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etch相关的网络例句
与 etch 相关的网络例句 [注:此内容来源于网络,仅供参考]

What the dealer will do is to offer to etch the VIN number of your car onto the window of the car for a price.

经销商会做什么,是提供给蚀刻的VIn或多个你的车车推窗一价。

Many methods for making nanoscale materials were developed in the past few years, such as colloidal crystallization, monolayer deposition, multiplayer casting, molecular crosslinking, complementary interaction, patterned etch pits, template-mediated and DPN, most of these are complicated and costive.

在过去的几年中,合成纳米复合材料的方法已取得了极大的进展,如胶体结晶法、单层膜沉积法、多层膜浇铸法、分子交联法、互补反应法、图形刻蚀法、模板化学法、DPN法等,但是这些方法大多操作耗时、费力。

Moreover, an experiential formula for predicting the possibilities of etch film formation in the negative half-cycle of ac has been driven from the principle of mass transfer in HCl solutions. Finally, a mechanism of ac etching for aluminum foil in HCl and a theoretical rule for choosing electroetching conditions were suggested on the results.

在此基础上,提出了铝在交流负半周发生的四种变化,以及交流腐蚀扩面机理,根据这一机理,提出了铝箔的交流腐蚀工艺优化原则,并用实验对这一原则进行了初步验证。

The total of these two sorts of functions is called S-functions The indicial function, sinusoidal function, cosinusoidal function, hyperbolic sinusoidal function, hyperbolic cosinusoidal function, trigonometric function of n-order and hyperbolic function of n-order etch are all belong to S-functions.

指数函数、正弦函数、余弦函数、双曲正弦、双曲余弦、n阶三角函数和n阶双曲函数等。都是S-函数的特殊形式。文中证明了关于S-函数及其各阶导数的性质的三个定理。

The BARC layer is etched with a significant negative etch bias to reduce the critical dimension of the opening in the multi-layer mask below the lithographically define dimension in the photoresist.

使用有效的负性蚀刻偏置蚀刻该BARC层以减小在该多层掩模中的开口的特征尺寸至在该光致抗蚀剂中的平版印刷所确定的尺寸之下。

Microstructure and mechanical properties of phosphorus bearing TRIP steel were studied with static tensile tester, tint etch method and quantificational metallograph.

采用计点法定量金相、静态拉伸试验等方法,研究了含磷低硅TRIP钢的组织和力学性能。

For thermally curable etch-resist inks comprising an activated olefinic group the activated olefinic monomer preferably contains a metal chelating group.

对于热固化刻蚀抵制油墨组成一组激活烯烯单体的活性最好包含一个金属螯合组。

The thermally cured Etch-resist ink (2) was then removed from the unetched areas of copper by immersing the film in an aqueous solution of 5% by weight caustic at a temperature of 50° C.

的热固化刻蚀抵抗油墨(2)然后从铜的未腐蚀× 100区除名的沉浸在了5%水溶液的电影,由重量烧碱为50 ° C的温度由此产生的FR4电路板蚀刻水冲洗和干燥的空气在25 ° C

The resultant etched film showed a completely unetched area of copper where the original Etch-resist ink (1) print had previously been.

由此产生蚀刻的影片中,铜完全未腐蚀× 100范围,有关的原始腐蚀,抗油墨(1)印刷以前。

Usually it is recommended to etch the part with caustic soda prior to anodizing to clean it, but I have found this is not necessary.

通常,建议蚀刻与烧碱部分阳极氧化前清洗,但是我发现这是没有必要的。

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