查询词典 photolithography

Another approach in enhancing the light extraction efficiency of AlGaInP LED was accomplished using a surface roughening process. In this process, the Au(170 nm)/AuBe(260 nm)/Au(170 nm) ohmic contact layers were first deposited on the GaP window layer. After the alloy annealing process (480°C for 10 min), the Be atoms will diffuse into the GaP top layer and form non-uniform clusters. The LED samples were then immersed into a mixture 3H3PO4:1H2O2:1H2O solution for 6 min, resulting in a rough GaP surface. The luminous intensity of the AlGaInP LED can increase from 42 to 50 mcd, that is, an 18% enhancement can be achieved via the present non-photolithography surface roughening process.Keywords: LED, AlGaInP, Cu substrate, Reflector, Surface roughening

在实验的第二部份是开发磷化镓窗口层之粗化制程，我们是藉由正面金/铍欧姆接触电极之熔合制程，使铍扩散至磷化镓层，同时利用铍渗入磷化镓造成之特殊组成，可形成不均匀之蚀刻阻挡，而在磷化镓表面形成粗化，我们发现480℃、10分钟的熔合制程，加上浸泡磷化镓蚀刻溶液6分钟，可将四元发光二极体之发光亮度由42 mcd 提升到50 mcd，经由此无光罩粗化制程可将亮度提升18%，明显提升磷化铝铟镓发光二极体之外部量子效率。

The electroplated ferronickel shutter is suspended by a silicon spring The shutter is fabricated by the nonsilicon surface micromachining techniques. The planar coil is fabricated by high-aspect-ratio photolithography and mask-plating processes. And the silicon spring and the fiber alignment components are fabricated by the reactive ion etching and by the silicon anisotropic etching process.

电镀铁镍制作的挡光片被固定在一个硅弹簧上，该挡光片采用非硅表面微加工工艺制作，平面电感线圈利用高深宽比的光刻工艺和掩蔽电镀工艺制作，硅弹簧和光纤对准元件采用反应离子刻蚀和硅的各向异性腐蚀工艺制作。

The physical mechanism of pupil filleting to improve the photolithography resolution is discussed and several experimental results are given.

推导出光刻成像的计算机模拟公式，讨论了光瞳滤波提高光刻分辨率的物理机理，给出了几个实验结果。

The major research objective of this thesis is to investigate the process researches which relate to near field photolithography process and inverse calculation of the probe aperture size by nondestructive method.

摘要 本文主要的研究目的在探讨近场光学微影加工制程及非破坏方法逆解光纤探针口径之相关研究。

Resistance pure water system, 3-waste treatment system, and shock-proof working-table, and about 80 sets of micro-electrical-mechanical technical equipment are installed, including AMS200 ICP plasma etching system, ICP-2B etching machine, AWB04 bonding machine, MA6/BA6 Karlsus double-face photolithography machine/bonding machine, POLI-400 chemical-mechanical-polishing tool, WL2040 aluminum-wire press welder, OPTI CAOT 22i decktop precision spin coasting system, ZSH406 automatic dicing saw system, DQ-500 plasma photoresist-removing machine, HXS150S automatic centrifugal spinner, AXTRON MOCVD metal organic chemical vapor deposit system, 4470 micro-control 4-tube diffusing furnace, type 4371 LPCVD low pressure chemical vapor deposit system, OMICRON MBE molecular beam epitaxy system, JS-3X100B magnet-control spattering equipment, PECVD-2E plasma deposit apparatus, ZZSX500C electron-beam vapor equipment, JC500-3/D magnet-control spattering-coating machine, H63-14/ZM quartz-tube cleaning machine. Measurement instruments include OLS1100 Confocal Laser Scanning Microscope, DEKTAKIII Surface Profiler, D41-11A/ZN 4-probe resistance test instrument, Nikon L150 metallurgical microscope, and so on.

中心现有80多台各种微机电工艺设备，如AMS 200深硅等离子体刻蚀系统、ICP-2B刻蚀机、AWB04键合机、MA6/BA6 Karlsuss双面光刻机和键合机、POLI-400化学机械抛光机、WL2040铝丝压焊机、OPTI CAOT 22i喷涂胶机系统、ZSH406全自动划片机、DQ-500等离子去胶机、全自动清洗甩干机、AXTRON MOCVD金属有机物化学气相沉积系统、4470微控四管扩散炉、4371LPCVD低压化学沉积系统、OMICRON分子束外延系统、JS-3X100B磁控溅射台、PECVD-2E等离子淀积台、ZZSX500C电子束蒸发台、JC500-3/D磁控溅射镀膜机、石英管清洗机，以及多种常用测试仪器，如OLS1100激光共聚焦显微镜、DEKTAK-III台阶测量仪、D41-11A/ZN四探针电阻测试仪、Nikon L150金相显微镜等。

Photolithography photoetching method and thermal ion-exchanging technology can be used for fabrication of planar microlens array in glass substrate whose elemental lens is graded-index element.

光刻离子交换技术可用于在玻璃基片上制备变折射率的平面微透镜阵列。

In this paper, an experiment was performed on a new type microlens array, which has extreme high fill-factor (almost 100%), for the first time to our knowledge. In the microfabrication process, photolithography photoetching method and ion-exchanging technology were introduced and investigated for the special glass substrate.

本文首次制备出一种新型的平面微透镜阵列-方形孔径平面微透镜阵列，该类器件经理论分析具有极高填充系数，可以说近达100％。

To reproduce by means of photolithography;make a photolithograph of.

报道新闻最安全的方法是重复权威人物的言辞。

A photolithographic mask is used in a photolithography imaging system for patterning a semiconductor wafer.

一种在光刻成像系统中应用的用于形成半导体晶片的图形的光刻掩模。

The next part is photolithography, which is a critical step in process integration.

接下来是离子注入的相关知识，包括杂质的分布形式与常用元素的介绍。

They weren't aggressive, but I yelled and threw a rock in their direction to get them off the trail and away from me, just in case.

他们没有侵略性，但我大喊，并在他们的方向扔石头让他们过的线索，远离我，以防万一。

In slot 2 in your bag put wrapping paper, quantity does not matter in this case.

在你的书包里槽2把包装纸、数量无关紧要。