溅

High-beam operation is used to sputter or remove material from the surface.

高射束是用于将表面的材料溅出或移除。

This experiment uses power of 100 to 600 watt to sputter the Mo layer on glass subtract.

本实验使用溅镀功率100W到600W将Mo薄膜沉积在玻璃基底。

These accelerated ions sputter material off the substrate as they hit its surface, as well as react with the substrate material.

这些加速的离子溅射关闭基板材料，因为它们触及其表面，以及反应的基底材料。

For this reason conventional antireflection coating designs developed for thermal evaporation are not ideally suited for DC reactive sputter deposition.

基于这个原因，传统的热蒸发法的增透膜的设计，不适合直流反应溅射沉积。

Accordingly, the sputtering mechanism in longitudinal magnetic field was discussed in this paper.

从而对纵向磁场中的溅射机理进行了探讨。

The composition and structure of the coating vary with sputtering time.

结果表明：涂层与基材结合良好，涂层的成分与结构随溅射时间而变化。

To my surprise it burned perfectly without even sputtering.

令我感到吃惊的是，甚至没有被烧毁溅射完美。

With increasing of sputtering time, the resistivity of films first reduces, and then increases slightly.

薄膜的电阻率随溅射时间的增加先降低，后稍有回升。

The experimental results show that sputtering power is an important factor to the crystal structure and electronic properties of ZZO films.

研究结果表明，溅射功率对ZZO薄膜的结构和电学性能有很大影响。

The method to improve the uniformity of thin film thickness through ion beam sputtering is described in the paper.

引言 离子束溅射技术经过近 40 年的发展，已经成为非常重要的一项薄膜制备技术。

And Pharaoh spoke to Joseph, saying, Your father and your brothers have come to you.

47：5 法老对约瑟说，你父亲和你弟兄们到你这里来了。

Additionally, the approximate flattening of surface strip using lines linking midpoints on perpendicular lines between geodesic curves and the unconditional extreme value method are discussed.

提出了用测地线方程、曲面上两点间短程线来计算膜结构曲面测地线的方法，同时，采用测地线间垂线的中点连线和用无约束极值法进行空间条状曲面近似展开的分析。