低氧化物

The results indicated that, Cd stress caused the increase of proline content, and the imbalance of SOD, POD, CAT activity, thus caused malondialdehyde molality increased in leaves. But in roots, the active oxygen elimination system was still balanced, so malondialdehyde molality kept a low level.

结果表明，Cd胁迫下，玉米叶片中脯氨酸质量比增加，超氧化物歧化酶、过氧化物酶、过氧化氢酶的活性出现失衡现象，丙二醛质量摩尔浓度增加；根部活性氧消除系统平衡未被打破，丙二醛质量摩尔浓度保持在一个较低的水平。

Methods The global cerebral ischemia/reperfusion injury model was established by the four-vessel occlusion (4VO) method, and then the model animals sere given high-middle-and low-dose muscone. Meanwhile, sham-operation group, model group, and positive control group were also set up. The rats neuroethology behavior, and the contents of superoxide dismutase, malondialdehyde and excitatory amino acid in is-chemic brain tissue were examined.

取Wistar大鼠，采用四血管阻断(4VO)法制备全脑缺血再灌流损伤模型，将成模大鼠随机分为麝香酮高、中、低剂量组(3.6， 1.8， 0.9 mg/kg)，并设假手术组，模型组，阳性对照药尼莫地平组(10.8 mg/kg)，共6组，每组12只对大鼠神经行为学，缺血区脑组织超氧化物歧化酶，丙二醛含量，脑组织兴奋性氨基酸含量进行检测。

Lead oxide is a traditional n-type semiconductor material, and it has many advantages, such as low growth temperature, simple preparation methods, high photoconductive and corrosion resistance properties.

氧化铅是一种传统的n型氧化物半导体材料，具有很多的优点，如生长温度低，制备方法简单，耐腐蚀性强，具有很好的光电特性和气敏特性等等，由于氧化铅的这些优点，氧化铅薄膜被广泛应用于透明导电薄膜、摄像、光电探测、气体敏感和耐腐蚀保护膜等领域。

The content of praline and activities of superoxide dismutase and peroxidase were increased under Cd stress. The increase of proline content and POD was more pronounced in the xiushui 63 under lower level of Cd, however, it was more pronounced in the Xiushui 09 under higher level of Cd.

总体上，脯氨酸含量、超氧化物歧化酶、过氧化物酶活性均呈上升趋势，其中，在较低浓度Cd胁迫下，秀水63叶片中脯氨酸含量、POD活性增加幅度较大，而在较高浓度Cd胁迫下，秀水09的增加幅度较大。

The surface film formed at higher potentials consisted of oxides of Ni in predomination with some Fe and little Cr, while that formed at lower potentials was composed of oxides of Cr, Ni and Fe. The latter showed much higher resistance to caustic SCC.

这与较高电位下生成严重贫铬的Ni和Fe的氧化膜，而较低电位下生成由Cr、Fe、Ni的氧化物共同组成的表面膜密切相关。

The results show that, compared with the regular arc spray process, a dense coating with lower porosity, higher bond strength and higher oxide contents were produced by a newly developed high velocity arc wire spray process.

结果表明，和普通电弧喷涂涂层相比，高速电弧喷涂涂层组织致密、孔隙率低、涂层氧化物含量增多，涂层－基体界面结合强度大于40？

Coating with lower porosity, higher bond strength and hhigher oxide?contents were produced by a newly developed high velocity arc wire spray process.The bond strength in higher than 40MPa, which is increased by 52 percent than that of regular arc sprayed coatings.

结果表明，和普通电弧喷涂涂层相比，高速电弧喷涂涂层组织致密、孔隙率低、涂层氧化物含量增多，涂层-基体界面结合强度大于40MPa，比普通电弧喷涂提高了52％。

Possessing the characters of high hardness, low density and inert chemical properties, boron suboxide is the best candidate for super-hard films. The synthesis technique of boron suboxide film is hotpressing.

硼的亚氧化物是坚硬薄膜材料的最佳侯选物之一，具有高硬度，低密度，稳定的化学性质及很多有意思的物理性质等特质。

The optimal processing conditions are as follows: roasting temperature at 1 000℃, roasting time for 40 min, the ratio of NbH dosage to theoretic dosage at 1.1. The specific capacity of niobium suboxide of preparation by agate grind procedure is 69.50 mF·V·g-1, the loss is 11.25%, the leakage current is 1.8×10-4A·F-1·V-1, and the electrical properties are better than that of the national standard (GB/T 3136-1995) of FTa16-300 tantalum powder for capacitor.

用正交试验法及方差分析对玛瑙研磨工艺进行优化，得到制备低价铌氧化物最佳条件是：焙烧温度为1 000℃，焙烧时间为40 min， NbH用量与理论量之比为1.1，所制得的产物杂质含量低，比容为69.50mF·V·g-1，损耗为11.25%，漏电流为1.8×10-4A·F-1·V-1，其电性能指标高于FTa16—300电容器钽粉国家标准(GB/T 3136—1995)所规定的值。

Electron microprobe analysis of tremolite shows that the content of its main oxide isclose to that of standard tremolite but lower than that in general .

电子探针分析结果显示，栾川软玉的主要氧化物成分与标准透闪石成分接近，但是总体偏低，通过计算，结果 Mg2+/(Mg2++Fe2+)﹥0.9，属于透闪石系列。

This one mode pays close attention to network credence foundation of the businessman very much.

这一模式非常关注商人的网络信用基础。

Cell morphology of bacterial ghost of Pasteurella multocida was observed by scanning electron microscopy and inactivation ratio was estimated by CFU analysi.

扫描电镜观察多杀性巴氏杆菌细菌幽灵和菌落形成单位评价遗传灭活率。