查询词典 thin film

Thin film electroluminescence has made possible a new type of terminal display which is totally solid and flat.

平板显示技术是信息时代对终端显示的基本要求，薄膜电致发光显示器具有全固体化平板显示的特点，是一种全新的终端显示器件。

In this paper, conductivity and character parameters of aluminium electrolytic capacitor, show the influence of different kinds and concentrations of surfactant on the charactersof the thin film.

本文分别以电导率和铝电解电容器性能参数为指标，探讨了不同种类和不同浓度的表面活性剂对薄膜性能影响。

Electron Optics ,Analytical Instruments, Semiconductor Equipment ,Thin Film Coating Systems,Medical Equipment

电子光学设备分析仪器半导体方面的设备薄膜喷涂系统医学设备

Low noise amplifier ; elliptic function bandpass filters ; balanced mixer ; ultra-fine thin-film process ; automatic gain control

低噪声放大器；椭圆函数带通滤波器；平衡混频；超微细薄膜工艺；自动增益控制

Energetic particle deposition is one kind of thin film synthesis technique based on energetic beam, such as, IBAD, PLD, IBD etc, which is considered to be of good prospect for wide range of applications. However, comprehensive and systematic understanding has been hardly achieved about the growth mechanism of energetic deposition, especially low energetic deposition.

载能粒子沉积是以离子束技术和常规薄膜制备技术为基础而发展起来的一类具有广泛应用前景的薄膜制备方法，但受研究手段的限制，人们对载能粒子特别是低能粒子沉积的薄膜生长机制一直缺乏比较全面、系统的了解。

In addition, we use different kinds of material analysis method to analyses the physics mechanism of luminescence efficiency of erbium ion strengthened by noble metal thin film.

除此之外，我们也利用各种不同材料分析的方式来分析贵金属薄膜增强铒离子发光效率的物理机制。

SENTECH Instruments develops, manufactures and sells advanced quality instrumentation for Thin Film Metrology (reflectometer, ellipsometer, spectroscopic ellipsometer) and Plasma Process Technology (plasma etcher, plasma deposition systems).

sentech 仪器开发，制造及销售先进的仪表质量薄膜计量和等离子工艺(等离子体刻蚀，等离子体沉积系统)。

This thesis described the etching characteristics of silicon nitride passivation films in the thin-film transistor structure using an enhanced capacitive-coupled high-density plasma etcher. The main parameters used in these experiments were RF source power, RF bias power, chamber pressure, SF6, O2 and He gas flow rates.

中文摘要本研究以加强型电容耦合式高密度电浆蚀刻机台来研究蚀刻氮化矽结构，实验操作参数为射频电浆源功率、射频偏压源功率、SF6、O2、He气体流量和腔体压力。

The common process flow and parameters, and the selection of the key equipment of thin-film evaporator were introduced.

介绍了目前浓缩磷脂加工常用的工艺流程、操作参数及关键设备薄膜蒸发器的选型依据。

The fabrication and analysis of poly-Si thin film transistor and Si nanowires field effect transistor were studied in this thesis.

本论文是有关低温多晶矽薄膜电晶体与矽奈米线场效电晶体之制备与分析。

According to the clear water experiment, aeration performance of the new equipment is good with high total oxygen transfer coefficient and oxygen utilization ratio.

曝气设备的动力效率在叶轮转速为120rpm～150rpm时取得最大值，此时氧利用率和充氧能力也具有较高值。

The environmental stability of that world - including its crushing pressures and icy darkness - means that some of its most famous inhabitants have survived for eons as evolutionary throwbacks, their bodies undergoing little change.

稳定的海底环境─包括能把人压扁的压力和冰冷的黑暗─意谓海底某些最知名的栖居生物已以演化返祖的样态活了万世，形体几无变化。