光刻的

Therefore, litho rule check is necessary to be added into physical implementation flow, in order to certify the yield and warrant that the distortion between wafer shape and design shape is under control.

光刻规则验证主要是为了保证经过RET修正后的版图，经过曝光后，wafer上的图形的变形和设计版图在一定允许的范围之内。

Recent years, with the rapid development of the lithography technology, conventional techniques of optical manufacture and measurement are faced with great challenge.

中文摘要近年来，随着光刻技术的不断发展，传统的光学加工检测技术面临着越来越多的挑战。

Since LIGA process is widely used in MEMS technology, Deep lithography is investigated in recent years.

随着LIGA技术在微电子机械系统加工工艺中的广泛应用，尤其是在生物科学技术领域的广泛应用，深度光刻技术也越来越成为研究应用的热点。

At first, exposure dose distribution model of polar laser direct writing was established , and the cause of radial shift was analyzed. And then, the linewidth broadening model and radial shift model were established corresponding to object lens with numerical aperture 0.5, and the coupling relationship between linewidth broadening and radial shift was analyzed.

首先推导了极坐标激光直写的曝光量分布模型，分析了径向漂移产生的原因，然后针对数值孔径为0.5的光刻物镜建立了线条展宽模型和径向漂移模型，并分析了线条展宽和径向漂移的耦合关系，在此基础上分别建立了线条展宽补偿模型和径向漂移补偿模型。

The invention is a method and equipment removing pollution used for the photoetching technology that the IC component creates.

一种消除用于集成电路器件制造的光刻工艺中的污染物的方法和设备。

When manufacturing the resistor memory, the metal upper layer is formed by self-alignment with no requirement of adding masking and photoetching steps, so as to reduce process complexity, improve reliability of storage performance, and reduce process cost.

在制作所述的电阻存储器时，以自对准形成的金属上电极层，无需为制作上电极图形增加掩膜和光刻步骤，减少工艺复杂度，可提高存储性能的可靠性和降低工艺成本。

Three photolithographic masks are utilized in the fabrication process.SEM images show that the microprobe is 1.2mm long,100μm wide,and 30μm thick,with recording sites spaced 200μm apart for good signal isolation.

在整个工艺制作过程中需要三步光刻，制作的硅针长1.2mm，宽100μm，厚30μm，同时各个记录点的间距为200μm，可以形成良好的信号隔离。

AZ is the world leader in photoresists for the flat-panel display market; a major supplier of innovative products to the semiconductor industry; a leading supplier of photolithographic printing chemicals.

目前安智一直保持着平板显示市场光刻胶的领先地位，也是半导体行业创新产品的主要供应商，同时还是照相平板印刷业的主要供应商。

There is tight electromagnetic and mechanical coupling among 6-degree of freedom motions of magnetic levitation planar motor for photolithography.

用于光刻加工的磁悬浮平面电机的6个运动自由度之间存在着紧密的电磁和力学耦合。

The development of microelectronic technology, which is considered as a strategic industry in all those powerful countries of curr...

当代各世界强国的战略工业—微电子技术的发展过程是加工技术不断微细化的过程，光刻技术则是微细加工的关键。

Finally, according to market conditions and market products this article paper analyzes the trends in the development of camera technology, and designs a color night vision camera.

最后根据市场情况和市面上产品的情况分析了摄像机技术的发展趋势，并设计了一款彩色夜视摄像机。

Only person height weeds and the fierce looks stone idles were there.

只有半人深的荒草和龇牙咧嘴的神像。