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etching相关的网络例句

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与 etching 相关的网络例句 [注:此内容来源于网络,仅供参考]

Main craft: The etching, the pressure to flush, the note paint, silk India, the drop rubber, to imitate the enamel, the zinc base alloy compression casting and so on.

主要工艺:蚀刻、压冲、注漆、丝印、滴胶、仿珐琅、锌合金压铸等。

Sometimes, it is necessary to fabricate these GaN-based optoelectronic devices with the inductively coupled plasma dry etching method.

有时,在制造氮化镓光电元上ICP乾性蚀刻是必要的。

Using the mechanism, we also fabricated large-area silicon nanowire p-n junction diode arrays by chemical etching of planar silicon p-n junction wafers in aqueous HF solution containing appropriate silver nitrate near room temperature.

进一步研究了硅衬底在HF-MoxMox=KAuCl4、K2PtCl6、Cu(NO32、Ni(NO3)2、Mg(NO3)2等氧化剂混合水溶液里的腐蚀行为,并提出了一种新的硅纳米线形成机制-金属枝晶辅助纳米电化学机制。

Mezzotint: In fine art,a form of etching inwhich fine burrs were made to the entire surface of a plate of copper or steel by using a special hand tool.

沙粒色调:在美术方面,它是一种蚀刻版画。用特制的手工具在铜片或钢片上造成微细芒刺。

I The band reaction model of silicon in alkaline solutions in the fundamental theory of silicon anisotropic etching, which has great theoretical and experimental significance in the field of micromechanics.

论文的创造性成果主要体现在:(1)所建立的硅在碱性腐蚀液中的反应模型,从根本上解释了硅各向异性腐蚀的重大基础理论问题,为微机械的基础研究做出了开创性的贡献。

These studies have furthered the application of etching figures in modern mineralogy and geology.

这些研究充分挖掘了腐蚀像在地质学、矿物学中的新的研究意义。

In this study, the characteristics of NEB resistance employed in micro-lithography and etching processes are investigated.

本研究对电子束光阻在微影制程、蚀刻等特性做制程方面的探讨并比较不同线宽之效应。

As an important step of microelectronic process, etching technology has gained much attention. It will play an important role in microfabrication such as new-made microeletronics mechanism and photoelectrics integration system.

刻蚀工艺不仅作为微电子工艺中的关键技术一直受到人们的关注,而且在新兴的微机电系统,光电集成系统等微细加工中也将得到重要应用。

Also, since this study was conducted in low temperature environment, the results of X-ray diffraction analysis showed that the sputtered film was noncrystalline, though with inferior photoelectric characteristics to crystalline, it is more efficient in the etching processing.

另外,由於本研究背景是在低温环境下,因此经X-ray绕射分析结果显示,在此制程条件下溅镀出之薄膜为非晶相,虽光电特性会较结晶相差,但在后续蚀刻处理时效果较结晶薄膜快。

Nanoporous gold with different pore sizes was prepared by controlling the etching time of Au/Ag alloy with concentrated nitric acid and annealing. Scanning electron microscopy and a nitrogen adsorption technique were used to characterize the NPG.

以Au/Ag合金为原料,通过控制浓硝酸的腐蚀时间再辅以退火处理得到了不同孔径的纳米多孔金,利用扫描电镜和N2气体吸附仪对孔性质进行了表征。

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