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The results show that dynamic softening is easy to occur in these ingots and flow stress becomes steady finally; the material constants of hot deformation are procedural parameters that stress-level coefficient α, strain rate sensibility exponent m and deformation activation energy Q are all increased with strain increasing, while stress exponent n is decreased gradually; the values α and m of the alloy homogenized are the biggest and the value n is the smallest, dynamic softening effect of the alloy is the most obvious, which can deform evenly; influence of strain on the value Q of the alloy homogenized is a little and the average value of Q is only 176.5kJ/mol, so the alloy is easy to deform; the alloy matrix shows the regular recrystallization grains when the strain is 50%; dislocation cell structure re-formed in the grains with increase of strain.

结果表明:经不同处理的Al-1Mn-1Mg合金均易发生动态软化并最终呈现稳态流变特征;热变形材料常数是过程量,随应变量的增加,应力水平参数α、应变速率敏感性指数m和热变形激活能 Q 随之增大,而应力指数 n 则逐渐减小;均匀化退火后,铝合金的α和m值最大而n值最小,动态软化效果最明显且变形均匀,在该状态下,铝合金的 Q 值受变形量影响小,平均仅为176.5kJ/mol,易进行热变形;当应变量为0.7时,基体呈现规则的再结晶晶粒组织,随着应变量的增加,晶内重新形成了位错胞结构。

The results showed that the TiN andN films are polycrystalline phase. The properties and structure of TiN films are mainly determined by the N2 mass flow rate, and as the N2 mass flow rate increases, the structure of the TiN films transforms to f.c.c. type leading to better the properties of films. The presence of negative bias voltage can optimize the grain of TiN films, lower the defect proportion and denser the films, which improves the hardness of films. The TiN films conform to the free carrier absorption mechanism and there are many of free electrons with lower N content in TiN films. With the increase of N content, the quantity of free electrons and reflectivity of films decrease, and the plasma frequence shifts to the lower energy, which leads to the regular change of colors of films from silver, yellowy, golden to yellow-red, meanwhile the lightness of films decreases. The goldenN film consists of TiN and ZrN phase, but belongs to a sigle f.c.c. structure with (111) preferred orientation. The Zr-doping dosen't change the position of the valance band, conduction band and forbidden band ofN film, but leads to the presence of new energy levels, which is the reason thatN film remains golden. The transparent hard films with good corrosion resistance and high hardness have been prepared and the further reseachs showed that the grain size of those films is by far smaller than the wave length and the width of forbidden band of those films is very broad, is the reasons that those films are transparent.

研究表明:氮化钛和N 薄膜为多晶态,氮流量决定了氮化钛薄膜的结构和性能,增加氮流量能使氮化钛薄膜的结构向面心立方结构转变,从而得到性能良好的氮化钛薄膜;施加负偏压能优化氮化钛晶粒和减少薄膜中的缺陷,使膜层变得更致密,从而提高薄膜硬度;氮化钛主要遵循自由载流子光吸收,氮含量较少时薄膜中的自由电子数目较多,随着氮含量的增加,薄膜中的自由电子数目不断减少,反射率逐渐降低,等离子体频率向低能端移动,从而使薄膜颜色出现规律变化,由金属色银白色到淡黄、金黄再到红黄,并且薄膜亮度呈下降趋势;金黄色的N 薄膜中存在TiN 和ZrN 的分离相,但其为单一的面心立方结构并具有(111)面择优取向;相对于TiN 薄膜,Zr 掺杂后,并没有使薄膜的导带、价带和禁带发生变化,只是在TiN 禁带内增加了新能级,这也正是掺杂Zr 后,薄膜仍

Tight alloying layer with undulation and without visual pocket and inclusion has been obtained by experiment.The alloying layer is metallurgically combined with the matrix.

试验结果获得了致密、无肉眼可见气孔、夹杂、熔覆表面有一定起伏的合金层,合金层与基体间完全冶金结合;熔覆合金层由单相Fe3 Al构成,覆层组织为粗大的柱状晶团,柱状晶团内包含大量极细小的板条状Fe3 Al晶粒,一些相邻的板条晶之间具有基本相同的晶体学取向。

The results indicate that the pillaring process and crystal growing of anatase can be more easily realized by increasing the acid-base ratio of pillaring agents, raising the pillaring temperature and adding proper quantities of alkali. The calcination of Ti-pillared precursor brings the growth of TiO2 grain, at the same time the layer distance is declined. In order to obtain ideal products, the right pillaring conditions are: the acid-base ratio of pillaring agents of 13, pillaring temperature of 65 ℃ and the volume of alkali (2 mol/L) in pillaring liquid of 6 mL.

结果表明:在一定范围内增大柱撑剂酸碱比、提高柱撑温度以及加入适量碱,有利于插层复合反应的进行和锐钛晶型的生长;柱撑前驱物焙烧后TiO2晶粒长大,同时焙烧引起的脱水导致膨润土层间距的下降;为获得较理想的产物,合适的柱化条件为:柱撑剂酸碱比 n n (HNO3)为13、柱撑温度65 ℃和柱撑液加碱量为(2 mol/L NaOH) 6 mL。

An ultra-high strength, weldable, low alloy steel with excellent cryogenic temperature toughness in the base plate and in the heat affected zone when welded, having a tensile strength greater than 830 MPa (120 ksi) and a micro-laminate microstructure comprising austenite film layers and fine-grained martensite/lower bainite laths, is prepared by heating a steel slab comprising iron and specified weight percentages of some or all of the additives carbon, manganese, nickel, nitrogen, copper, chromium, molybdenum, silicon, niobium, vanadium, titanium, aluminum, and boron; reducing the slab to form plate in one or more passes in a temperature range in which austenite recrystallizes; finish rolling the plate in one or more passes in a temperature range below the austenite recrystallization temperature and above the Ar3 transformation temperature; quenching the finish rolled plate to a suitable Quench Stop Temperature; stopping the quenching; and either, for a period of time, holding the plate substantially isothermally at the QST or slow-cooling the plate before air cooling, or simply air cooling the plate to ambient temperature.

在基体板以及焊接时的热影响区处的低温韧性优异的超高强度、可焊接、低合金钢具有高于830MPa(120ksi)的抗拉强度,并且具有包含奥氏体薄膜层和细晶粒的马氏体/下贝氏体板条的显微层状组织,所述钢的制备过程为:加热含有铁以及特定重量百分比的添加元素的钢坯,所述添加元素为碳,锰,镍,氮,铜,铬,钼,硅,铌,钒,钛,铝,以及硼中的一些或全部;在奥氏体可发生再结晶的温度范围内,采用一个或多个道次,将所述钢坯轧制成板材;在低于奥氏体再结晶温度但高于Ar 3 转变点的温度下,采用一个或多个道次对所述板材进行终轧;将所述终轧板材淬火至一适当淬火终止温度;停止所述淬火;或者在空冷前在QST点基本等温保持所述板材一段时间,或者对所述板材进行缓慢冷却,或者只是简单地将所述板材空冷至室温。

Electrodeposition during brush plating could be changed at a broad area with the inverter by controlling wave, frequency pass arid close and average value of electric current. Electrocleposition process of metal ion was changed and brush plating coating with tine grain, high hardness and good wear resistance was obtained.

逆变焊镀充电多功能电源通过控制电流的波形、频率、通断和平均值,使刷镀过程的电沉积在很宽的范围内变化,改变了金属离子的电沉积过程,获得了晶粒细密、硬度高、耐磨性好的刷镀层。

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