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etchants相关的网络例句

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与 etchants 相关的网络例句 [注:此内容来源于网络,仅供参考]

The morphology and density distribution of etch pit s formed by Schaake and Chen etchants on the {111} B face of HgCdTe liquid phase epitaxy films are studied.

通过对Schaake和Chen腐蚀剂在HgCdTe外延材料(111)B面腐蚀坑特性的研究,揭示了HgCdTe液相外延材料中的缺陷特征及其密度分布规律。

The morphology and density distribution of etch pits formed by Schaake and Chen etchants on the {111} B face of HgCdTe liquid phase epitaxy films are studied.

通过对Schaake和Chen腐蚀剂在HgCdTe外延材料(111)B面腐蚀坑特性的研究,揭示了HgCdTe液相外延材料中的缺陷特征及其密度分布规律。

G. titanium alloy has a low cost and environmental impact compared with photochemical machining using toxic etchants based on hydrofluoric acid.

采用光刻电解技术,可以选用对环境污染影响小、成本较低的腐蚀液,实现难蚀除金属材料的微细阵列结构加工,优于化学腐蚀方法。

Thorough cleansing of joints and surfaces to remove electrolytic residue, including PC etchants, body salts, and processing chemicals, will minimize the effect of these parasitic batteries.

彻底清洁接点和表面可以清除电解残余物,包括印制电路蚀刻剂、人体盐和化学处理药品,会将这些寄生电池的影响降至最低。

In addition,the etching mechanism of FeCl3 etching Cu film was analyzed. The recurrent and quiescent etchants affected on the preparation of fine thin-metal electrode was discussed and measured by video microscopy.

此外,分析了FeCl3刻蚀液对Cu膜的刻蚀机理,讨论了刻蚀液在静置和循环条件下对制备FED薄膜型精细电极的影响,借助视频显微镜测试刻蚀后的电极形貌,结果表明,FeCl3刻蚀液在循环条件下刻蚀Cu膜速度均匀,刻蚀后电极边缘整齐。

Concentrated, buffered, and dilute hydrofluoric acid were utilized as etchants for SiO2 and SiNx:H. A high etching selectivity of SiO2 over SiNx:H was obtained using highly concentrated buffered HF.

浓氢氟酸、缓冲氢氟酸和稀释氢氟酸被用作氧化硅和氮化硅的刻蚀液,使用高浓度的缓冲氢氟酸可以获得较高的选择比。

They can be divided into 2 major categories, first printed circuit board chemicals including etchants, inner layer cleaners, desmear chemicals, electroless copper, stripper agents, etc. These products caters to process needs of both domestic and foreign PC board manufacturers.

主要的产品可分两部分,一为印刷电路板的化学药品,包括有蚀刻液、内层清洁液、去胶渣化学品、无电镀化学铜、黑棕化液和剥锡铅液等,提供国内外各PC主板公司生产流程所需的化学药品。

Etchants are high consumption and high pollution of the printed circuit board industry; therefore this research uses the etchant for the acid copper chloride amount the high copper content in the printed circuit board industry, using the neutralization for acids and bases to prepare of the copper salt by the acid wasted etching liquid.

中文摘要在印刷电路板业中蚀刻液属於高用量及高污染性质的液体;因此本研究主要使用印刷电路板业中含铜量较高之酸性氯化铜蚀刻液,使用酸碱中和法从酸性蚀刻废液制备出铜盐,以达到废弃物资源化再利用之永续经营。

The post-process employed the etchants to etch the sacrificial layers, and to release the suspended structures, and then used a PDS to seal the etching holes in the pressure sensors.

制程完成后利用蚀刻液,以湿式蚀刻方式,将压力薄膜结构释放悬浮,并且使用化学沈积系统沈积高分子材料parylene,将压力空腔封装,以量测外界与压力腔的压差。

The morphologies of the CdZnTe etch pits developed by four etchants including Nakagawa, Everson, EAg1 and EAg2 solutions are studied. The results show that the etch pits of EAg2 etchant on the (111) B surface are flat-bottomed. And the etch pits of Everson etchant on (111) B include flat-bottomed pits and pyramidal pits with different slant directions, while the positions of pyramidal pits don′t move as the surface layer is continuously removed.

对碲锌镉晶体常用的Nakagawa、Everson、EAg1和EAg2四种腐蚀剂在碲锌镉材料(111)晶面上的腐蚀坑坑形进行了研究,结果发现,EAg2腐蚀剂在(111)B面上的腐蚀坑为平底坑,Everson腐蚀剂在(111)B面上产生的腐蚀坑包括平底坑和带有不同倾斜方向坑底的三角锥形坑,进一步的研究还表明,三角锥形坑并未沿着坑底的倾斜方向向下延伸。

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