光刻的

Meanwhile, it has a good compatibility with traditional proximity or contact lithography, thus we can carry the same manufacturing process on the basis of little modification of traditional aligner's system.

由于基于表面等离子体的光刻技术和传统的光刻系统能很好地兼容，因此可以在传统接近接触式光刻机的基础上稍作改进即可实现纳米量级的光刻分辨力。

The theoretical research, computer simulation and experimental results analysis show that maskless laser interferometric lithography and holographic lithography have the characteristics of large field of view, high resolution, distortionless, relatively simple system structure, low costs and convenient realization way. They have a broad application prospect.

激光干涉光刻技术研究四川大学博士学位论文理论研究、计算模拟和实验结果分析表明，无掩模激光干涉光刻和全息光刻具有大视场、高分辨率、无畸变、系统相对简单、成本较低，实现方便等特点，具有广阔的应用前景。

In this paper. a novel magnetic head crab track pluck detection way is given by the analysis of etched servo graph for 4000 TPI etched surface servo. It improve the maximum seek track speed of magnetic head greatly, So that magnetic head can seek track at high speak for high track density.

光刻伺服盘是一种新的磁头伺服定位技术［1］，通过对4000TPI光刻面伺服系统的光刻伺服图形结构的分析，本文提出了一种简单可靠的磁头过道脉冲检测方式，可显著提高磁头寻道速度，保证磁头在高道密度下高速寻道。

This paper introduced principle, flow, process of catalytic platelets of photoetching in the integral catalyst bed with high precision mould of dual-face self-aligner and standard MEMS photoetching technology.

采用自主设计研制的高精度双面自对准光刻模具和标准MEMS 光刻工艺技术研制出整体式层板催化剂床板片，简要介绍了光刻工艺原理、工艺流程和工艺过程。

The user can be in Beijing not only east store with 2, 999 yuan exceed low case to be bought at present industry La Guang writes the LG GGW-H20L La Guang with the rapiddest rate to cut collection engine, in the meantime, still can obtain freely give 2 pieces of only film magazine to install La Guang of power treasure 25GB BD-R to engrave collection plate, and buy a machine while the user that hopes to have more blue photoetching to record dish, OK still special offer 89 yuan / piece the price (cost price 168 yuan / piece), buy most La Guang of BD-R of 5 pieces of power treasure engraves collection plate (offer this bargain price to the user that buys a machine only) favourable activity.

用户不仅可以在京东商城以2，999元的超低价格购买到现在业界蓝光写入速度最快的LG GGW-H20L蓝光刻录机，同时，还可免费获赠2张单片盒装威宝25GB BD-R蓝光刻录碟，而购买机器的同时希望拥有更多蓝光刻录碟的用户，还可以特价89元/张的价格(原价168元/张)，购买最多5张威宝BD-R蓝光刻录碟(仅向购买机器的用户提供此特价)的优惠活动。

Firstly, the theory and knowledge of sparking and burning are briefly introduced. The holistic project of this experiment is designed aiming to the experiment motive. And then the micro-process technique on silicon is chosen. According to the technique, the structure and size of the micro chamber, the spark device, the gas-fired channels are designed. The mask of lithography is produced based on the design. At last, the whole burning room is produced by the techniques of photolithography, deposition, dry etching, wet etching, lift off, etc.

本文首先介绍了点火燃烧的有关原理和基本知识，然后根据提出的实验研究目标，确定了微小空间内点火特性实验总体方案，之后结合拟采用的硅微加工工艺设计确定了微燃烧室、放电点火装置、燃气通道等各部件的结构尺寸，并最终得到光刻用掩膜版图形，最后分别采用光刻、淀积、干法刻蚀、湿法刻蚀、剥离等硅微加工技术完成了实验用微燃烧室的制作。

Polyimide was patterned by direct laser writing, then the patterned polyimide was immersed in silver diammine solution for seeding. The silver particles were deposited in-situ at the irradiated areas on polyimide films, whose particle size was 150-300nm.

用波长为266nm的激光在聚酰亚胺薄膜表面光刻出所需图形，将光刻后的聚酰亚胺薄膜浸入到银氨溶液中，在光刻处发生氧化还原反应并原位沉积了粒径为150nm到300nm的银粒子，以该银粒子作为活化种实施化学镀，在聚酰亚胺表面上沉积得到了金属铜的图形。

A modified aerial image was obtained by convolving the aerial image with a Gaussian filter to smear the image in a manner analogous to resistive diffusion, and then applying a variable threshold resist model on the modified image to predict the CD variations.

用高斯滤波器与空间影像进行卷积，得到改进的空间影像来模拟光刻胶的扩散，然后使用可变阈值光刻胶模型，以实际工艺数据拟合该模型参数，再把改进空间影像的相关信息作为输入，并根据可变阈值光刻胶模型所确定的光强阈值来预测CD变化，从而使光刻仿真的结果更精确地附合实际测量数据。

Photoresist becomes viscous when heated above its glass transition temperature, so the line of photoresist mask can be smoothened.

为了消除重力的影响，在倒置状态下对光刻胶掩模进行高于其玻璃转变温度以上的烘烤，尽量保证光刻胶线条高度的同时得到了光滑的光刻胶掩模，再结合光刻胶灰化技术，进一步得到小占宽比、平直而且干净的光刻胶掩模。

Because of diffraction and other physical phenomena during mask making, optical lithography and etching under Sub-Wavelength Lithography, the mask patterns are not the same as printed shapes on silicon wafer.

在亚波长光刻下，由于掩模制造、光刻和蚀刻过程中光的衍射及其它物理现象，导致掩模图形和硅片表面实际印刷图形之间不再一致。

Plunder melds and run with this jewel!

掠夺melds和运行与此宝石！

My dream is to be a crazy growing tree and extend at the edge between the city and the forest.

此刻，也许正是在通往天国的路上，我体验着这白色的晕旋。