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lithography相关的网络例句

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与 lithography 相关的网络例句 [注:此内容来源于网络,仅供参考]

As speciality lamps for diazo-printing reprography, lithography

放电管的荧光粉中作为催化剂的铅(铅的重量小于等于1%)可以豁免,当放电管用于

Used as speciality lamps for diazo-printing reprography, lithography, insect traps, photochemical and

21212121 当放电灯被用作含磷仿日晒灯、或二氮化合物列印、平版印刷、捕虫器,以及含

As when used as specialty lamps for diazo-printing reprography, lithography, insect traps,photochemical and curing processes containing phosphors such as SMS (Sr, Ba 2MgSi207:Pb

磷化学和含磷食物加工过程的专业灯时,放电灯中的萤光粉触媒剂的铅铅含量

Lead as activator in the fluorescent powder (1 % lead by weight or less) of discharge lamps when used as sun tanning lamps containing phosphors such as BSP (BaSi2O5:Pb) as well as when used as speciality lamps for diazo-printing reprography lithography insect traps photochemical and curing processes containing phosphors such as SMS (SrBa2MgSi2O7:Pb.

放电管的荧光粉中作为催化剂的铅(铅的重量小于等于1%)可以豁免,当放电管用于含有磷元素(如BSP (BaSi2O5:Pb))的日晒灯时,以及用于重氮印刷、平板印刷、捕虫、光化学、固化工艺等等专业领域的灯具时。

Lead as activator in the fluorescent powder (1 % lead by weight or less) of discharge lamps when used as sun tanning lamps containing phosphors such as BSP (BaSi2O5 b) as well as when used as speciality lamps for diazo-printing reprography, lithography, insect traps, photochemical and curing processes containing phosphors such as SMS (Sr,Ba2MgSi2O7 b

放电管的荧光粉中作为催化剂的铅(铅的重量小于等于1%)可以豁免,当放电管用于含有磷元素(如BSP (BaSi2O5 b))的日晒灯时,以及用于重氮印刷、平板印刷、捕虫、光化学、固化工艺等等专业领域的灯具时。

Specialty lamps for diazo-printing reprography, lithography, insect traps, photochemical and curing

当放电灯被用作含磷仿日晒灯、或二氮化合物列印、平版印刷、捕虫器,以及含磷

Lead as activator in the fluorescent powder (1 % lead by weight or less) of discharge lamps when used as sun tanning lamps containing phosphors such as BSP (BaSi2O5 b) as well as when used as speciality lamps for diazo-printing reprography, lithography, insect traps, photochemical and curing processes containing phosphors such as SMS (Sr,Ba2MgSi2O7 b.

放电灯中的萤光粉中作为触媒剂的铅含量在其重量的1%以下,当放电灯用作含磷仿日晒灯,比如含有BSP(BaSi2O5 b),以及用于重氮复印、平版印虫器、光化学和食物加工过程的含磷特种灯时,比如SMS(Sr,Ba2MgSi2O7:Pb 。

In addition, these effects can also be applied in the design of highly sensitive magnetometers, quantum computation, the quantum logic gate, quantum switches and quantum interferometric optical lithography and so on.

此外,这些效应还可应用于高灵敏磁力计的设计,量子计算,量子逻辑门,量子开关及量子干涉光学平版印刷术等。

However, both physical constraints and economics are expected to limit continued miniaturisation of electronic and optical devices by using current "top-down" lithography-based methods.

然而,物理系统规定参数和经济学均被期望限制继续电子产品和光学装置的通过现行的自顶向下基于晶片光刻的方法的小型化。

The production of reproducibly sized nanometric features has relied heavily on expensive and time-consuming methods of manufacture, such as electron beam lithography.

因此,研究和制备仿生的、适宜细胞生长的纳米支架对于医用植入体和组织工程研究都具有重要的意义和价值。

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Finally, according to market conditions and market products this article paper analyzes the trends in the development of camera technology, and designs a color night vision camera.

最后根据市场情况和市面上产品的情况分析了摄像机技术的发展趋势,并设计了一款彩色夜视摄像机。

Only person height weeds and the fierce looks stone idles were there.

只有半人深的荒草和龇牙咧嘴的神像。

This dramatic range, steeper than the Himalayas, is the upturned rim of the eastern edge of Tibet, a plateau that has risen to 5 km in response to the slow but un stoppable collision of India with Asia that began about 55 million years ago and which continues unabated today.

这一引人注目的地域范围,比喜马拉雅山更加陡峭,是处于西藏东部边缘的朝上翻的边框地带。响应启始于约5500万年前的、缓慢的但却不可阻挡的印度与亚洲地壳板块碰撞,高原已上升至五千米,这种碰撞持续至今,毫无衰退。