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photolithographic相关的网络例句

查询词典 photolithographic

与 photolithographic 相关的网络例句 [注:此内容来源于网络,仅供参考]

The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications.

聚合物对远UV波长显示出光学透明性,从而能在高分辨率照相平版印刷行业中应用。

That means the photolithographic resolution of 0.7 μm could be realized.

可以实现0.7 μm光刻分辨率;照明均匀器,由81个小方型透镜组成一方列阵。

The lens is held at a fixed distance away from the light source using precise support structures typically formed by photolithographic processes.

使用通常由光刻工艺形成的精确支撑结构将透镜固定在距光源固定距离处。

Three photolithographic masks are utilized in the fabrication process.SEM images show that the microprobe is 1.2mm long,100μm wide,and 30μm thick,with recording sites spaced 200μm apart for good signal isolation.

在整个工艺制作过程中需要三步光刻,制作的硅针长1.2mm,宽100μm,厚30μm,同时各个记录点的间距为200μm,可以形成良好的信号隔离。

This is a subtractive process that uses photolithographic techniques to define the aperture pattern, and then applies an etchant to form the apertures simultaneously from both sides of the stencil.

这是一个反工艺,它应用成像技术来决定孔型。然后,同时从钢网的两边腐蚀成孔。

The QVBA key micro-machined technology are also developed in this paper, such as: single step double sides multilayer photolithographic process, quartz crystal anisotropic etching process.

在仿真分析基础上,完成了石英振梁加速度计的设计及关键微加工工艺研究,包括:单步双面多层光刻工艺、石英晶体各向异性刻蚀工艺等。

Laser-cut stencils are produced directly from Gerber data or other data formats, reducing the number of photolithographic steps and subsequently reducing the chance of image misregistration significantly.

激光切割钢网直接由Gerber数据或其他数据模型做成。减少了成像的步骤,继而减少了影像登记出错的机会。

Back then, chip designers considered it risky to add two or three layers of metal on top of the silicon wafer because each new layer added hills and valleys that made it difficult to keep photolithographic patterns in focus.

当时的晶片设计者认为在矽晶圆上加上两三层金属有点冒险,会使晶圆表面凹凸不平,增加光刻过程中聚焦的困难。

AZ is the world leader in photoresists for the flat-panel display market; a major supplier of innovative products to the semiconductor industry; a leading supplier of photolithographic printing chemicals.

目前安智一直保持着平板显示市场光刻胶的领先地位,也是半导体行业创新产品的主要供应商,同时还是照相平板印刷业的主要供应商。

The most significant advance of the work described in this thesis is as follow.1 The silica microdisk optical resonator which exhibit whispering-gallery-type modes with quality factors 1×10~5 have been fabricated firstly with standard photolithographic techniques and dry etching in China.

论文主要工作和创新之处包括:1在国内首先通过光刻方法以及干法刻蚀方法得到高Q值微盘谐振腔,微盘腔的Q值达到约1×10~5。

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