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The lens is held at a fixed distance away from the light source using precise support structures typically formed by photolithographic processes.

使用通常由光刻工艺形成的精确支撑结构将透镜固定在距光源固定距离处。

In the present invention, such conductor layer is formed by using small number of process steps and without using photolithography process.

在本发明中,这种导体层是用少量工艺步骤形成的而没有用光刻工艺。

Atom photolithography is a new application of atom optics in microfabriaction technical field.

原子光刻是原子光学在微细加工技术领域的新应用。

Meanwhile, a novel method with simple structure for zooming is proposed, which is able to be used in microlens array photolithography system for zooming.

同时提出了一种结构简单、可应用于微透镜列阵成像光刻系统调焦的新方法。

Laser interference photolithography for fabricating periodic patterns in large area .

四激光束干涉光刻制造纳米级孔阵的理论分析。

PMMA compound X-ray lenses are composed of a group of 40 plano-concave elementary lenses positioned in line with axial symmetry.

用LIGA技术中的软 X射线光刻方法制作了PMMA材料 X射线组合透镜。

With the increased design complexities brought in by applying different RETs, post-RET sign-off verification is quickly becoming necessary.

分辨率增强技术的应用使得光刻用掩模图形日趋复杂,而掩模制造成本和制备时间也随之增加。

Our main products including Operation Microscope, Colposcope, Slit Lamp Microscope, Examination Lamp, and Other Optical products.

我们的主要产品有手术显微镜、阴道镜、裂隙灯显微镜、光刻显微镜、手术灯、及其他光学产品。

A new approach towards three-dimensional conducting polymers was explored by the doping of polyaniline emeraldine base with the synthesized C〓 derivative.

本文还对无显影气相光刻工艺进行了优化,改进了腐蚀装置并尝试用准分子激光器作为曝光光源,获得了0.4μm的高分辨率。

As photoresist has the exposal characteristics, two-spectrum method is fit for measuring the thickness of photoresist.

针对光刻胶有曝光的特性,双光谱法更适合于胶厚检测。

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Finally, according to market conditions and market products this article paper analyzes the trends in the development of camera technology, and designs a color night vision camera.

最后根据市场情况和市面上产品的情况分析了摄像机技术的发展趋势,并设计了一款彩色夜视摄像机。

Only person height weeds and the fierce looks stone idles were there.

只有半人深的荒草和龇牙咧嘴的神像。

This dramatic range, steeper than the Himalayas, is the upturned rim of the eastern edge of Tibet, a plateau that has risen to 5 km in response to the slow but un stoppable collision of India with Asia that began about 55 million years ago and which continues unabated today.

这一引人注目的地域范围,比喜马拉雅山更加陡峭,是处于西藏东部边缘的朝上翻的边框地带。响应启始于约5500万年前的、缓慢的但却不可阻挡的印度与亚洲地壳板块碰撞,高原已上升至五千米,这种碰撞持续至今,毫无衰退。