光刻的
- 与 光刻的 相关的网络例句 [注:此内容来源于网络,仅供参考]
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Companies TSMC and UMC will begin to use a immersion lithograph of the within the framework 45 nm technical process or even earlier.
公司台积电和联华电子将开始使用沉浸光刻的框架内与45纳米技术的过程中或什至更早。
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Study on computer simulation of proximity lithography.
接近式光刻的计算机模拟研究。
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According to the demand of high data density of IC devices,higher photolithography resolution is required.
随着IC集成度的提高,要求越来越高的光刻分辨力,但光学光刻的分辨极限受光刻物镜数值孔径和曝光波长的限制。
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Photopolymerization materials used in stereolithography and their recent advance.
用于立体光刻的光聚合材料及其发展。
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The study of this dissertation analyses the focus system technology, which is the key technology of curve plane surface lithographic fabrication techniques.
本文重点讨论了曲面光刻的关键技术——自动调焦系统,并对曲面工艺及光刻线条进行实验分析。
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Finally, with the method of coating and lithography, serrated diffractive aperture is manufactured.
最后,提出采用镀膜结合光学光刻的方法,制作了锯齿型衍射光阑。
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And TM was carefully added to the solution of photo-PAE to form a PSPI solution containing TM. The composite filmcast from PSPI-TM can be developed using NMP. When the content of Ti〓 incomposite film was beyond 3%, a heateddeveloper had to be used for the successful development of the composite film.Compared with corresponding ester-type PSPI, D〓 of PSPI-TM increasedrapidly with the content of TM in the composite.
光刻实验发现这种含TM的PSPI光刻胶膜比相应的酯型PSPI光刻胶膜难显影,一般需NMP这样的强溶解性能的溶剂作为显影液,才能顺利显影,当Ti〓含量大于3%(基于酰亚胺化后PI的量),必须升高温度才能顺利显影;这种含 Ti的PSPI光刻胶在感光性能上也比相应的酯型PSPI光刻胶低很多倍,形成50%留膜率所需的曝光剂量随TM含量的增加,而大幅度地增加。
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Perpendicular waveguide input and output section that is on the baseplate links that on the cuboid structure by bent waveguide of s shape.
本发明公开了一种三维多层垂直耦合光互连结构及其软光刻的制作方法。
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What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm.
本发明揭示了OD-掺杂的合成二氧化硅玻璃,它能够用于在约低于300纳米下进行光刻的光学元件中。
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However, both physical constraints and economics are expected to limit continued miniaturisation of electronic and optical devices by using current "top-down" lithography-based methods.
然而,物理系统规定参数和经济学均被期望限制继续电子产品和光学装置的通过现行的自顶向下基于晶片光刻的方法的小型化。
- 推荐网络例句
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They weren't aggressive, but I yelled and threw a rock in their direction to get them off the trail and away from me, just in case.
他们没有侵略性,但我大喊,并在他们的方向扔石头让他们过的线索,远离我,以防万一。
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In slot 2 in your bag put wrapping paper, quantity does not matter in this case.
在你的书包里槽2把包装纸、数量无关紧要。
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Store this product in a sealed, lightproof, dry and cool place.
密封,遮光,置阴凉干燥处。