光蚀刻

The electroplated ferronickel shutter is suspended by a silicon spring The shutter is fabricated by the nonsilicon surface micromachining techniques. The planar coil is fabricated by high-aspect-ratio photolithography and mask-plating processes. And the silicon spring and the fiber alignment components are fabricated by the reactive ion etching and by the silicon anisotropic etching process.

电镀铁镍制作的挡光片被固定在一个硅弹簧上，该挡光片采用非硅表面微加工工艺制作，平面电感线圈利用高深宽比的光刻工艺和掩蔽电镀工艺制作，硅弹簧和光纤对准元件采用反应离子刻蚀和硅的各向异性腐蚀工艺制作。

Resistance pure water system, 3-waste treatment system, and shock-proof working-table, and about 80 sets of micro-electrical-mechanical technical equipment are installed, including AMS200 ICP plasma etching system, ICP-2B etching machine, AWB04 bonding machine, MA6/BA6 Karlsus double-face photolithography machine/bonding machine, POLI-400 chemical-mechanical-polishing tool, WL2040 aluminum-wire press welder, OPTI CAOT 22i decktop precision spin coasting system, ZSH406 automatic dicing saw system, DQ-500 plasma photoresist-removing machine, HXS150S automatic centrifugal spinner, AXTRON MOCVD metal organic chemical vapor deposit system, 4470 micro-control 4-tube diffusing furnace, type 4371 LPCVD low pressure chemical vapor deposit system, OMICRON MBE molecular beam epitaxy system, JS-3X100B magnet-control spattering equipment, PECVD-2E plasma deposit apparatus, ZZSX500C electron-beam vapor equipment, JC500-3/D magnet-control spattering-coating machine, H63-14/ZM quartz-tube cleaning machine. Measurement instruments include OLS1100 Confocal Laser Scanning Microscope, DEKTAKIII Surface Profiler, D41-11A/ZN 4-probe resistance test instrument, Nikon L150 metallurgical microscope, and so on.

中心现有80多台各种微机电工艺设备，如AMS 200深硅等离子体刻蚀系统、ICP-2B刻蚀机、AWB04键合机、MA6/BA6 Karlsuss双面光刻机和键合机、POLI-400化学机械抛光机、WL2040铝丝压焊机、OPTI CAOT 22i喷涂胶机系统、ZSH406全自动划片机、DQ-500等离子去胶机、全自动清洗甩干机、AXTRON MOCVD金属有机物化学气相沉积系统、4470微控四管扩散炉、4371LPCVD低压化学沉积系统、OMICRON分子束外延系统、JS-3X100B磁控溅射台、PECVD-2E等离子淀积台、ZZSX500C电子束蒸发台、JC500-3/D磁控溅射镀膜机、石英管清洗机，以及多种常用测试仪器，如OLS1100激光共聚焦显微镜、DEKTAK-III台阶测量仪、D41-11A/ZN四探针电阻测试仪、Nikon L150金相显微镜等。

This paper introduced principle, process, characteristics and controlling deep slot of spiral groove movable ring of photoetching in the liquid hydrodynamic seal.

主要介绍了流体动力密封螺旋槽动环光刻工艺的特点、原理、工艺过程、工艺流程、槽深控制方法以及应用情况，提出了采用高能束流刻蚀螺旋槽动环的新途径。

Firstly, the theory and knowledge of sparking and burning are briefly introduced. The holistic project of this experiment is designed aiming to the experiment motive. And then the micro-process technique on silicon is chosen. According to the technique, the structure and size of the micro chamber, the spark device, the gas-fired channels are designed. The mask of lithography is produced based on the design. At last, the whole burning room is produced by the techniques of photolithography, deposition, dry etching, wet etching, lift off, etc.

本文首先介绍了点火燃烧的有关原理和基本知识，然后根据提出的实验研究目标，确定了微小空间内点火特性实验总体方案，之后结合拟采用的硅微加工工艺设计确定了微燃烧室、放电点火装置、燃气通道等各部件的结构尺寸，并最终得到光刻用掩膜版图形，最后分别采用光刻、淀积、干法刻蚀、湿法刻蚀、剥离等硅微加工技术完成了实验用微燃烧室的制作。

