查询词典 silicide

The invention includes methods of etching nickel silicide and cobalt silicide, and methods of forming conductive lines.

本发明包括蚀刻硅化镍和硅化钴的方法和形成导线的方法。

A MoSi2 coating on C-103 niobium alloy was prepared by packing cementation, and the microstructures of the oxidized and unoxidized coatings were analyzed by XRD, SEM and EDS techniques. The formation mechanism of the silicide coating was investigated. The results show that the silicide coating is formed by reactive diffusion and the silicification process obeys parabolic relation.

采用包渗法在C-103铌合金基体上制备MoSi2涂层，通过X射线衍射、扫描电镜和能谱分析等手段研究涂层表面、截面形貌以及氧化后涂层结构变化，并分析硅化过程中涂层的形成机理。

To restore the ability of chromium can be dissolved in sulfuric acid, hydrochloric acid and High-FE acid and release hydrogen, but also of pure chromium with aqua regia does not work, when there is the presence of halogen ions in the acid can not be long-term stability, high temperature with alkali, hydrogen sulfide, sulfur steam, phosphorus, ammonia, such as carbon monoxide and water vapor reaction of the corresponding compounds, in the high temperature reaction of silicon into the silicide also chromium, chromium alloys with many metals generate a wide range of industrial applications, such as chromium-manganese stainless steel is used extensively for chemical plants.

铬的还原能力强，能溶于硫酸、盐酸和高FE氯酸而放出氢气，但纯铬连王水也不起作用，当有卤素离子存在时，在酸中不能长期稳定，高温时能与强碱、硫化氢、硫蒸汽、磷、氨、一氧化碳和水蒸汽等反应生成对应的化合物，在高温下还能与硅反应成硅化铬，铬能与许多金属生成合金广泛在工业上应用，如铬锰不锈钢大量用于化工设备。

The effects of annealing on atomic interdiffusion,silicide formation,and microstructures in Fe/Si systems were analyzed.

由RBS、XRD测量与SEM观察结果，分析了退火过程对磁控溅射制备的Fe/Si双层膜结构原子间的互扩散行为、硅化物形成及显微结构的影响。

Magnesium silicide (Mg2Si) is one kind of narrow-band-gap n-type semiconductor, and is a promising environmentally friendly thermoelectric material because of its high electrical conductivity and low thermal conductivity, and also because it is non-toxic and non-polluting.

硅化镁(Mg2Si)是一种窄带隙n-型半导体，具有高的电导率和低的热导率且无毒无污染、耐腐蚀，是很有潜力的环境友好型中温域热电材料。

The onset crystallization temperature of a-Si is effectively lowered due to the formation of Ni silicide, and the crystallization depends strongly on the migration of NiSi〓 precipitates.

对晶化的机理研究表明，a-Si在低温下的晶化是由于形成了Ni的硅化物，其晶化的发生是由于NiSi〓的迁移，其迁移的驱动力是由亚稳态的a-Si转变为c-Si。

Further annealing at 600K, bond scission in the Si-H moiety results in the desorption of hydrogen and finally leads to the formation of the copper silicide.

我们的理论分析表明，硅原子替代了表面第一层的部分铜原子，这些硅原子和剩下的铜原子组成一层新的复合层，形成R30°结构。

A mechanism of silicide formation is discussed.

对La硅化物的形成过程进行了讨论。

In our experiment, to reduce the contact resistance, we adopt the metal silicide technology.

在我们的实验中，为了降低接触电阻与接面寄生电阻，我们采用了金属矽化物技术。

Finally, we have observed the behavior of nickel silicide gate based on different gate structures.

最后，我们去观察在镍矽化物形成在不同闸极结构上的特性。

According to our present broadcasting situation,the thesis proposes using new technology to update and reform the present HFC. It also suggests broadcasting using self-advantage and arranging EPON in order to win the supermarket.

论文从我国广电的现状出发，结合实际，积极倡导采用新技术更新、改造我国现有的HFC网络；倡导广电现阶段利用自身优势，部署EPON网络来赢取市场。

A new general kinetic equation was derived in which the effect of the removal of condensation water was taken into account completely, and was applied to the polyesterification kinetic study of AA/HPHP and AA/NPG. It was found that the reaction order of self-catalyzed polyesterification was not constant. For these polyesterifications, the reaction order was 2.5 at a low temperature, while 3.0 at a high temperature.

考虑缩合水的排除对反应体系的影响，用体积浓度单位推导出一个新的聚酯反应总包动力学方程，并应用到AA/HPHP和AA/NPG两个聚酯化反应的动力学研究中，研究发现，自催化聚酯反应的反应级数并不是固定值，对于AA/HPHP和AA/NPG两个聚酯化反应而言，低温时反应级数为2.5，高温时反应级数为3.0。