刻

In the paper, we base on Synopsys Hercules physical verification tool, we implement all Litho Rules by Hercules.

本文中，我们采用现有的Synopsys Hercules物理验证工具，利用物理验证工具的图形处理能力和版图模拟能力，实现了所有的光刻规则。

Therefore, litho rule check is necessary to be added into physical implementation flow, in order to certify the yield and warrant that the distortion between wafer shape and design shape is under control.

光刻规则验证主要是为了保证经过RET修正后的版图，经过曝光后，wafer上的图形的变形和设计版图在一定允许的范围之内。

One chip is verified by these Litho Rules, we analyze the result, and find the bottle neck : first the runtime, for mask simulation cost long runtime.

并且基于实际的chip，分析了光刻规则在实际设计流程中的瓶颈：1）运行时间长，版图模拟时间长 2）内存消耗大。

Within the framework this technical process is planned to use 193 nm immersion lithograph.

的框架内这一技术过程是计划使用193纳米沉浸光刻。

The analogous dry version 193 nm lithograph now uses IBM for the production of its 65 nm of products.

类似干版193纳米光刻现在使用IBM生产的65纳米的产品。

It is an new technology to use synchrotron radiation lithograph for making large scale integral circuit.

在进行大规模集成电路光刻时，采用同步辐射光源是一项新技术。

Problem in the fact that IBM will not have time to inject EUV- lithograph to 2009, although some developments in this sphere will be by this time actively conducted.

问题的事实， IBM公司将没有时间去注入远，光刻至2009年，尽管一些事态发展在这一领域将是这个时候积极开展。

Some information about the plans IBM on the passage to EUV- lithograph last week published site EE times.

一些有关的计划， IBM公司通过向远，光刻上周发布的站点电子工程专辑倍。

Companies TSMC and UMC will begin to use a immersion lithograph of the within the framework 45 nm technical process or even earlier.

公司台积电和联华电子将开始使用沉浸光刻的框架内与45纳米技术的过程中或什至更早。

In chapter four, the system design of Laser LIGA Lithography Apparatus and unit design are introduced.

第四章介绍了激光LIGA光刻实验装置的总体设计以及各单元部件的研制情况。

On the other hand, the more important thing is because the urban housing is a kind of heterogeneity products.

另一方面，更重要的是由于城市住房是一种异质性产品。

Climate histogram is the fall that collects place measure calm value, cent serves as cross axle for a few equal interval, the area that the frequency that the value appears according to place is accumulated and becomes will be determined inside each interval, discharge the graph that rise with post, also be called histogram.

气候直方图是将所收集的降水量测定值，分为几个相等的区间作为横轴，并将各区间内所测定值依所出现的次数累积而成的面积，用柱子排起来的图形，也叫做柱状图。