光刻的

The synchrotron radiation light source used in LIGA technique for deep lithography is becoming more and more important because of its unique qualities-(1) high brightness, usually being 10〓~10〓 times of common X-ray light source;(2) good collimate, the angle of divergence of synchrotron radiation light source could be compared with that of laser light source.

由于同步辐射光源具有（1）亮度高，比一般X射线源高10〓~10〓倍，（2）准直性好，辐射张角可以与激光相比的特点，因而，利用同步辐射光源作为LIGA技术中深度光刻光源正日益受到重视。

Under the existing condition of the lab, a lot of experiments, analyzing and improving are made. Now, the problems in photoengraving, sputtering and diffusion etc. have been solved elementally. Excellent technological parameters are achieved and 2×2 LiNbO3 waveguide optical switch has been fabricated successfully. At the end of this paper, the losses of 2×2 LiNbO3 waveguide type optical switch are analyzed. The testing system is established. The V-grooves used for coupling have been designed.

我们在现有的实验条件下，经过反复实验，分析和改进，克服了光刻，溅射，扩散等各个阶段中的难题，总结出各部分最优的工艺参数，制备出了2×2定向耦合器型光波导开关，在本文的最后对制备出的光波导开关的各种损耗进行了分析，建立了测试系统，对光开关进行了通光测试，并对本2×2定向耦合器型光波导开关以后的耦合封装V型槽进行了设计。

An exceptionally clear adhesive can be made from fish and was the first adhesive used for photographic emulsions for photo film and photo resist coatings for photoengraving processes.

从鱼身上可以提取制成极其透明的粘胶，在胶片的感光乳胶和光刻蚀工艺的光阻涂层中首先被用作粘合剂。

The invention discloses a method to integrate single CMOS with bulk silicon microelectromechanical system, its technical project: 1 forming isolating groove: adopting deep-groove etching, and SiO2 and polycrystal silicon filling to realize the insulation of MEMS structure and CMOS circuit; 2 making standard CMOS circuit; 3 using SiO2 and Si3N4 as mask, etching silicon on the back until exposing SiO2 at the bottom of the isolating groove, to complete the thickness control for MEMS silicon structure layer; 4 completing metalizing the CMOS circuit and masking the MEMS structure: MEMS structure region uses Al as mask and CMOS circuit region uses thick photoetching glue as mask, using DRIE to release silicon structure.

本发明公开了一种将单片CMOS与体硅微机械系统集成的方法，其技术方案为：1形成隔离槽：采用深槽刻蚀，SiO 2 和多晶硅填充，实现MEMS结构和CMOS电路的绝缘；2完成隔离槽后进行标准CMOS电路的加工；3用SiO 2 和Si 3 N 4 作掩膜，从背面腐蚀硅，直至暴露出隔离槽底部的SiO 2 ，完成MEMS硅结构层的厚度控制；4完成CMOS电路金属化和MEMS结构掩膜：MEMS结构区用铝作掩膜，CMOS电路区用厚光刻胶作掩膜，用DRIE释放硅结构。用本发明方法不仅获得了较大的质量块，而且用本发明较高的深宽比制作出的结构电容，同时实现了体硅微机械与CMOS电路的集成，显著提高MEMS传感器的精度和稳定性，具有前沿性和重要实用价值。

The difference between fabrication of binary optic element and that of continuous- relief MOE may not be ignored.A reciprocal equation among the depth,exposure,density of the developer and its etching time was inferred,with the appropriate conditions that proved to be useful for the MOE fabrications.

分析了光刻胶及显影液在制作二元和连续元件中所存在的差别；导出具有倒易关系的浮雕深度表达式和适用的范围，并以此指导面形的控制，对光刻胶进行适当的改造以适应连续微光学元件的制作。

When you try to create a system image on a recordable Blu-ray disc, Windows 7 Backup and Restore tool keeps on asking you to insert a new disc, even when you have done so.

当您尝试创建一个可刻录蓝光系统映像蓝光光盘的视窗7备份和还原工具一直在问你插入一个新的光盘，甚至当你这样做了。

Concentration contours of flux distribution for several interesting cases are presented,the different working areas of high flux footage from 5,000 suns to 15,000 suns have been compiled and photos showing the "powerful etching" of a steel plate by the hot spot of the solar furnace are also included.

我们列出了在几种有趣的情况下聚光比的等高线分布，还列出了从5，000到15，000个太阳，不同聚光倍数的工作区域。照片显示了该太阳炉在钢板上强大的"刻蚀"效果。来源：Ab79797BC论文网www.abclunwen.com

There are more advantages in holographic grating than in nicking grating such as no optical spectrum,no ghost line,high resolution ratio and so on.

全息光栅与刻痕光栅相比有着更多的优点，如光谱中无鬼线、杂散光少、分辨率高等，因此，全息术成了制作光栅的首选方法，其中光路的选用在制作过程中就尤为重要了，但现有的制作方法选用的光路却不是很恰当，为此，对其进行了改进。

The resulting polymers showed good thermal properties and excellent organosolubility even in common low boiling point solvents, such as acetone, chloroform and 1, 1, 2-trichloroethane, yielding a polymer solution with solid contents over 10wt%.

聚合物膜的紫外-可见光吸收阀值波长低于350nm，比线性类似物的（450nm）低许多，得益于超支化结构导致的酰亚胺环结构的疏松堆积，有利于以其为大分子骨架的光敏材料在365nm紫外工作波长的光刻。

By using soft-lithography the 1×8 polymeric power splitters were prototyped and the measurement was in a good agreement with the calculated result.

采用极具优势的软光刻技术印制成功高聚物1×8光功率分配器，在实际的测量中所得损耗结果与模拟仿真符合较好。

Plunder melds and run with this jewel!

掠夺melds和运行与此宝石！

My dream is to be a crazy growing tree and extend at the edge between the city and the forest.

此刻，也许正是在通往天国的路上，我体验着这白色的晕旋。