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The silver paste material not only match with the car\'s defog shield heating line, PDP bus electrode, it also suit for those which printing electrode on the glass substrate such as VFD, hybrid multi-layers electrodes and fine line electrode. These material possess widely prospect and potential market.

本项目研制的银浆应用范围除轿车玻璃、PDP显示屏外,同样适用于VFD荧光显示屏等以玻璃基体为底材的电极制作,厚膜多层布线微细线印刷及光刻电子材料工业化应用等领域,应用前景很广阔,可以产生较大的经济效益和社会效益。

The silver paste material not only match with the cars defog shield heating line, PDP bus electrode, it also suit for those which printing electrode on the glass substrate such as VFD, hybrid multi-layers electrodes and fine line electrode. These material possess widely prospect and potential market.

本项目研制的银浆应用范围除轿车玻璃、PDP显示屏外,同样适用于VFD荧光显示屏等以玻璃基体为底材的电极制作,厚膜多层布线微细线印刷及光刻电子材料工业化应用等领域,应用前景很广阔,可以产生较大的经济效益和社会效益。

Uniformity of the photoresist film, adhesiveness between underlay and glue film, exposal and develop condition of high thickness difference are all solved in the thesis.

在厚胶光刻工艺中重点解决了胶膜厚度的均匀性、胶膜与衬底的粘附性、大厚度差胶层的曝光、显影条件等的优化问题。

Potential solutions of the manufacturing problem include hardening the film solidness or balancing the exposure density.

根据之前的理论研究,解决方案包括增加光刻胶膜的坚硬度或者均衡曝光图形的密度。

The production method of the invention replaces the existing film covering light charactering technique, reduces the technique cost and improves the sensitivity and precision of the test.

本发明的制备方法替代目前的掩膜光刻技术,降低工艺成本,提高了检测的灵敏度和精度。

Electric film's facture on surface of crystal was investigated, 30.4μm poled period was designed, and the effect on periodically structure of aster chisel craft was analyzed.

研究了晶体表面导电掩膜的制作,设计了30.4μm的极化周期,分析了光刻工艺对周期性结构的影响。

Being used widely, RETs have become the focus of the research in the global IC industry. Spatial filtering technologies including Off Axis Illumination and Pupil filtering are new RETs.

分辨率增强技术的广泛应用一定程度上解决了亚波长光刻中的许多可制造性问题,因此成为了人们研究的重点。

A brief review of the development of the photolithography and some understudies is given. Some fabrication techniques of localized or self-assemble nanostructure are also introduced.

2简要介绍了微电子光刻技术的发展和现有的一些可替代技术及其优缺点,并介绍了一些利用常规方法和工艺手段实现局域或自组装纳米结构的方法。

By implementing immersion lithography, Matsushita/Panasonic has achieved the smallest minimum metal patterning that we have seen to date, at 67-nm M4 half-pitch.

由于使用了浸入式光刻,松下实现了至今为止最小的金属布线,第四金属层半节距为67nm(两条布线中轴的距离为节距,按布线宽与隔离空间各一半算的话,布线的实际宽度为半节距)。

After analysis on the process limitations existing in three manufacturing methods for metal micro-precision sieves, an optimized UV-LIGA technique based on SU-8 photoresist is presented to manufacture the micromesh nickel sieve-sheets.

分析了现有的精细金属网板制造工艺的优缺点,并提出采用基于SU-8光刻胶的UV-LIGA技术来制备高开孔率大厚度精细金属网板的工艺思路。

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Finally, according to market conditions and market products this article paper analyzes the trends in the development of camera technology, and designs a color night vision camera.

最后根据市场情况和市面上产品的情况分析了摄像机技术的发展趋势,并设计了一款彩色夜视摄像机。

Only person height weeds and the fierce looks stone idles were there.

只有半人深的荒草和龇牙咧嘴的神像。

This dramatic range, steeper than the Himalayas, is the upturned rim of the eastern edge of Tibet, a plateau that has risen to 5 km in response to the slow but un stoppable collision of India with Asia that began about 55 million years ago and which continues unabated today.

这一引人注目的地域范围,比喜马拉雅山更加陡峭,是处于西藏东部边缘的朝上翻的边框地带。响应启始于约5500万年前的、缓慢的但却不可阻挡的印度与亚洲地壳板块碰撞,高原已上升至五千米,这种碰撞持续至今,毫无衰退。