英语人>网络例句>etch 相关的网络例句
etch相关的网络例句
与 etch 相关的网络例句 [注:此内容来源于网络,仅供参考]

Preferably the amount of colorant in the etch-resistant ink is from 0.01 to 4 parts, more preferably from 0.1 to 3 parts and especially from 0.1 to 2 parts by weight.

最好在etch中的着色剂数量耐油墨是从0.01至4部分,从0.1到3件以上,最好,尤其是从0.1到2重量部分。

Now, I have the etch set, WTC saddles, and some auxiliary support pieces to get done.

现在,我有etch的设置,世台会鞍座,和一些辅助件的支持,以获得工作要做。

Do this a few more times to get all the etch resist off.

这样做多几个时代取得所有etch的抵制。

I still have Debian Etch burned to a CD, waiting for a test in our lab.

我仍然保留着一张Debian Etch 的CD盘,等着我去实验室测试。

The result of all this infighting will, of course, be that less attention will be paid to the Etch code.

这场斗争显而易见的结果是无法为Etch(Debian的下一版本)投入全部精力。

The aim of the study is to understand the effect of Tobacco etch virus on maize dwarf mosaic disease. In the net house, an experiment is carried out by means of artificial inoculation.

为了研究烟草蚀纹病毒(Tobacco etch virus, TEV)对玉米矮花叶病的预防效果,在防虫网室内,采用人工摩擦接种病毒的方法进行生物学试验,并用RT-PCR和实时荧光定量PCR技术对预防效果进行了检测。

The requirements for adhesion and removability pose a difficult balance in etch-resist ink chemistry.

取出的粘附和构成的要求在etch困难的平衡,抵抗油墨化学。

The morphologies of the CdZnTe etch pits developed by four etchants including Nakagawa, Everson, EAg1 and EAg2 solutions are studied. The results show that the etch pits of EAg2 etchant on the (111) B surface are flat-bottomed. And the etch pits of Everson etchant on (111) B include flat-bottomed pits and pyramidal pits with different slant directions, while the positions of pyramidal pits don′t move as the surface layer is continuously removed.

对碲锌镉晶体常用的Nakagawa、Everson、EAg1和EAg2四种腐蚀剂在碲锌镉材料(111)晶面上的腐蚀坑坑形进行了研究,结果发现,EAg2腐蚀剂在(111)B面上的腐蚀坑为平底坑,Everson腐蚀剂在(111)B面上产生的腐蚀坑包括平底坑和带有不同倾斜方向坑底的三角锥形坑,进一步的研究还表明,三角锥形坑并未沿着坑底的倾斜方向向下延伸。

Furthermore, the photo-tool containing the negative image of the desired etch pattern is often distanced from the etch-resist layer and diffraction of the UV light irradiation can lead to development and polymerisation in unwanted areas of the etch-resist directly beneath the photo-tool masked areas.

此外,有大量的照片工具载有所需的蚀刻模式的负面形象往往是远离了蚀刻,抵制层和紫外光照射可导致衍射发展和聚合在etch中不想要的区域,抵制照片下方的直接工具蒙面地区。

During etching fine details of the etch-resist pattern can be seriously compromised if either the unexposed etch-resist is incompletely removed or if some of the exposed and polymerised etch-resist is removed prior to chemically etching the metal or alloy.

在本蚀刻蚀刻的细节,抵制模式可以将受到严重损害,如果不是未曝光蚀刻,抵制是一种不完全删除或如果揭露和聚合性蚀刻,抵制被删除之前,化学蚀刻的金属或合金一些。

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