刻
- 与 刻 相关的网络例句 [注:此内容来源于网络,仅供参考]
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A photo-tool is prepared which is a negative of the required etch image and is often a silver photographic emulsion plate.
一个照片工具准备这是一种必要的蚀刻负面形象往往是银感光乳剂板。
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Ion beam etching ; Grating ; surface relief ; Quasi directional effect
离子束蚀刻;光栅;表面浮雕结构;准单向蚀刻效应
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Quasi-single field reflective scanning method.
钢带用做刻线模板,其刻线周期为200 m。
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The entire weapon is as black as pitch and reflects no light; its grip is textured with a delicate web pattern while hundreds of tiny spiders are engraved along the two-foot blade.
整个兵器漆黑有如沥青,丝毫不反射光芒;剑柄刻著一张精巧的网的图案,数百只小蜘蛛刻满了两尺长的剑刃。
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In this study, alkanethiolate molecules with -CH3 terminated tail group chemically adsorb upon Au substrate and form Au-S bonds, which potentially act as ultra-thin resist films with excellent uniformity in molecular order and high resistivity to chemicals.
且因CH3 官能基表面具化学惰性,针对特定化学蚀刻液拥有抵抗化学腐蚀之能力,以此特性将可应用於制作微奈米等级图案的超薄蚀刻阻剂。
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Furthermore, the photo-tool containing the negative image of the desired etch pattern is often distanced from the etch-resist layer and diffraction of the UV light irradiation can lead to development and polymerisation in unwanted areas of the etch-resist directly beneath the photo-tool masked areas.
此外,有大量的照片工具载有所需的蚀刻模式的负面形象往往是远离了蚀刻,抵制层和紫外光照射可导致衍射发展和聚合在etch中不想要的区域,抵制照片下方的直接工具蒙面地区。
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The exposed areas of metal or alloy which are not protected by the polymerised etch-resist layer are then selectively removed by chemical etching from those areas protected by the etch-resist layer.
暴露的金属或合金的地区不属于蚀刻的聚合性保护抵制层,然后有选择地去除蚀刻由保护层这些地区的抵抗化学腐蚀。
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The structure of the thin film capacitor 1 of this invention is: form sequentially at least the bottom electrode layer 102, the high dielectrics constant oxide film 103 and the upper electrode layer 105 on the semiconductor substrate 101; said upper electrode layer 105 which is a film layer 104 formed by the electrical conductive material which is processable by reactive ion etching, or a multilayered film composed of two kinds of film layers 107 and 108, which are each formed of a conductive material which is processable by at least two kinds of reactive ion etching.
要约 薄膜电容器1是至少在半导体基片101上按顺序形成下部电极层102、高介电常数氧化物膜层103、上部电极层105而构成的薄膜电容器,该上部电极层105由一种仅由可用反应性离子刻蚀加工的导电性材料形成的膜层104,或至少两种由可用反应性离子刻蚀加工的导电性材料分别形成层状的多层膜层107和108构成;经历350℃的热试验之后,对该薄膜电容器1施加OV到2V的驱动电压的薄膜电容器漏电电流密度为1×10 -8 A/cm 2 以下。
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We have the following to the home of the Monkey King Shuilian Dong, Shui Liandong water hole like Tang Ao, clear spring linked to come, hard to Love Will Tear Us Apart, career hole sewing little bit of water falling, like Crystal Ock, in order to string into a curtain, sweet and delicious, we had I will, you can taste, to ensure that there will be a feeling that we can look forward and see a lot of stone, such as Shuilian Dong, and so on Lingquan Inscription, we go further, the "Shenquan Helprin,""High Mountain and Flowing Water" 2 Schleswig, is a well-known craftsmen in the Ming Dynasty under the hand-written and significant Cao moment, momentum Amorous deep-hung, also on the west side of a Yubei, above which the "heart of the stone hut and India" are two words for the two Emperor Daoguang Governor Jiang Tao Shu personally wrote.
下面我们到孙悟空的老家水帘洞去,水帘洞洞水宛如堂奥,清泉纷挂,难分天上人间,洞口涯缝滴水点点坠落,恰似水晶玉珠,串以成帘,而且甘甜可口,大家过一会,可以品尝一下,保证会有一番感觉,大家可以向前看,会看到很多石刻,如水帘洞,灵泉等题刻,大家再往上看,&神泉普润&,&高山流水&二块石勒,是明代著名工匠根据曹显手书而刻,气势雄深豪放,西侧还有一道御碑,这上面的&印心石屋&四个字是道光帝为两江总督陶澍亲笔题写。
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Kerch, Ukraine, on the west side of Kerch Strait, recorded sustained winds of 45 mph and a minimum pressure of 988 mb as the storm blew through.
刻赤,乌克兰,对海峡西岸的刻赤海峡,录得持续风速45英里每小时和最低限度的压力, 988甲基溴作为风暴4.62点。
- 推荐网络例句
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Finally, according to market conditions and market products this article paper analyzes the trends in the development of camera technology, and designs a color night vision camera.
最后根据市场情况和市面上产品的情况分析了摄像机技术的发展趋势,并设计了一款彩色夜视摄像机。
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Only person height weeds and the fierce looks stone idles were there.
只有半人深的荒草和龇牙咧嘴的神像。
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This dramatic range, steeper than the Himalayas, is the upturned rim of the eastern edge of Tibet, a plateau that has risen to 5 km in response to the slow but un stoppable collision of India with Asia that began about 55 million years ago and which continues unabated today.
这一引人注目的地域范围,比喜马拉雅山更加陡峭,是处于西藏东部边缘的朝上翻的边框地带。响应启始于约5500万年前的、缓慢的但却不可阻挡的印度与亚洲地壳板块碰撞,高原已上升至五千米,这种碰撞持续至今,毫无衰退。