掩模效应

Alternating aperture phase shift mask is an advanced technology to enhance lithography resolution by adding phase shifters to the mask, which corrects the pattern distortion caused by diffraction of light in deep sub-wavelength lithography.

交替移相掩模是一种通过对掩模版进行相位偏移而提高光刻分辨率的先进工艺技术，用来解决深亚波长光刻下由于衍射效应引起的图形失真问题。

A metastable helium atomic beam effused out of atom source is firstly cooled transversally by laser. This well-collimated atomic beam traveling through the light standing-wave whose direction is perpendicular to atomic beam is quenched, and channeling effect happens in atomic density distribution.

亚稳态原子束从原子源喷出后首先对其进行横向激光冷却，准直后的原子束穿过与之垂直的激光驻波场时发生淬火过程，原子的密度分布出现沟道化效应，给出基于光掩模制作纳米图形的基本原理、理论分析及模拟结果。

In the United States, chronic alcoholism and hepatitis C are the most common ones.

在美国，慢性酒精中毒，肝炎是最常见的。

If you have any questions, you can contact me anytime.

如果有任何问题，你可以随时联系我。