In this dissertation, InGaAs/InGaAsP/InP MQW microdisk laser and its characterization were presented. Some conclusions are as following: the characteristics of lasing threshold was discussed by using rate equation. The dependent relations between threshold and cavity volume, spontaneous emission coupling efficiency β were investigated. The whispering gallery mode and spontaneous emission in a microdisk geometry were then studied. Almost all spontaneous emission was coupled into the lowest order TE mode when the normalized thickness of photonics well was between 0.15 and 0.5. The design principle and device process of InGaAs/InGaAsP/InP MQW microdisk laser were presented. The microdisk lasers with the diameter of 8μm, 4. 5μm and 2μm were succesfully fabricated by using etching techniques. The pulse lasing thresholds for the microdisk with the diameter of 8μm and 4. 5μm were 170μW and 15μW, a record results compared with the published in the literature. The cw lasing threshold for a 2-μm-diameter microdisk was only a few μW. We haven't found similar report up to now. To solve the problem of directional output in a microdisk laser, the power coupling efficiency in a double disk geometry was investigated with the theory of waveguide mode couple. A new structure of electrically pumped microdisk laser with output waveguide was designed, making a foundation for the practical use of microdisk laser.

本文主要研究InGaAs/InGaAsP/InP多量子阱半导体碟型激光器的研制和特性表征，并取得如下结果：利用速率方程理论讨论了激光器激射阈值的特性，分析了阈值与腔体积和自发发射耦合系数β之间的关系；讨论了微碟光子阱结构中的自发发射特性和微碟中WGM模式特性；光子阱结构在其归一化厚度在0.15-0.5之间时，几乎全部自发发射进入到最低阶TE模式中；研究了InGaAs/InGaAsP/InP多量子阱微碟激光器的结构设计原理和器件的制备工艺；利用刻蚀方法成功制备出直径分别为8μm、4.5μm、2μm的碟型微腔激光器；直径8μm和4.5μm的微碟脉冲光泵浦激射阈值分别为170μW、15μW，是目前所见文献报导中比较低的；直径2μm的微碟连续光泵浦激射阈值仅几μW，目前尚未见到达到类似结果的研究报导；为解决微碟激光器激射光定向引出的问题，通过波导耦合模理论分析了双层碟之间功率耦合效率；据此设计了新型带耦合输出波导的电泵浦微腔激光器，为进一步研制可实用的电泵浦微腔激光器打下基础。

The normal-direction luminance produced by the backlight design based on this research was compared with that of the backlight with light-scattering dots based on the traditional etching process.

经分析后可发现，本研究设计在不加任何膜片的情形下，辉度比蚀刻网点高出三倍，且具有出光面Y方向集光之功能。

The photo-etched wipers are carried over, thankfully, and they are flawless.

被蚀刻雨刷的光被过次页，感谢的，而且他们是毫无瑕疵的。

Some new processes and technologies in electronics finishing such as wafer plating, eCMP,MEMS plating, lead and cadmium free electroless nickel,copper plating using insoluble anode and recycling of etching solution for PCB industry and platinized niobiumelectrode are briefly introduced.

文对电子电镀中若干新工艺新技术如芯片电镀、化学机械抛光、MEMS 电镀、PCB 工业中采用不溶性阳极电镀铜工艺以及铜蚀刻液回收再生、无铅无镉化学镀镍、镀铂铌电极等进行了简要介绍。

Some new processes and technologies in electronics finishing such as wafer plating, e CMP ,MEMS plating,lead and cadmium free electroless nickel,copper plating using insoluble anode and recycling of etching solution for PCB industry and platinized niobiumelectrode are briefly introduced.

文对电子电镀中若干新工艺新技术如芯片电镀、化学机械抛光、 MEMS 电镀、PCB 工业中采用不溶性阳极电镀铜工艺以及铜蚀刻液回收再生、无铅无镉化学镀镍、镀铂铌电极等进行了简要介绍。

As above mentioned, it could be improved the optics characterization of films efficiently by textured aluminium doped zinc oxide films by wet etching. Using solar cells as transparent electrode enables the light passed through solar cells and reduceds reflectance to permeate into absorb layer of solar cells and improve conversion efficiencies of solar cells.

由上述的光学性质变化中可得知，经由湿式蚀刻过程后的氧化锌掺铝薄膜确实能有效改善薄膜的光学特性，对於应用於太阳电池中当透明电极使用时，能使更多入射光通过元件表面而进入吸收层内，帮助提升太阳电池的转换效率。

Neither the killing of Mr Zarqawi nor any breakthrough on the political front will stop the insurgency and the fratricidal murders in their tracks.

在对危险的南部地区访问时，他斥责什叶派民兵领导人对中央集权的挑衅行为。

In fact,I've got him on the satellite mobile right now.

实际上 我们已接通卫星可视电话了