查询词典 ion deposition

The scintillation CsI was also calibrated with protons of 15, 20, 23MeV. The average energy calibration is 1. 047MeV per channel. Energy calibration for heavy ions was completed with multiplication factor 1/12. 75. The energy calibration is around 1. 1MeV per channel for oxygen ion and iron ions when energy deposition is less than 50MeV in each detector.

对铁离子而言，铁离子的四个能量点在ΔE〓探测器中的能量均超过50MeV，能量信号放大电路此时已进入饱和状态，当铁束能量为120MeV时，离子进入到ΔE〓探测器中，此时在ΔE〓中能量沉积低于50MeV，没有达到电子学系统的饱和值，能量刻度每道为1.1MeV／道，这些与氧离子的标定结果是一致的，饱和只是对于低能重粒子会出现这种情况，对于中高能重离子这种现象就会消失。

The key of the intermediate treatment lies on the proper saucer leaning with slow corrodent, proper Ar ion bombardment sputtering and pre-deposition of pure titanium layers. Measurement of the adhesion force of the composite coatings verified that all the four TiN composite coatings possess higher adhesion strength when compared with the single TiN coating.

在对复合涂层和各单层的制备技术、组织结构、以及涂层的结合力、显微硬度、常温磨损性能、高温氧化特性、高温磨损特性、冲击韧性和模具上的实际应用等方面进行横向比较和全面研究的基础上，首次建立了四种复合涂层及各单层的较全面、系统的综合性能评价体系，为TiN复合涂层的开发和应用提供了理论依据和实验指导。

Aim To investigate the influence of ion density on the deposition of wurtzite GaN films on the substrate of α-Al2O3(0001) by electron cyclotron resonance plasma.

目的 研究在电子回旋共振等离子体辅助法生长GaN时的离子密度对其质量的影响。

The regions with uniform ion density distribution were also obtained, which is very useful to the deposition of thin film.

获得了离子密度分布均匀的区域，分析了离子密度分布的均匀性对薄膜制备的影响和意义。

In this paper we combined three chromatographic separation and purification technique such as affinity chromatography, ion exchanger chromatography and hydrophobic interaction chromatography to develope a new technology of stimutaneous extraction of three enzyme from pancreatin. We optimized the technology by studying the methods of purification and assured the technology as: The crude extraction from the dissolution of Pancreatin is directly absorbed on the DEAE gelose fast flow columnEquilibrating buffer is 0.01mol/L NaoAc-HoAc buffer(pH4.5; eluting buffer is 0.2～0.35mol/LNaCl in 0.01mol/LNaoAc-HoAc buffer (pH4.5), and then be eluted by two steps to acquire the peak of kallikrein.The solution which can"t be adsorbed by DEAE gelose fast flow column is adsorbed on affinity chromatographic column Equilibrating buffer is 0.01mol/LTris-HCl buffer(pH7.5, eluting buffer is 0.5mol/LNaCl in 0.01mol/Ltris-HCl buffer(pH7.5)and then be eluted by one step to acquire the peak of trypsin.The solution which can"t be adsorbed by is pretreated with 30%～80%(NH_4)_2SO_4 fractional precipitation, the deposition of the precipitation is dissolved to beabsorbed on phenyl gelose fast flow columnhydrophobic interaction chromatography condition is Equilibrating buffer is lmol/L(NH_4_2SO_4 in 0.01mol/LNaoAc-HoAc buffer(pH4.5), eluting buffer is 0～0.6mol/L(NH_4)_2SO_4 in 0.01mol/LNaoAc-HoAc buffer (pH4.5) and then be eluted by two steps to acquire the peak of chymotrypsin.

本研究考察了各种纯化方法，将离子交换层析、亲和层析和疏水层析三种分离纯化法相结合，建立了激肽释放酶、胰蛋白酶和糜蛋白酶三酶的联产工艺：胰酶用pH4.5醋酸缓冲溶液提取后，粗提液直接上DEAE-琼脂糖快胶柱吸附平衡缓冲液：0.01mol／LNaoAc-HoAc缓冲液(pH4.5，洗脱缓冲液：0.01mol／LNaoAc-HoAc缓冲液(pH4.5)含0.2～0.35mol／LNaCl分两步洗脱，收集激肽释放酶的洗脱峰；DEAE-琼脂糖快胶的未吸附液上亲和层析柱分批吸附平衡缓冲液：0.01mol／LTris-HCl缓冲液(pH7.5，洗脱液：0.5mol／LNaCl溶液，一次洗脱，收集胰蛋白酶洗脱峰；最后，亲和层析未吸附液用30％～80％硫酸铵分级盐析处理，沉淀溶解后用上苯基—琼脂糖快胶吸附平衡缓冲液：0.01mol／LNaAc-HAc缓冲液(pH4.5含1mol／L(NH_4)_2SO_4，洗脱缓冲液：0.01mol／LNaAc-HAc缓冲液(pH4.5)含0～0.6mol／L(NH_4)_2SO_4，分两步洗脱，收集糜蛋白酶的洗脱峰。

The gas supply system may be coupled to a gas-consuming unit in a semiconductor manufacturing facility, e.g., an ion implanter, an etch chamber, or a chemical vapor deposition reactor.

该供气体系统可以连接半导体加工设备中的气体消耗装置使用，如离子注入机、腐蚀室或化学气相沉积反应器。

Surface modification of 2Cr13 stainless steel was carried out using plasma immersion ion implantation combined with ion beam enhanced deposition technique.

对 2Cr13不锈钢表面进行了等离子体浸没离子注入与离子束增强沉积复合强化处理。

Researchers have validated the mass deposition process in small biomolecules and pharmic molecules induced by heavy ion implantation, and researches on modification of biomolecules and pharmic molecules by heavy ion implantation have been taken up.

过去的研究已初步证实了重离子注入生物和药物小分子所引起的质量沉积过程，并在此基础上开展了重离子注入生物和药物分子改性的研究。

Membrane scaling is caused by the deposition of unsoluble salts as feedwater is converted to brine. In this process the ion concentration of calcium, magnesium and so on increases greatly which will lead to that the ion product of sparingly soluble salts exceeds its solubility product, and the unsoluble salts deposite on the surface of RO membrane to form membrane scaling.

在反渗透海水淡化过程中，由于膜的浓缩作用，浓水中的钙、镁等离子浓度大大增加，从而使难溶盐的离子积大于其溶度积，在反渗透膜表面形成膜垢，影响整个反渗透装置的正常运行，缩短了反渗透膜的使用寿命。

The equipment can both perform ion implantation and combine ion implantation with sputtering deposition and coating to form many kinds of synthetic surface modification techniques.

该装置既能执行离子注入，又能把离子注入与溅射沉积，镀膜结合在一起，形成多种综合性表面改性工艺。

This one mode pays close attention to network credence foundation of the businessman very much.

这一模式非常关注商人的网络信用基础。

Cell morphology of bacterial ghost of Pasteurella multocida was observed by scanning electron microscopy and inactivation ratio was estimated by CFU analysi.

扫描电镜观察多杀性巴氏杆菌细菌幽灵和菌落形成单位评价遗传灭活率。