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helicon相关的网络例句

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与 helicon 相关的网络例句 [注:此内容来源于网络,仅供参考]

In this thesis, the AlN thin films were deposited on SiO2/Si and GaN/Sapphire substrates respectively for layered structure SAW devices by Helicon sputtering system. Laser ultrasound system was used to measure the acoustic wave velocity of AlN/SiO2/Si layered structure. Frequency response and insertion loss were measured by an HP8510C vector network analyzer to analysis insertion loss, sidelobe and quality factor. The results showed the possibility of incorporating thin films SAW devices with other semiconductor devices.

本研究使用回旋溅镀系统分别在SiO2/Si、GaN/Sapphire两种基板上沉积AlN并制作层状表面声波元件,并利用雷射超音波系统量测AlN/SiO2/Si结构之表面波速及机电耦合系数,再利用网路分析仪量测其频率响应,分析其插入耗损、 sidelobe、品质因子Q,以比较不同基材所制作之层状表面声波元件之特性,此研究成果初步验证AlN层状表面声波元件与半导体元件整合之可行性。

AlN MSM devices were fabricated on AlN epitaxial thin film deposited on GaN/Sapphire substrates using helicon sputtering system at the low temperature of 300°C. The device characteristic was found to be improved by in situ metallization of Al electrodes. The extremely low dark current (1.39pA at 20V), the ideal factor (1.0125) and the Schottky barrier height (0.916eV) are superior compared to those of AlN MSM in the literature. When the device was illuminated by the 150W D2 lamp, the ratio of the induced photocurrent to dark current is more than 2 orders of magnitude. The illumination effect also shows the linear relationship between the radiation power and the photo current for the MSM devices, indicating the potential applicability for deep UV sensors.

氮化铝金属-半导体-金属光侦测器则是用In situ metallization制程,利用低温回旋溅镀法在氮化镓/蓝宝石基板上沉积之氮化铝,再直接溅镀金属铝作为指叉电极,比较目前文献制作出来的氮化铝MSM元件,可得到很好的元件金半接面之理想因子1.0125,算出萧特基能障高度为0.916eV,并有很低的暗电流为1.39 pA,提升了元件的特性,使用150 W氘灯入射,光暗电流差距可到两个order,且元件之光电流与入射光功率呈线性,显示所制作之氮化铝MSM元件,很适合针对深紫外光波段侦测。

I was born and grew up in TelAviv. I'm a poet, and the chief editor of HeliconPoetry Society

我在特拉维夫出生和长大,我是个诗人,担任HELICON诗歌协会会刊的主编。

I was born and grew up in Tel Aviv.

我在特拉维夫出生和长大,我是个诗人,担任HELICON诗歌协会会刊的主编。

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