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H-BN thin films were prepared on the (100)-oriented surface of n-Si by r.f. sputtering physical vapor deposition.

利用射频磁控溅射方法,真空室中充入高纯N2(99.99%)和高纯Ar(99.99%)的混合气体,在n型(100)Si基底上沉积了六角氮化硼薄膜。

The crystal structure,morphology and tribological properties of Ag films deposited at low temperature were analyzed by X-ray diffraction,scanning electron microscopy and ball-on-disk vacuum tribometer,respectively.

利用X射线衍射仪、扫描电镜和真空摩擦试验机对低温沉积银膜的晶体结构、表面形貌和摩擦学性能进行了研究。

Will take the advantage of its technology open Chinese market by reducing cost,and devote to being the biggest Hydrocarbon Vacuum cleaning device manufacturing enterprise in China.

富利美工业清洗设备有限公司将充分利用总公司技术优势不断开拓中国市场,降低成本,为建设中国最大的碳化水素真空清洗设备制造企业而努力。

Steel plant, the water model and the method of the circulation flow rate determination of RH vacuum degasser have been established.

RH改进脱碳模型可以预测RH处理过程中的碳含量;利用该模型还得到了最佳初始碳氧含量曲线;为达到最大脱碳速率,应降低转炉出钢含碳量,增大低碳范围内真空室搅拌能;论文还得到了OB与否曲线图,最佳OB时间和最佳OB量。

The third step is the refinement of the fat. Make use of phosphoric acid to degum, sodium hydroyide to deoxidisate, acitive floridin to decolor and rotary evaporator to deodorizate.

三、油脂的精炼,利用磷酸脱胶、氢氧化钠脱酸、活性白土脱色、旋转蒸发真空处理脱腥,得到精炼鱿鱼油。

Increasing the annealing temperature from 150 to 400℃ for 1h, CeSi〓 or LaSi〓 forms gradually and the completion of reaction occurs at 300-400℃.

在超高真空下,室温,利用电子束蒸发在Si(100)衬底上分别淀积1500埃的轻稀土金属La和Ce薄膜。

Mn/Sb multilayer films were grown on (100) GaAs substrate by an ultrahigh vacuum evaporation system and were annealed for a sho rt time. The magnetic and magneto-optical properties were investigated for the samples unannealed and annealed, respectively.

利用超高真空电子束蒸发技术在GaAs(100)上生长Mn/S b多层膜,并经短时间热退火处理分别研究了其退火前后的磁性、磁光克尔效应及相应规律。

A new woodceramics was developed by carbonizing phenolic resin and sanding wood powder composite under vacuum at high temperatures.

利用砂光木粉浸渍酚醛树脂后经高温真空炭化处理制成木陶瓷,研究了炭化温度对木陶瓷尺寸收缩、碳得率、密度变化、抗压和抗弯强度的影响。

It is concluded that,at low-pressure operation of magnetron sputtering system and high pumping rate the potential of discharge depends directly on the reactive gas concentration.

本文研究了反应式磁控溅射方法利用Ar/N2混合气体镀制氮化铝薄膜的工艺过程,实验表明在高真空和高泵浦速率条件下,放电电压直接依赖于反应气体珠浓度。

It is concluded that,at low-pressure operation of magnetron sputtering system and high pumpingrate the potential of discharge depends directly on the reactive gas concentration.

本文研究了反应式磁控溅射方法利用Ar/N2混合气体镀制氮化铝薄膜的工艺过程,实验表明在高真空和高泵浦速率条件下,放电电压直接依赖于反应气体珠浓度。

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