查询词典 ion deposition

To control the film growth,severalmethods based on energetic particle(atom and/or ion)depositions,e.g.,ion beam assisteddeposition,sputter deposition,accelerated molecular beam epitaxy,and energy-filtered ionbeam deposition,etc.,were developed in the past few years.

载能粒子沉积是以离子束技术和常规薄膜制备技术为基础而发展起来的一类具有广泛应用前景的薄膜制备方法，但受研究手段的限制，人们对载能粒子沉积的薄膜生长机制一直缺乏比较全面、系统的了解。

HCD is a thin film deposition process based on hollow hot cathode ion-electron beam and ion plating techniques.

空心阴极放电离子镀技术，是在空心热阴极离子电子束技术和离子镀技术的基础上发展起来的一种薄膜沉积工艺。

The results showed that both annealing after the deposition and ion bombardment before the deposition can increase the microhardness.

由于在膜层很薄时，薄膜显微硬度的测量会受到基体材料硬度的影响，所以测量结果不能反映薄膜的本征硬度。

The pulse potential with –3.5 V was beneficial to ion deposition recrystallization, to composite coating deposition.

脉冲电位为–3.5 V时有利于离子的沉积结晶，有利于复合涂层的沉积。

The amorphous carbon films were prepared using a magnetic field filtered carbon ion deposition method.

利用椭偏光谱法研究了非晶碳薄膜的sp〓C与sp〓C两种键结构组成和光学性质。

The selection of materials,design and deposition of double waveband (3～5μm and 8～12μm) infrared antireflection on Ge substrate by ion beam assisted deposition are reported.

文中简要叙述了双波段(3～5μm和8～12μm)红外增透膜的膜料选择以及锗基底上红外双波段增透膜的设计与镀制，介绍了离子束辅助沉积技术制备该薄膜的过程。

Property comparison of optical thin films prepared by E-beam,ion assisted deposition and ion beam sputtering.

电子束、离子辅助和离子束溅射三种工艺对光学薄膜性能的影响。

Ion beam assisted deposition, in which ion bombardment is concurrent with vapor deposition, was a far-from-equilibrium process that has been developed since the late 1980s.

离子束辅助沉积，是二十世纪七十年代末发展起来的一种远离平衡的薄膜制备方法，它是在气相沉积镀膜的同时伴随以一定能量的离子束轰击。

The main contents are: Status and prospects of micro/nano fabrication technology, semiconductor substrates, vacuum science and plasmas. Several unit processes of microfabrication like diffusion, thermal oxidation, ion implantation, optical and nonoptical lithography, etching, physical deposition, chemical vapor deposition and epitaxial growth. Process integration of these unit processes for example CMOS technique and silicon bipolar technique, microelectro mechanical systems and some nano fabrication technologies will be introduced.

主要内容有：微米/纳米制造技术的现状和展望、半导体衬底、真空科学和等离子体，各种单项微电子加工工艺，如扩散、热氧化、离子注入、光学和非光学光刻、刻蚀、物理淀积、化学气相淀积、外延生长等，以及各种单项工艺的集成技术，如CMOS技术和硅双极型工艺技术，并初步介绍微电子机械系统和纳米加工技术。

Then gel filtration, positive ion resin absorption and isoelectric deposition were applied for polysialic acid purification process. The purity of polysialic acid was above 90 % with neutralisation deposition method and the recovery yield of polysiac acid was 55.8%.

探讨了凝胶过滤法、阳离子树脂吸附法、中和沉淀法进一步纯化聚唾液酸的工艺，其中中和沉淀法可使聚唾液酸纯度达到91.5%，回收率为55.8%。

This one mode pays close attention to network credence foundation of the businessman very much.

这一模式非常关注商人的网络信用基础。

Cell morphology of bacterial ghost of Pasteurella multocida was observed by scanning electron microscopy and inactivation ratio was estimated by CFU analysi.

扫描电镜观察多杀性巴氏杆菌细菌幽灵和菌落形成单位评价遗传灭活率。