的情况分析了摄像机技术的发展趋势，并设计了一款彩色夜视摄像机。

Only person height weeds and the fierce looks stone idles were there.

只有半人深的荒草和龇牙咧嘴的神像。