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etching相关的网络例句

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与 etching 相关的网络例句 [注:此内容来源于网络,仅供参考]

Design of the Tension Measuring Mechanism for Wire Electrode;2. Based on electrochemical etching principle,the micrometer scale wire electrode was online fabricated,and the equipment of WEMM was established.

基于电化学原理,讨论了纳秒脉冲电流微细电解线切割加工的机理,建立了微细电解线切割加工数学模型;采用电化学腐蚀原理对微米尺度线电极进行在线制作,建立了微细电解线切割加工试验系统,并进行了微细电解线切割加工试验,切割出带90°直角的微结构,其切缝宽度为30μm。

In order to solve the difficulties in producing and welding tiny bridge-belt ,twn methods- producing by electrochemical etching and laser welding with powder cladding were put forward.

针对微型桥带的成型与焊接工艺难题,提出了采用电化学刻蚀成型和利用粉末熔覆工艺进行激光焊接的工艺方法,并给出了具体的工艺过程,成功地实现了低成本、高质量、成批量的工业生产要求。

Hanging on the wall is a fine etching of the church.

挂在墙上的是一幅精致的教堂蚀刻板画。

Also, if you on the same Panel on a narrow lead site and interval width wire parts of State-wide wire distribution interval, etching is excessive.

同样如果在同不活背上的隔断广的导线部位和隔断阔的导线部位状况下,隔断阔的导线漫衍的部位,蚀刻不离会功度。

The results of testing show that the silicon (111) crystal plane is very smoothing by etching method.

测试结果表明,利用腐蚀方法得到的硅的(111)晶面周期结构平整光滑。

In contrast to chemical etching and laser cutting, electroforming is an additive process. Electroformed stencils are "grown" by electro-depositing a plating material, usually nickel, onto a mandrel carrying a negative, photo-resist image of the aperture pattern. The process produces extremely precise, smooth-walled apertures with a natural taper that require no additional finishing processes.

和化学腐蚀及激光切割相比,电铸是一个附加工艺,电铸钢网是用电镀材料,通常为镍,在带负电孔型成像的卷筒,该工艺能形成精确光滑表面的孔,自然锥度另需精加工。

This result is supported by the etching patterns of the slip line fields and the microhardness measurements. It is proved by tests that the crack tip ope...

此外,试验表明起裂的裂纹张开位移值与滑移线场类型无关,它由HRR场控制,而裂纹的稳态扩展行为则受到远程场的影响。

Etching method applied to large-quantity, variety, large flat thin metal material processing and metal product surface decoration process (semi-corrosion), but also applies to single-piece and small-batch sampling.

蚀刻法适用于批量大、品种多、大平面的薄型金属材料加工和金属制品表面工艺装饰,同时也适用于单件小批打样。

The copper concentration on silicon surface was determined by GFAAS joint with one-drop sandwich etching method.

硅晶片表面污染的铜的浓度通过石墨炉原子吸收技术结合液滴夹心刻蚀的金属富集技术测得。

The voids of the thin films are thought to be related to oxygen plasma etching and atomic self-shadowing effect.

氧气原子的蚀刻塑胶基材的现象,再加沉积时发生自我阴影效应,造成氧化铝沉积於PES 上呈现多孔状。

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