掩模

Adaptive subdivision is performed only in the areas facing to the viewpoint in the pre-process. And in the each adaptive subdivision, we choose the normal angle of the adjacent faces as the control error to detect whether the approximation is sufficient. Sharp edges are automatically tagged according to the given thresholdθand subdivision masks are designed based on different sharp degrees.

在预处理过程中，只选取面向视点的网格作为能够被进一步自适应细分的网格；在自适应细分过程中，用相邻面片的法向夹角作为控制误差来反映细分的逼近程度是否足够；并根据预设的阈值θ自动标记网格中的尖锐特征边，重新设计尖锐特征处的权值掩模。

A fan-shaped aperture mask was designed, the aperture mask cooperate with a 3-axies worktable, makes up the micro-drilling system.

设计了扇形掩模，依据三轴联动加工台，设计了掩模钻孔加工系统，在此基础上研究了掩模旋转钻孔的加工参数。

Alternating aperture phase shift mask is an advanced technology to enhance lithography resolution by adding phase shifters to the mask, which corrects the pattern distortion caused by diffraction of light in deep sub-wavelength lithography.

交替移相掩模是一种通过对掩模版进行相位偏移而提高光刻分辨率的先进工艺技术，用来解决深亚波长光刻下由于衍射效应引起的图形失真问题。

Experimental results indicate that silicon tips of octahedron and tetrahedron are fabricated with changing mask directions. The direction of mask does not affect the rapid etched crystal planes at the fixed solution concentration and temperature.

实验结果表明：当腐蚀溶液浓度和温度一定时，正方形掩模的方向并不影响快腐蚀晶面的类型，利用正方形掩模的偏转，可以制备出八面体和四面体的硅尖。

Choosing different values of red, green and blue to form different colors, masks composed of these colors can be obtained by color film recorder.

通过选取不同RGB值组合成特定颜色，由彩色胶片输出仪输出这些颜色组成的彩色掩模，获得的彩色胶片掩模用来线性调制曝光量，从而实现二元光学元件台阶深度的线性化。

The main characteristics, such as the matching behaviors of films coated on substrates in fabrication of concave cylinder photoresist microlens arrays, the structural parameter design of photoetching mask which is relevant to the fabrication of the microlens, and control basis of photoresist mask technological parameters, are analyzed respectively.

分析了在光致抗蚀剂柱凹微透镜图形制作过程中的膜系匹配特性，与制作该种微透镜有关的光掩模版的主要结构参数，以及光致抗蚀剂掩模工艺参数的控制依据等。

The research on the UV photosensitivity in germanosilicate fibers is of double importance in both theory and practice.

重点研究了位相光栅掩模复印法，采用标量衍射理论对位相光栅掩模的近场衍射特性进行了分析，具体研究了写入光正入射和斜入射条件下的成栅特点，得出了一些重要结论。

With the increased design complexities brought in by applying different RETs, post-RET sign-off verification is quickly becoming necessary.

分辨率增强技术的应用使得光刻用掩模图形日趋复杂，而掩模制造成本和制备时间也随之增加。

Photoresist becomes viscous when heated above its glass transition temperature, so the line of photoresist mask can be smoothened.

为了消除重力的影响，在倒置状态下对光刻胶掩模进行高于其玻璃转变温度以上的烘烤，尽量保证光刻胶线条高度的同时得到了光滑的光刻胶掩模，再结合光刻胶灰化技术，进一步得到小占宽比、平直而且干净的光刻胶掩模。

Because of diffraction and other physical phenomena during mask making, optical lithography and etching under Sub-Wavelength Lithography, the mask patterns are not the same as printed shapes on silicon wafer.

在亚波长光刻下，由于掩模制造、光刻和蚀刻过程中光的衍射及其它物理现象，导致掩模图形和硅片表面实际印刷图形之间不再一致。

The absorption and distribution of chromium were studied in ryeusing nutrient culture technique and pot experiment.

采用不同浓度K2CrO4(0，0.4，0.8和1.2 mmol/L)的Hoagland营养液处理黑麦幼苗，测定铬在黑麦体内的亚细胞分布、铬化学形态及不同部位的积累。

By analyzing theory foundation of mathematical morphology in the digital image processing, researching morphology arithmetic of the binary Image, discussing two basic forms for the least structure element: dilation and erosion.

通过分析数学形态学在图像中的理论基础，研究二值图像的形态分析算法，探讨最小结构元素的两种基本形态：膨胀和腐蚀；分析了数学形态学复杂算法的基本原理，把数学形态学的部分并行处理理念引入到家实际应用中。